A load lock includes a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough. The load lock further includes a first port in communication with the upper portion of the chamber and a secon
A load lock includes a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough. The load lock further includes a first port in communication with the upper portion of the chamber and a second port in communication with the lower portion of the chamber. The load lock includes a rack disposed within the chamber and a workpiece holder mounted on a first surface of the rack, wherein the rack and the workpiece holder are movable by an indexer that is capable of selectively moving wafer slots of the rack into communication with the second port. The indexer can also move the rack into an uppermost position, at which the first surface of the boat and the partition sealingly separate the upper portion and the lower portion to define an upper chamber and a lower chamber. Auxiliary processing, such as wafer pre-cleaning, or metrology can be conducted in the upper portion.
대표청구항▼
1. A load lock comprising: a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough;a first port in communication with the upper portion of the chamber;a second port in communication with t
1. A load lock comprising: a chamber including an upper portion, a lower portion, and a partition between the upper portion and the lower portion, the partition including an opening therethrough;a first port in communication with the upper portion of the chamber;a second port in communication with the lower portion of the chamber;a boat disposed within the chamber; anda workpiece holder mounted on a first surface of the boat, the boat and the workpiece holder movable by a boat handler, wherein the first surface of the boat and the partition are configured to sealingly separate the upper portion and the lower portion to define an upper chamber and a lower chamber, wherein the upper chamber is sized and shaped to accommodate no greater than four workpieces, and the lower chamber is sized and shaped to accommodate no less than ten workpieces. 2. The load lock of claim 1, wherein the first surface of the boat comprises an upper surface of the boat. 3. The load lock of claim 1, wherein the first surface of the boat comprises a lower surface of the boat. 4. The load lock of claim 1, wherein the boat is configured to hold no less than twenty workpieces. 5. The load lock of claim 1, wherein the workpiece holder is configured to hold no greater than two workpieces. 6. The load lock of claim 1, further comprising a seal between the first surface of the boat and the partition, wherein the seal is mechanically coupled to the boat. 7. The load lock of claim 1, further comprising a seal between the first surface of the boat and the partition, wherein the seal is mechanically coupled to the partition. 8. The load lock of claim 1, further comprising a metrology apparatus in the upper portion. 9. The load lock of claim 1, further comprising a wafer handling unit, wherein the boat comprises a plurality of workpiece support structures, wherein at least one of the ports is dimensioned so each of the workpiece support structures is accessible by the wafer handling unit through the at least one of the ports upon movement of the boat handler. 10. The load lock of claim 1, further comprising a wafer handling unit, wherein the boat comprises a plurality of workpiece support structures, wherein at least one of the ports is dimensioned so each of the workpiece support structures is accessible by the wafer handling unit through the at least one of the ports without movement of the boat handler. 11. The load lock of claim 1, further comprising a heater configured to transmit heat into at least one of the upper or lower chambers. 12. The load lock of claim 11, further comprising a sensor configured to detect a temperature within at least one of the upper or lower chambers. 13. The load lock of claim 1, further comprising an exhaust system in fluid communication with at least one of the upper or lower chambers. 14. The load lock of claim 13, wherein the exhaust system further comprises a first exhaust path and a second exhaust path, with a valve configured to selectively control the flow of substantially inert fluids through the first exhaust path and the flow of substantially reactive fluids and byproduct through the second exhaust path. 15. A semiconductor workpiece boat comprising: a plurality of workpiece support structures configured to hold no less than ten workpieces; anda workpiece holder mounted on a first surface of the boat, wherein the first surface is substantially solid and continuous and is over the plurality of workpiece support structures, and wherein the workpiece holder is configured to hold no greater than five workpieces. 16. A load lock chamber comprising: a first portion sized and shaped to accommodate no greater than four workpieces;a second portion sized and shaped to accommodate no less than ten workpieces; anda partition between the first portion and the second portion, the partition configured to sealably separate the first portion and the second portion. 17. The load lock chamber of claim 16, further comprising a metrology apparatus in the first portion. 18. The load lock chamber of claim 16, further comprising: a gas inlet providing fluid communication between the first portion and a cleaning fluid source;a heater configured to direct heat into the first portion; andan exhaust configured to exhaust fluid from the first portion. 19. The semiconductor workpiece boat of claim 15, wherein the workpiece holder is configured to hold no greater than two workpieces. 20. The load lock chamber of claim 16, wherein the first portion comprises an upper chamber configured to hold no greater than two workpieces.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (45)
Nering Eric A., Apparatus and method for automated cassette handling.
Maydan Dan (Los Altos Hills CA) Somekh Sasson (Redwood City CA) Wang David N. (Cupertino CA) Cheng David (San Jose CA) Toshima Masato (San Jose CA) Harari Isaac (Mountain View CA) Hoppe Peter D. (Sun, Multi-chamber integrated process system.
Fujiura Kazuo (Mito JPX) Ohishi Yasutake (Mito JPX) Fujiki Michiya (Mito JPX) Kanamori Terutoshi (Mito JPX) Takahashi Shiro (Mito JPX), Process for the preparation of fluoride glass and process for the preparation of optical fiber preform using the fluorid.
Takahashi Nobuaki (Hachioji JPX), Processing apparatus with means for rotating an object mounting means and a disk body located in the mounting means diff.
Yamagishi,Takayuki; Suwada,Masaei; Watanabe,Takeshi, Semiconductor processing apparatus comprising chamber partitioned into reaction and transfer sections.
Yamagishi,Takayuki; Watanabe,Takeshi, Semiconductor-manufacturing apparatus equipped with cooling stage and semiconductor-manufacturing method using same.
Goodwin Dennis L. (Tempe AZ) Crabb Richard (Mesa AZ) Robinson McDonald (Paradise Valley AZ) Ferro Armand P. (Scottsdale AZ), Wafer handling system with Bernoulli pick-up.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.