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Coating apparatus including a glove part and a controller for stopping coating 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B05C-011/00
  • B05C-013/00
  • H01L-021/00
출원번호 US-0874117 (2010-09-01)
등록번호 US-8485126 (2013-07-16)
우선권정보 JP-2009-207141 (2009-09-08)
발명자 / 주소
  • Miyamoto, Hidenori
  • Maruyama, Kenji
  • Hirakawa, Tadahiko
  • Misumi, Koichi
출원인 / 주소
  • Tokyo Ohka Kogyo Co., Ltd.
대리인 / 주소
    Knobbe Martens Olson & Bear LLP
인용정보 피인용 횟수 : 2  인용 특허 : 29

초록

A coating apparatus including a coating part which applies a liquid material including an oxidizable metal on a substrate; a chamber having a coating section in which the coating part applies the liquid material on the substrate and a transport section into which the liquid material is transported;

대표청구항

1. A coating apparatus comprising: a coating part comprising a slit nozzle which applies a liquid material including an oxidizable metal on a substrate;a glove part which provides access to the coating part by an operator;a chamber comprising a coating section in which the coating part applies the l

이 특허에 인용된 특허 (29)

  1. Sarkozy Robert F. (85 Concord Rd. Westford MA 01886), Apparatus for chemical vapor deposition with clean effluent and improved product yield.
  2. Rosenblum Mark D. (Woburn MA) Hanoka Jack I. (Brookline MA), Apparatus for forming diffusion junctions in solar cell substrates.
  3. Klein,Richard G., Closed loop adhesive registration system.
  4. Usami,Mamoru; Tanaka,Kazushi; Yoneyama,Kenji; Kaneko,Yukio; Umega,Takeshi, Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object.
  5. Yoneyama,Kenji; Tanaka,Kazushi; Usami,Mamoru, Electron beam irradiation apparatus, electron beam irradiation method, and apparatus for and method of manufacturing disc-shaped object.
  6. Wang, Chau-Jong; Yang, Mong-Yuan, Extracts of sacred water lotus for the treatment of cancer.
  7. Kawamura, Daisuke, Film forming apparatus, manufacturing management system and method of manufacturing semiconductor devices.
  8. Ina, Hideki; Sentoku, Koichi; Matsumoto, Takahiro, Foreign substance inspecting method and apparatus, which detect a height of a foreign substance, and an exposure apparatus using this inspecting apparatus.
  9. Tom Glenn M. (New Milford CT), In-line detector system for real-time determination of impurity concentration in a flowing gas stream.
  10. Novotny Jerome L. (17700 Darden Rd. South Bend IN 46635) Nickerson ; Sr. Roy S. (340 Marvel La. New Carlisle IN 46552), Inert atmosphere chamber.
  11. Fujii Hiroyuki,JPX, Ink jet printer for monitoring and removing thickened ink from print head.
  12. Riley John A. (905 Richmar Dr. Westlake OH 44145), Method and apparatus for automated polymeric film coating.
  13. Bornside David E. (Arlington MA) Brown Robert A. (Winchester MA), Method for low pressure spin coating and low pressure spin coating apparatus.
  14. Merkel Stephen L. (380 Oakmoor Bay Village OH 44140) Miller Scott R. (10845 Shagbark Trail Roswell GA 30075) Becker Kevin C. (23147 Hilliard Blvd. Westlake OH 44145), Method of monitoring parameters of coating material dispensing systems and processes by analysis of swirl pattern dynami.
  15. Nanbu Mitsuhiro,JPX ; Iida Naruaki,JPX ; Gotou Hideaki,JPX ; Tateyama Masanori,JPX ; Yoshimoto Yuji,JPX ; Ishimoto Tomoko,JPX ; Yaegashi Hidetami,JPX ; Kawakami Yasunori,JPX ; Fukuda Takahide,JPX ; F, Method of substrate processing to form a film on multiple target objects.
  16. Rothchild Ronald D. (South Orange NJ), Methods and apparatus for recovering solvents.
  17. Zwaap,Robert F.; Berens,Troy; Tuttle,John R., Methods and apparatus for treating a work piece with a vaporous element.
  18. Gimben Dale N. (Grafton OH) Leidy Jeanne M. (Rocky River OH) Rucki William M. (Aurora OH) Heimburger Jeffrey (Evansville IN), Powder coating system with dew-point detection.
  19. Eberspacher Chris (Los Angeles CA) Ermer James H. (Burbank CA) Mitchell Kim W. (Granada Hill CA), Process for making thin film solar cell.
  20. Gladfelter Wayne L. (St. Paul MN) Mantell Daniel R. (Minneapolis MN) Evans John F. (Minneapolis MN) Schulze Roland K. (Minneapolis MN), Process for metal nitride deposition.
  21. Page, Geoffrey A.; Tokoli, Emery G.; Cosgrove, Robert T.; Spiewak, John W., Process for preparing a phthalocyanine.
  22. Yaegashi Hidetami,JPX ; Fan Qi,JPX, Processing apparatus and method.
  23. Kishkovich Oleg P. ; Kinkead Devon A., Protection of semiconductor fabrication and similar sensitive processes.
  24. Rangarajan, Bharath; Subramanian, Ramkumar; Phan, Khoi A.; Quinto, Ursula Q.; Templeton, Michael T., Recirculation and reuse of dummy dispensed resist.
  25. Sano Hideo,JPX ; Takimoto Hiroshi,JPX ; Nishimura Toru,JPX ; Yamada Masahiro,JPX ; Hirasa Takashi,JPX, Recording liquid and recording method according to ink-jet recording system using the same.
  26. Mitzi, David B, Solution deposition of chalcogenide films.
  27. Minamida, Junya; Ishida, Seiki, Substrate processing system.
  28. Doley Allan ; Goodwin Dennis ; O'Neill Kenneth ; Vrijburg Gerben ; Rodriguez David, System and method for reducing particles in epitaxial reactors.
  29. Choi Sun-jip,KRX ; Kim Jong-kwan,KRX ; Jang Ill-jin,KRX, Wafer spin coating system with photoresist pumping unit check function.

이 특허를 인용한 특허 (2)

  1. Woelk, Egbert; DiCarlo, Ronald L., Evaporation vessel apparatus and method.
  2. Feygelman, Alex; Cohen, Zvika; Arenson, Mordechai; Yosef, Ziv, To apply a fluid to a substrate.
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