초록 ▼

The present invention discloses a non-quarter wave multilayer structure having a plurality of alternating low index of refraction material stacks and high index of refraction material stacks. The plurality of alternating stacks can reflect electromagnetic radiation in the ultraviolet region and a na

The present invention discloses a non-quarter wave multilayer structure having a plurality of alternating low index of refraction material stacks and high index of refraction material stacks. The plurality of alternating stacks can reflect electromagnetic radiation in the ultraviolet region and a narrow band of electromagnetic radiation in the visible region. The non-quarter wave multilayer structure, i.e. nLdL≠nHdH≠λ0/4, can be expressed as A 0.5 qH pL(qH pL)N 0.5 qH G, where q and p are multipliers to the quarter-wave thicknesses of high and low refractive index material, respectively, H is the quarter-wave thickness of the high refracting index material; L is the quarter-wave thickness of the low refracting index material; N represents the total number of layers between bounding half layers of high index of refraction material (0.5 qH); G represents a substrate and A represents air.

대표청구항 ▼

1. A multilayer structure comprising: a plurality of alternating layers of a low index of refraction material and a high index of refraction material;said plurality of alternating layers of said low index of refraction material and said high index of refraction material reflecting electromagnetic ra

1. A multilayer structure comprising: a plurality of alternating layers of a low index of refraction material and a high index of refraction material;said plurality of alternating layers of said low index of refraction material and said high index of refraction material reflecting electromagnetic radiation in the ultraviolet region and a narrow band of electromagnetic radiation in the visible region;said plurality of alternating layers of said low index of refraction material and said high index of refraction material having a layered structure described by [A 0.5 qH pL (qH pL)N 0.5 qH G], where:A represents air;q is a multiplier of a quarter-wave thickness of said high index of refraction material;H is the quarter wave thickness of the high refracting index material for a given wavelength λ0;p is a multiplier of a quarter-wave thickness of said low index of refraction material;L is the quarter-wave thickness of the low refracting index material for said given wavelength λ0;N represents the total number of layers between bounding half layers of said high index of refraction material; andG represents a substrate. 2. The multilayer structure of claim 1, wherein said plurality of alternating layers of said low index of refraction material and said high index of refraction material each have a non-quarter wave thickness. 3. The multilayer structure of claim 1, wherein said plurality of alternating layers of said low index of refraction material and said high index of refraction material reflect more than 70% of said electromagnetic radiation in the ultraviolet region and more than 60% of said narrow band of electromagnetic radiation in the visible region. 4. The multilayer structure of claim 1, wherein said plurality of alternating layers of said low index of refraction material and said high index of refraction material are made by a layer-by-layer process. 5. The multilayer structure of claim 4, wherein said low index of refraction material is made from SiO2 nanoparticles and said high index of refraction material is made from TiO2 nanoparticles. 6. The multilayer structure of claim 1, wherein said plurality of alternating layers of said low index of refraction material and said high index of refraction material are in the form of a flake. 7. The multilayer structure of claim 6, wherein said flake is a pigment for a paint. 8. The multilayer structure of claim 7, wherein said paint is an ultraviolet reflective structural color. 9. A process for making a multilayer structure that is an ultraviolet-reflective structural color, the process comprising: providing a low index of refraction material and a high index of refraction material;fabricating a first layer from the low index of refraction material;fabricating a second layer from the high index of refraction material adjacent to and in contact with the first layer;the first layer and the second layer having a thickness of pL and qH, respectively, and being part of an ultraviolet-reflective structural color layered structure described by [A 0.5 qH pL (qH pL)N 0.5 qH G], where:A represents air;q is a multiplier of a quarter-wave thickness of said high index of refraction material;H is the quarter wave thickness of the high refracting index material for a given wavelength λ0;p is a multiplier of a quarter-wave thickness of said low index of refraction material;L is the quarter-wave thickness of the low refracting index material for said given wavelength λ0;N represents the total number of layers between bounding half layers of said high index of refraction material; andG represents a substrate. 10. The process of claim 9, further including fabricating a plurality of alternating first layers and second layers. 11. The process of claim 10, wherein the plurality of first layers and second layers are fabricated using layer-by-layer processing.