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Liquid crystal display device

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G02F-001/136
  • H01L-027/14
출원번호 US-0681880 (2012-11-20)
등록번호 US-8462286 (2013-06-11)
우선권정보 JP-2007-179092 (2007-07-06)
발명자 / 주소
  • Yamazaki, Shunpei
  • Suzuki, Yukie
  • Kuwabara, Hideaki
  • Kimura, Hajime
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd.
대리인 / 주소
    Robinson, Eric J.
인용정보 피인용 횟수 : 2  인용 특허 : 56

초록

A method of manufacturing, with high mass productivity, liquid crystal display devices having highly reliable thin film transistors with excellent electric characteristics is provided. In a liquid crystal display device having an inverted staggered thin film transistor, the inverted staggered thin f

대표청구항

1. A liquid crystal display device comprising: a gate wiring;a transistor comprising a first semiconductor layer, a second semiconductor layer including an impurity element imparting one conductivity type, and a part of the gate wiring;a liquid crystal element comprising a first electrode, a second

이 특허에 인용된 특허 (56)

  1. Iwakabe, Yasushi; Ohta, Masuyuki; Matsuyama, Shigeru; Oaku, Hitoshi; Kondo, Katsumi, Active matrix type liquid crystal display and liquid crystal material.
  2. Kawai Katsuhiro,JPX ; Yamakawa Shinya,JPX ; Yabuta Satoshi,JPX ; Ban Atsushi,JPX, Actived matrix substrate having a transistor with multi-layered ohmic contact.
  3. Shunpei Yamazaki JP; Kenji Itoh JP; Shigenori Hayashi JP, Apparatus for fabricating coating and method of fabricating the coating.
  4. Yamazaki, Shunpei; Itoh, Kenji; Hayashi, Shigenori, Apparatus for fabricating coating and method of fabricating the coating.
  5. Yamazaki, Shunpei; Itoh, Kenji; Hayashi, Shigenori, Apparatus for fabricating coating and method of fabricating the coating.
  6. Tsubata,Toshihide; Tokuda,Tsuyoshi; Hashimoto,Yuhko; Kinai,Yoshinori; Tsuji,Masayuki, Color filter substrate, method of making the color filter substrate and display device including the color filter substrate.
  7. Miyazaki Daisuke,JPX ; Kurauchi Shoichi,JPX ; Hatoh Hitoshi,JPX ; Yamamoto Takeshi,JPX ; Midorikawa Teruyuki,JPX, Color liquid crystal display apparatus.
  8. Miyazaki Daisuke,JPX ; Kurauchi Shoichi,JPX ; Hatoh Hitoshi,JPX ; Yamamoto Takeshi,JPX ; Midorikawa Teruyuki,JPX, Color liquid crystal display apparatus.
  9. Yamazaki, Shunpei; Kuwabara, Hideaki, Display device including a color filter or color filters over a pixel portion and a driving circuit for driving the pixel portion.
  10. Yamazaki, Shunpei; Goto, Yuugo, Electro-optical device.
  11. Yamazaki,Shunpei, Electro-optical device.
  12. Yamazaki Shunpei,JPX, Electro-optical device and method for manufacturing the same.
  13. Yamazaki Shunpei,JPX, Electro-optical device and method for manufacturing the same.
  14. Yamazaki Shunpei,JPX, Electro-optical device and method for manufacturing the same.
  15. Yamazaki,Shunpei, Electro-optical device and method for manufacturing the same.
  16. Yamazaki,Shunpei, Electro-optical device and method for manufacturing the same.
  17. Yamazaki Shunpei (Tokyo JPX), Electro-optical device constructed with thin film transistors.
  18. Yamazaki Shunpei,JPX, Electro-optical device including thin film transistors having spoiling impurities added thereto.
  19. Yamazaki, Shunpei, Electro-optical device which comprises thin film transistors and method for manufacturing the same.
  20. Zhang Hongyong (Kanagawa JPX) Kusumoto Naoto (Kanagawa JPX), Electro-optical device with amorphous and crystalline shift registers.
  21. Yamazaki, Shunpei, Gate insulated field effect transistor and method of manufacturing the same.
  22. Yamazaki Shunpei (Tokyo JPX), Gate insulated field effect transistors and method of manufacturing the same.
  23. Yamazaki Shunpei (Tokyo JPX), Gate insulated field effect transistors and method of manufacturing the same.
  24. Yamazaki Shunpei,JPX, Gate insulated field effect transistors and method of manufacturing the same.
  25. Yamazaki Shunpei,JPX, Gate insulated field effect transistors and method of manufacturing the same.
  26. Yamazaki Shunpei,JPX ; Itoh Kenji,JPX ; Hayashi Shigenori,JPX, Hard carbon coating for magnetic recording medium.
  27. Murouchi Katsunori,JPX, LCD cell having two supporting gap members different in height.
  28. Yamazaki Shunpei (Tokyo JPX), LCD having a peripheral circuit with TFTs having the same structure as TFTs in the display region.
  29. Nishimura, Joji; Uehara, Takaya, Liquid crystal device and electronic apparatus.
  30. Daisuke Miyazaki JP; Shoichi Kurauchi JP; Hitoshi Hatoh JP; Akiko Ueno JP; Teruyuki Midorikawa JP; Makoto Hasegawa JP, Liquid crystal display device.
  31. Hirokazu Morimoto JP; Tetsuya Nishino JP, Liquid crystal display device.
  32. Miyazaki Daisuke,JPX ; Kurauchi Shoichi,JPX ; Hatoh Hitoshi,JPX ; Midorikawa Teruyuki,JPX, Liquid crystal display device.
  33. Miyazaki Daisuke,JPX ; Kurauchi Shoichi,JPX ; Hatoh Hitoshi,JPX ; Ueno Akiko,JPX ; Midorikawa Teruyuki,JPX ; Hasegawa Makoto,JPX, Liquid crystal display device.
  34. Miyazaki, Daisuke; Kurauchi, Shoichi; Hatoh, Hitoshi; Ueno, Akiko; Midorikawa, Teruyuki; Hasegawa, Makoto, Liquid crystal display device.
  35. Yamazaki, Shunpei; Suzuki, Yukie; Kuwabara, Hideaki; Kimura, Hajime, Liquid crystal display device.
  36. Ikeda, Masahiro; Sawasaki, Manabu; Taniguchi, Yoji; Inoue, Hiroyasu; Tanose, Tomonori; Tanaka, Yoshinori, Liquid crystal display device and method of manufacturing the same without scattering spacers.
  37. Kurauchi Shoichi,JPX ; Miyazaki Daisuke,JPX ; Hatoh Hitoshi,JPX ; Akiyoshi Muneharu,JPX ; Midorikawa Teruyuki,JPX, Liquid crystal display device comprising switching elements of reverse stagger type and common electrode formed over th.
  38. Hirakata, Yoshiharu; Nishi, Takeshi; Yamazaki, Shunpei, Liquid crystal display device having a gap retaining member made of resin formed directly over the driver circuit.
  39. Nakamura Hiroki,JPX, Liquid crystal display device having the driving circuit disposed in the seal area, with different spacer density in driving circuit area than display area.
  40. Miyazaki Daisuke,JPX ; Kurauchi Shoichi,JPX ; Hatoh Hitoshi,JPX ; Midorikawa Teruyuki,JPX, Liquid crystal display device spacers formed from stacked color layers.
  41. Yamazaki Shunpei,JPX ; Itoh Kenji,JPX ; Hayashi Shigenori,JPX, Method for fabricating with ultrasonic vibration a carbon coating.
  42. Maegawa Shigeki,JPX ; Furuta Mamoru,JPX ; Tsutsu Hiroshi,JPX ; Kawamura Tetsuya,JPX ; Miyata Yutaka,JPX, Method for forming polycrystalline thin film and method for fabricating thin-film transistor.
  43. Yamazaki Shunpei,JPX ; Itoh Kenji,JPX ; Hayashi Shigenori,JPX, Method of fabricating the coating.
  44. Zhang, Hongyong; Kusumoto, Naoto, Method of manufacturing a semiconductor device.
  45. Hirakata, Yoshiharu; Nishi, Takeshi; Yamazaki, Shunpei, Method of manufacturing an electro-optical device.
  46. Yoshiharu Hirakata JP; Takeshi Nishi JP; Shunpei Yamazaki JP, Method of manufacturing an electro-optical device.
  47. Lim, Byoung Ho, Method of manufacturing array substrate for liquid crystal display device.
  48. Lim,Byoung Ho, Method of manufacturing array substrate for liquid crystal display device.
  49. Yamazaki Shunpei (21-21 Kitakarasuyama 7-chome ; Setagaya-ku Tokyo JPX), Photoelectric conversion semiconductor and manufacturing method thereof.
  50. Akimoto,Kengo; Murakami,Satoshi, Semiconductor device having a wiring including an aluminum carbon alloy and titanium or molybdenum.
  51. Yamazaki Shunpei,JPX, Semiconductor device having crystalline silicon clusters.
  52. Ohnuma, Hideto; Nagai, Masaharu; Osame, Mitsuaki; Sakakura, Masayuki; Komori, Shigeki; Yamazaki, Shunpei, Semiconductor device manufacturing method.
  53. Sawasaki, Manabu; Takagi, Takashi; Tanose, Tomonori, Substrate for liquid crystal display device, manufacturing method of the same, and liquid crystal display device having the same.
  54. Morita, Hiromasa; Nakashima, Ken, Thin film transistor array, fabrication method thereof, and liquid crystal display device employing the same.
  55. Hiramatsu Masato (Tokyo JPX) Kamimura Takaaki (Kawasaki JPX) Nakajima Mitsuo (Koshigaya JPX), Thin film transistor with nitrogen concentration gradient.
  56. Shui-Chih A. Lien ; Shuhichi Odahara JP; Yukito Saitoh JP, Wide viewing angle liquid crystal with ridge/slit pretilt, post spacer and dam structures and method for fabricating same.

이 특허를 인용한 특허 (2)

  1. Yamazaki, Shunpei; Sakata, Junichiro; Sakakura, Masayuki; Oikawa, Yoshiaki; Okazaki, Kenichi; Maruyama, Hotaka, Semiconductor device and manufacturing method thereof.
  2. Yamazaki, Shunpei; Sakata, Junichiro; Sakakura, Masayuki; Oikawa, Yoshiaki; Okazaki, Kenichi; Maruyama, Hotaka, Semiconductor device and manufacturing method thereof.
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