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Flexible membrane for carrier head 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B24B-005/35
출원번호 US-0104711 (2011-05-10)
등록번호 US-8469776 (2013-06-25)
발명자 / 주소
  • Zuniga, Steven M.
  • Nagengast, Andrew J.
  • Oh, Jeonghoon
출원인 / 주소
  • Applied Materials, Inc.
대리인 / 주소
    Fish & Richardson P.C.
인용정보 피인용 횟수 : 9  인용 특허 : 31

초록

A carrier head that has a base assembly, a retaining ring assembly, a carrier ring, and a flexible membrane is described. The flexible membrane has a main portion and an outer annular portion, wherein a junction between the main portion and the outer annular portion comprises a peripheral edge hinge

대표청구항

1. A flexible membrane, comprising: a main portion with a lower surface to provide a substrate-mounting surface; andan outer annular portion extending substantially vertically from an outer edge of the main portion, wherein the outer annular portion comprises a lower edge connected to the main porti

이 특허에 인용된 특허 (31)

  1. Nakashiba Masamichi,JPX ; Kimura Norio,JPX ; Watanabe Isamu,JPX ; Hasegawa Yoko,JPX, Apparatus for and method of polishing workpiece.
  2. Zuniga Steven ; Chen Hung ; Birang Manoocher, Carrier head for chemical mechanical polishing a substrate.
  3. Zuniga Steven M. ; Chen Hung Chih, Carrier head for chemical mechanical polishing a substrate.
  4. Chen,Hung Chih; Zuniga,Steven M., Carrier head for thermal drift compensation.
  5. Perlov Ilya ; Gantvarg Eugene ; Ko Sen-Hou, Carrier head with a flexible membrane for a chemical mechanical polishing system.
  6. Perlov, Ilya; Gantvarg, Eugene; Ko, Sen-Hou, Carrier head with a flexible membrane to form multiple chambers.
  7. Chen, Hung Chih; Tseng, Ming Kuei; Zuniga, Steven, Carrier head with a substrate detector.
  8. Zuniga, Steven M.; Tseng, Ming-Kuei, Carrier head with edge load retaining ring.
  9. Zuniga, Steven M.; Chen, Hung Chih; Tseng, Ming Kuie, Carrier head with flexible membranes to provide controllable pressure and loading area.
  10. Tseng,Ming Kuei; Zuniga,Steven M., Carrier head with gimbal mechanism.
  11. Steven M. Zuniga ; Hung Chih Chen ; Ming Kuie Tseng, Carrier head with multi-part flexible membrane.
  12. Zuniga, Steven M., Carrier head with non-contact retainer.
  13. Zuniga, Steven M.; Nagengast, Andrew J.; Oh, Jeonghoon, Carrier head with retaining ring and carrier ring.
  14. Zuniga, Steven M.; Nagengast, Andrew J.; Oh, Jeonghoon, Carrier head with retaining ring and carrier ring.
  15. Zuniga, Steven M.; Nagengast, Andrew J.; Oh, Jeonghoon, Carrier ring for carrier head.
  16. Maloney,Gerard S.; Chin,Scott; Geraghty,John J.; Dyson, Jr.,William; Dickey,Tanlin K., Chemical mechanical polishing head assembly having floating wafer carrier and retaining ring.
  17. Zuniga, Steven M.; Nagengast, Andrew J.; Oh, Jeonghoon, Flexible membrane for carrier head.
  18. Zuniga, Steven M.; Nagengast, Andrew J.; Oh, Jeonghoon, Flexible membrane for carrier head.
  19. Chen,Hung Chih; Oh,Jeonghoon; Zuniga,Steven M., Flexible membrane for multi-chamber carrier head.
  20. Chen, Hung Chih; Tseng, Ming Kuei; Zuniga, Steven, Method of detecting a substrate in a carrier head.
  21. Chen, Hung Chih; Zuniga, Steven M., Multi-chamber carrier head with a flexible membrane.
  22. Chen,Hung Chih; Oh,Jeonghoon; Siu,Tsz Sin; Brezoczky,Thomas; Zuniga,Steven M., Multiple zone carrier head with flexible membrane.
  23. Frank Gasparik, PCI-X driver control.
  24. Gonzalez Jose ; Jordan Dave ; Tudhope Andrew, Recyclable retaining ring assembly for a chemical mechanical polishing apparatus.
  25. Zuniga, Steven M.; Nagengast, Andrew J.; Oh, Jeonghoon, Retaining ring, flexible membrane for applying load to a retaining ring, and retaining ring assembly.
  26. Mitchel Fred E. ; Adams John A. ; Bibby Thomas Frederick A., Semiconductor wafer polishing apparatus with a variable polishing force wafer carrier head.
  27. Chen,Hung Chih; Zuniga,Steven M.; Siu,Tsz Sin, Substrate removal from polishing tool.
  28. Prince, John, Substrate retaining ring.
  29. Kobayashi Tatsunori,JPX ; Tanaka Hiroshi,JPX ; Rikita Naoki,JPX, Wafer holding head and wafer polishing apparatus, and method for manufacturing wafers.
  30. Cesna Joseph V. ; Kim Inki, Wafer polishing carrier and ring extension therefor.
  31. Seiji Katsuoka JP; Hozumi Yasuda JP; Tadakazu Sone JP; Shunichiro Kojima JP; Manabu Tsujimura JP, Workpiece polishing apparatus comprising a fluid pressure bag provided between a pressing surface and the workpiece and method of use thereof.

이 특허를 인용한 특허 (9)

  1. Fukushima, Makoto; Yasuda, Hozumi; Nabeya, Osamu; Watanabe, Katsuhide; Namiki, Keisuke, Elastic membrane for semiconductor wafer polishing.
  2. Yamaki, Satoru; Fukushima, Makoto; Namiki, Keisuke; Nabeya, Osamu; Togashi, Shingo; Owada, Tomoko; Kishimoto, Masahiko, Elastic membrane for semiconductor wafer polishing.
  3. Fukushima, Makoto; Yasuda, Hozumi; Namiki, Keisuke; Nabeya, Osamu; Togashi, Shingo; Yamaki, Satoru, Elastic membrane for semiconductor wafer polishing apparatus.
  4. Fukushima, Makoto; Yasuda, Hozumi; Namiki, Keisuke; Nabeya, Osamu; Togashi, Shingo; Yamaki, Satoru, Elastic membrane for semiconductor wafer polishing apparatus.
  5. Fukushima, Makoto; Yasuda, Hozumi; Namiki, Keisuke; Nabeya, Osamu; Togashi, Shingo; Yamaki, Satoru, Elastic membrane for semiconductor wafer polishing apparatus.
  6. Fukushima, Makoto; Yasuda, Hozumi; Namiki, Keisuke; Nabeya, Osamu; Togashi, Shingo; Yamaki, Satoru, Elastic membrane for semiconductor wafer polishing apparatus.
  7. Chen, Hung Chih; Gurusamy, Jay; Dandavate, Gautam S.; Hsu, Samuel Chu-Chiang, Methods and apparatus for an improved polishing head retaining ring.
  8. Choi, Yun-Seok; Ryu, Chang-Gil; Song, Geun-Young; Chu, Ki-Yeon; Hong, Jin-Suk, Polishing head and polishing carrier apparatus having the same.
  9. Leighton, Jamie Stuart; Meyer, Stacy; Paik, Young J., Reinforcement ring for carrier head.
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