IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0989154
(2006-08-01)
|
등록번호 |
US-8480795
(2013-07-09)
|
국제출원번호 |
PCT/US2006/029894
(2006-08-01)
|
§371/§102 date |
20090803
(20090803)
|
국제공개번호 |
WO2007/021531
(2007-02-22)
|
발명자
/ 주소 |
- Siskin, Michael
- Katritzky, Alan R.
- Wang, Frank C
|
출원인 / 주소 |
- ExxonMobil Research and Engineering Company
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
13 인용 특허 :
18 |
초록
▼
An acid gas absorbent comprising a metal sulfonate, phosphonate or carboxylate of a hindered amine and a process for the selective removal Of H2S as well as other acidic components such as carbon disulfide, carbonyl sulfide and oxygen and sulfur derivatives of C1 to C4 hydrocarbons from mixtures con
An acid gas absorbent comprising a metal sulfonate, phosphonate or carboxylate of a hindered amine and a process for the selective removal Of H2S as well as other acidic components such as carbon disulfide, carbonyl sulfide and oxygen and sulfur derivatives of C1 to C4 hydrocarbons from mixtures containing such acidic components and CO2 using said absorbent.
대표청구항
▼
1. An absorbent for the selective absorption of H2S from gaseous mixtures containing H2S and CO2, said absorbent having the formula: wherein R1 is a tertiary C4-C9 alkyl group, R2, R3 and R4 are the same or different and selected from hydrogen, C1-C9 substituted or unsubstituted alkyl C3-C9 substit
1. An absorbent for the selective absorption of H2S from gaseous mixtures containing H2S and CO2, said absorbent having the formula: wherein R1 is a tertiary C4-C9 alkyl group, R2, R3 and R4 are the same or different and selected from hydrogen, C1-C9 substituted or unsubstituted alkyl C3-C9 substituted or unsubstituted branched chain alkyl, C3-C9 cycloalkyl, C6-C9 aryl, alkylaryl or arylalkyl, C2-C9 straight or branched hydroxyalkyl, hydroxy cycloalkyl wherein (i) when n is 2 or more, R3 and R4 on adjacent carbon or on carbons separated by one or more carbons can be a cycloalkyl or aryl ring, (ii) when substituted, the substituents are heteroatom containing substituents, (iii)n is an integer of 1 or more, and (iv) metal cation is a monovalent, divalent or trivalent metal cation sufficient to satisfy the valence requirements of the anion or anion cluster. 2. A process for the selective absorption of H2S from gaseous mixtures of H2S, CO2 and non-acidic comonents by contacting said mixture with an absorbent amino-containing solution comprising an absorbent having the formula: wherein R1 is a tertiary C4-C9 alkyl group, R2, R3 and R4 are the same or different and selected from hydrogen, C1-C9 substituted or unsubstituted alkyl C3-C9 substituted or unsubstituted branched chain alkyl, C3-C9 cycloalkyl, C6-C9 aryl, alkylaryl or arylalkyl, C2-C9 straight or branched hydroxyalkyl, hydroxy cycloalkyl wherein (i) when n is 2 or more, R3 and R4 on adjacent carbon or on carbons separated by one or more carbons can be a cycloalkyl or aryl ring, (ii) when substituted, the substituents are heteroatom containing substituents, (iii) n is an integer of 2 or more, and (iv) metal cation is one or more monovalent, divalent or trivalent metal cation sufficient to satisfy the valence requirement of the anion or anion cluster, under conditions whereby the H2S is selectively absorbed from said mixture. 3. The absorbent of claim 1 having the formula: in which R1 is a tertiary C4-C9 alkyl group, R2, R3 and R4 are hydrogen, n is 1, 2, 3 or 4 and metal cation is Na. 4. The absorbent of claim 3 in which R1 is tertiary butyl. 5. The process of claim 2 in which the absorbent comprises a compound of the formula: in which R1 is a tertiary C4-C9 alkyl group, R2, R3 and R4 are hydrogen, n is 1, 2, 3 or 4 and metal cation is Na. 6. The process of claim 5 in which R1 is tertiary butyl.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.