Bulk acoustic wave devices and method for spurious mode suppression
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H03H-009/15
H03H-009/54
출원번호
US-0617036
(2009-11-12)
등록번호
US-8456257
(2013-06-04)
발명자
/ 주소
Fattinger, Gernot G.
출원인 / 주소
TriQuint Semiconductor, Inc.
대리인 / 주소
Schwabe Williamson & Wyatt
인용정보
피인용 횟수 :
21인용 특허 :
18
초록▼
A bulk acoustic wave resonator desirably suppressing spurious modes includes a frame-like structure of mass loading contacting one electrode, wherein the frame-like structure is defined within inner and outer boundaries and wherein a central area extends through the resonator within an envelope of t
A bulk acoustic wave resonator desirably suppressing spurious modes includes a frame-like structure of mass loading contacting one electrode, wherein the frame-like structure is defined within inner and outer boundaries and wherein a central area extends through the resonator within an envelope of the inner boundary and a border region extends through the resonator within the inner and outer boundaries of the frame-like structure. A second electrode is positioned within the envelope and substantially missing from within the border region. A layer of piezoelectric material is embedded between the first and second electrodes. An active resonator area is substantially within the central area. The resonator structure is carried on a substrate and an acoustically reflective mirror having multiple and alternating layers of low and high acoustic impedance material.
대표청구항▼
1. A resonator structure comprising: a first electrode;a frame-like structure of mass loading defined by inner and outer boundaries thereof, and wherein a central area extends through the resonator within an envelope of the inner boundary, and a border region extends through the resonator as defined
1. A resonator structure comprising: a first electrode;a frame-like structure of mass loading defined by inner and outer boundaries thereof, and wherein a central area extends through the resonator within an envelope of the inner boundary, and a border region extends through the resonator as defined within the inner and outer boundaries of the frame-like structure;a second electrode opposing the first electrode, the second electrode positioned within the envelope wherein the second electrode is absent from at least half the border region, thus substantially missing therefrom; anda layer of piezoelectric material embedded between the first and second electrodes, wherein an active resonator area is substantially within the central area and substantially missing from within the border region;wherein the frame-like structure of mass loading is embedded within multiple layers of the first electrode, or the frame-like structure of mass loading is embedded between the layer of piezoelectric material and the first electrode. 2. The resonator structure according to claim 1, wherein an outer edge of the second electrode is generally aligned with the inner boundary of the frame-like structure. 3. The resonator structure according to claim 1, wherein an outer edge of the first electrode is generally aligned with the outer boundary of the frame-like structure. 4. The resonator structure according to claim 1, wherein the frame-like structure comprises at least one of a single metal and alloy. 5. The resonator structure according to claim 4, wherein the single metal comprises tungsten, and wherein the alloy comprises AlCu. 6. The resonator structure according to claim 1, wherein the frame-like structure includes open pathways sufficient for receiving electrical leads therethrough. 7. The resonator stricture according to claim 1, wherein the frame-like structure comprises the mass loading distributed throughout at least half of the border region. 8. The resonator structure according to claim 1, wherein the frame-like structure comprises a rectangular shaped ring having an opening therein forming the inner boundary. 9. The resonator structure according to claim 1, wherein at least one of the first and second electrodes and the frame-like structure comprise multiple layers. 10. The resonator structure according to claim 9, wherein the multiple layers comprise multiple metallic layers comprising at least one of a metal and an alloy. 11. The resonator structure according to claim 10, wherein the metallic layers comprise tungsten and AlCu. 12. The resonator structure according to claim 1, wherein the first electrode is formed from a metallic material characterized by a first density and the frame-like structure is formed from a metallic material characterized by a second density, and wherein the second density is greater than the first density. 13. The resonator structure according to claim 1, wherein the piezoelectric material comprises AlN. 14. The resonator structure according to claim 1, further comprising a substrate, wherein one of the first and second electrodes is supported thereby. 15. The resonator structure according to claim 14, wherein the substrate comprises a cavity therein, the cavity extending only within the central area and sufficient for providing an acoustic mirror. 16. The resonator structure according to claim 14, wherein the substrate comprises silicon. 17. The resonator structure according to claim 1, further comprising an acoustically reflective mirror proximate one of the first and second electrodes. 18. The resonator structure according to claim 17, wherein the reflective mirror comprises multiple and alternating layers of low and high acoustic impedance material. 19. The resonator structure according to claim 18, wherein the low acoustic impedance material is adjacent the one electrode. 20. The resonator structure according to claim 18, wherein the layers of low acoustic impedance comprise SiOx and the layers of high acoustic impedance comprise AlN. 21. The resonator structure according to claim 18, wherein a thickness dimension of each layer is about a quarter of an acoustic wavelength of the resonator structure. 22. The resonator structure according to claim 17, wherein the reflective mirror comprises a cavity therein, the cavity extending only within the central area and adjacent the electrode. 23. A resonator structure comprising: a first electrode;a frame-like structure of mass loading adjacent the first electrode, wherein the frame-like structure is defined within inner and outer boundaries thereof, and wherein a central area extends through the resonator within an envelope of the inner boundary, and a border region extends through the resonator as defined within the inner and outer boundaries of the frame-like structure, and wherein the frame-like structure includes open pathways sufficient for receiving electrical leads therethrough;a second electrode opposing the first electrode, the second electrode positioned within the envelope;a substrate supporting one of the first and second electrodes and comprising a cavity therein, the cavity extending only within the central area and sufficient for providing an acoustic mirror; anda layer of piezoelectric material embedded between the first and second electrodes, wherein an active resonator area is substantially within the central area and is substantially missing from within the border region. 24. A resonator structure comprising: a first electrode;a frame-like structure of mass loading adjacent the first electrode, wherein the frame-like structure is defined within inner and outer boundaries thereof, and wherein a central area extends through the resonator within an envelope of the inner boundary, and a border region extends through the resonator as defined within the inner and outer boundaries of the frame-like structure;a second electrode opposing the first electrode, the second electrode positioned within the envelope wherein the second electrode is absent from at least half the border region, thus substantially missing therefrom;an acoustically reflective mirror proximate one of the first and second electrodes and comprising a cavity therein, the cavity extending only within the central area and adjacent the electrode; anda layer of piezoelectric material embedded between the first and second electrodes, wherein an active resonator area is substantially within the central area and is substantially missing from within the border region.
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