IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0631832
(2012-09-28)
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등록번호 |
US-8480961
(2013-07-09)
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발명자
/ 주소 |
- Hassan, Abbas
- Hassan, Aziz
- Anthony, Rayford G.
- Viswanathan, Krishnan
- Borsinger, Gregory G.
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출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
1 인용 특허 :
137 |
초록
▼
Herein disclosed is a system for hydrating an alkylene oxide that includes a high shear device configured to form a dispersion of an alkylene oxide and water, the high shear device comprising a rotor, a stator, and a catalytic surface, wherein the dispersion comprises gas bubbles with an average gas
Herein disclosed is a system for hydrating an alkylene oxide that includes a high shear device configured to form a dispersion of an alkylene oxide and water, the high shear device comprising a rotor, a stator, and a catalytic surface, wherein the dispersion comprises gas bubbles with an average gas bubble diameter of less than about 5 μm; a pump configured for delivering a liquid stream to the high shear device; and a reactor coupled to the high shear device, and configured to receive the dispersion from the high shear device, wherein the alkylene oxide is hydrated in the reactor.
대표청구항
▼
1. A system for hydrating an alkylene oxide comprising: a high shear device configured to form a dispersion of an alkylene oxide and water, the high shear device comprising a rotor, a stator, and a catalytic surface, wherein the rotor and the stator are separated by a shear gap in the range of from
1. A system for hydrating an alkylene oxide comprising: a high shear device configured to form a dispersion of an alkylene oxide and water, the high shear device comprising a rotor, a stator, and a catalytic surface, wherein the rotor and the stator are separated by a shear gap in the range of from about 0.02 mm to about 5 mm, and wherein the dispersion comprises gas bubbles with an average gas bubble diameter of less than about 5 μm;a pump configured for delivering a liquid stream to the high shear device; anda reactor coupled to the high shear device, and configured to receive the dispersion from the high shear device, wherein the alkylene oxide is hydrated in the reactor. 2. The system of claim 1, wherein the high shear device comprises a second rotor and a second stator. 3. The system of claim 1, wherein the high shear device is operable at a rotor tip speed greater than about 23 m/s (4,500 ft/min). 4. The system of claim 3, wherein the high shear device operates with a flow rate of at least 300 L/h. 5. The system of claim 1, wherein the high shear device is configured to provide an energy expenditure greater than about 1000 W/m3. 6. The system of claim 1, the system further comprising a second high shear device. 7. The system of claim 1, the system comprising a fixed bed reactor, the fixed bed reactor further comprising a hydration catalyst. 8. The system of claim 1, wherein the high shear device comprises at least a second rotor and a second stator operable at a different shear rate from the rotor and the stator, and wherein each of the second rotor and the second stator comprise a toothed surface. 9. A system for hydrating an alkylene oxide comprising: a high shear device configured to form a dispersion of an alkylene oxide and water, the high shear device comprising a rotor, a stator, and a catalytic surface, wherein the dispersion comprises gas bubbles with an average gas bubble diameter in the range of about 100 nm to about 5 μm;a pump configured for delivering a liquid stream to the high shear device; anda reactor configured to receive the dispersion from the high shear device, wherein the alkylene oxide is hydrated in the reactor. 10. The system of claim 9, wherein the high shear device comprises a second rotor and a second stator, and wherein the high shear device is operable at a tip speed of the rotor of greater than about 23 m/s (4,500 ft/min). 11. The system of claim 10, wherein the high shear device operates with a flow rate of at least 300 L/h, and wherein the high shear device is configured to provide an energy expenditure greater than about 1000 W/m3. 12. The system of claim 9, the system further comprising a second high shear device. 13. The system of claim 9, the system further comprising a fixed bed reactor with a hydration catalyst disposed therein. 14. The system of claim 13, wherein the high shear device comprises a catalytic surface. 15. The system of claim 14, wherein the alkylene oxide comprises ethylene oxide, propylene oxide, butylene oxide, or combinations thereof. 16. The system of claim 14, wherein the high shear mixing operates with a shear rate in the range of about 20,000 s−1 to about 1,600,000 s−1. 17. The system of claim 14, wherein the hydration catalyst or the catalytic surface comprises an amine, an acid catalyst, an organometallic compound, an alkali metal halide, a quaternary ammonium halide, zeolites, or combinations thereof. 18. The system of claim 17, wherein the alkylene oxide is hydrated to form ethylene glycol. 19. A system for hydrating an alkylene oxide comprising: a high shear device configured to form a dispersion of an alkylene oxide and water, the high shear device comprising a rotor and a stator separated by a shear gap in the range of from about 0.02 mm to about 5 mm, wherein the dispersion comprises gas bubbles with an average gas bubble diameter in the range of about 100 nm to about 5 μm; anda reactor configured to receive the dispersion from the high shear device, wherein the alkylene oxide is hydrated in the reactor to form one of polyethylene glycol or ethylene glycol. 20. The system of claim 19, wherein the high shear device is operable with a shear rate in the range of about 20,000 s−1 to about 1,600,000 s−1.
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