IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0500663
(2006-08-08)
|
등록번호 |
US-8435719
(2013-05-07)
|
발명자
/ 주소 |
|
출원인 / 주소 |
- International Business Machines Corporation
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
0 인용 특허 :
8 |
초록
A process for tuning the water contact angle of an immersion photoresist layer or immersion topcoat layer by modification of the top surface. The surface modification is a layer of fluorinated polymer.
대표청구항
▼
1. A surface modification process for an immersion photoresist comprising: a) coating a photoresist layer onto a substrate;b) applying a topcoat layer onto the photoresist layer; andc) applying a fluorinated polymer onto the topcoat layer on the photoresist layer, wherein the fluorinated polymer lay
1. A surface modification process for an immersion photoresist comprising: a) coating a photoresist layer onto a substrate;b) applying a topcoat layer onto the photoresist layer; andc) applying a fluorinated polymer onto the topcoat layer on the photoresist layer, wherein the fluorinated polymer layer is less than about 5 nm and the fluorinated polymer is (Poly(1,1,2,4,4,5,5,6,7,7-decafluoro-3-oxa-1,6-heptadiene). 2. The surface modification process of claim 1 wherein the fluorinated polymer layer further comprises a fluorinated solvent. 3. The surface modification process of claim 2 wherein the fluorinated solvent is selected from the group consisting of perfluorotributylamine, perfluoro-2-butyltetrahydrofuran, mixtures of perfluorohydrocarbons and combinations thereof. 4. The surface modification process of claim 1 further comprising the step of diluting the fluorinated polymer before deposition. 5. The surface modification process of claim 4 wherein the fluorinated polymer is diluted with a fluorinated organic solvent. 6. The surface modification process of claim 5 wherein the fluorinated organic solvent is selected from the group consisting of perfluorotributylamine, perfluoro-2-butyltetrahydrofuran, mixtures of perfluorohydrocarbons and combinations thereof. 7. The surface modification process of claim 5 wherein the fluorinated organic solvent is perfluoro-2-butyltetrahydrofuran. 8. The surface modification process of claim 5 wherein the fluorinated organic solvent is perfluorotributylamine. 9. A radiation-sensitive multi-layer structure comprising: a) a substrate;b) a photoresist layer on top of the substrate;c) a topcoat layer on top of the photoresist layer; andd) a fluorinated polymer layer on top of the topcoat layer, wherein the fluorinated polymer layer is less than about 5 nm and the fluorinated polymer is comprised of (Poly(1,1,2,4,4,5,5,6,7,7-decafluoro-3-oxa-1,6-heptadiene) and perfluorotributylamine. 10. A process for tuning a contact angle of a photoresist layer comprising: a) providing a substrate;b) applying a photoresist layer onto the substrate;c) applying a topcoat layer onto the photoresist layer; andd) applying a fluorinated polymer onto the topcoat layer on the photoresist layer in order to tune the contact angle of the top surface of the photoresist layer and wherein the fluorinated polymer layer is less than about 5 nm and the fluorinated polymer is (Poly(1,1,2,4,4,5,5,6,7,7-decafluoro-3-oxa-1,6-heptadiene). 11. The tuning process of claim 10 wherein the contact angle is from about 60 to about 120 degrees. 12. The tuning process of claim 10 wherein the fluorinated polymer layer further comprises a fluorinated solvent. 13. The tuning process of claim 12 wherein the fluorinated solvent is selected from the group consisting of perfluorotributylamine, perfluoro-2-butyltetrahydrofuran, mixtures of perfluorohydrocarbons, and combinations thereof. 14. The tuning process of claim 10 further comprising the step of diluting the fluorinated polymer before application. 15. The tuning process of claim 14 wherein the diluter is selected from the group consisting of perfluorotributylamine, perfluoro-2-butyltetrahydrofuran, mixtures of perfluorohydrocarbons, and combinations thereof. 16. The tuning process of claim 14 wherein the diluter is perfluorotributylamine. 17. The tuning process of claim 14 wherein the diluter is perfluoro-2-butyltetrahydrofuran. 18. A process for manufacturing a radiation-sensitive multi-layer structure comprising: a) providing a substrate;b) applying a photoresist layer;c) baking the photoresist layer;d) optionally applying a topcoat layer and baking the topcoat layer;e) applying a fluorinated polymer layer, which is less, than about 5 nm and the fluorinated polymer is (Poly(1,1,2,4,4,5,5,6,7-decafluoro-3-oxa-1,6-heptadiene);f) exposing the fluorinated layer to radiation;g) baking the radiation-sensitive multi-layer structure;h) developing the radiation-sensitive multi-layer structure; andi) rinsing the radiation-sensitive multi-layer structure.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.