L'Air Liquide Societe Anonyme pour l'Etude et l'Exploitation des Procedes Georges Claude
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초록▼
A cryogenic installation unit comprises at least one item of equipment (2, 6A to 6H, 15) to be thermally insulated, a structure (1) for containing the at least one item of equipment, a main insulation (3) contained in the structure and, associated with this main insulation, a secondary insulation (5
A cryogenic installation unit comprises at least one item of equipment (2, 6A to 6H, 15) to be thermally insulated, a structure (1) for containing the at least one item of equipment, a main insulation (3) contained in the structure and, associated with this main insulation, a secondary insulation (5) of lower thermal conductivity than the main insulation, said secondary insulation (5) consisting of a vacuum insulation panel.
대표청구항▼
1. Cryogenic distillation apparatus comprising: at least one item of equipment to be thermally insulated, selected from the group consisting of a storage tank, a phase separator, a column, a heat exchanger, pipework, a pump, a valve, a turbine, and combinations thereof;a structure for containing the
1. Cryogenic distillation apparatus comprising: at least one item of equipment to be thermally insulated, selected from the group consisting of a storage tank, a phase separator, a column, a heat exchanger, pipework, a pump, a valve, a turbine, and combinations thereof;a structure for containing the at least one item of equipment;a main insulation contained in the space between the equipment and the structure, wherein said main insulation comprises a solid perlite insulation; anda secondary insulation having a lower thermal conductivity than the main insulation, wherein said secondary insulation comprises at least one vacuum insulation panel, wherein the secondary insulation is disposed in the cryogenic distillation apparatus such that the secondary insulation is configured to reduce the thermal conductivity between the at least one item of equipment and the atmosphere,wherein the secondary insulation is disposed in the cryogenic distillation apparatus such that at least a portion of the perimeter of the at least one item of equipment comprises an absence of reduced thermal conductivity attributable to the secondary insulation;the at least one item of equipment to be thermally insulated is at a distance x from the closest point on said structure, which constitutes a first point, and a second point on said structure is separated from the closest equipment to be thermally insulated by a distance nx, n being greater than 2, and the space between the second point and the equipment comprises an absence of the secondary insulation. 2. The apparatus according to claim 1, in which the thermal conductivity of said secondary insulation is one half or less than that of said main insulation. 3. The apparatus according to claim 1, in which said at least one item of equipment to be thermally insulated contains, in operation, at least one fluid at a cryogenic temperature. 4. The apparatus according to claim 1, in which said secondary insulation is displaced over an opening in said structure. 5. The apparatus according to claim 1, in which said secondary insulation is installed on the equipment to be insulated. 6. The apparatus according to claim 1, in which said structure comprises an outer case and an inner case, and wherein said secondary insulation is placed on the outer case, the inner case, or both outer case and inner case of said structure. 7. The apparatus according to claim 6, in which said secondary insulation is incorporated into the outer case, the inner case of the structure, on said equipment to be thermally insulated, or any combination thereof. 8. The apparatus according to claim 6, in which said secondary insulation is located between said equipment to be thermally insulated and said outer case of the structure. 9. The apparatus according to claim 6, in which said secondary insulation is on the outside of said outer case of the structure. 10. The apparatus according to claim 1, wherein said structure has at least one projecting part, and wherein said secondary insulation is located on said at least one projecting part of the structure. 11. The apparatus according to claim 10, wherein said at least on projecting part is selected from the group consisting of braces, beams and angle sections. 12. The apparatus according to claim 1, in which the secondary insulation is only installed on at least one region of the equipment lying at a distance from said structure below a given threshold and/or on at least one region of the structure lying at a distance from the equipment below a given threshold. 13. The apparatus according to claim 12, in which said secondary insulation is installed on all the regions of the equipment lying at a distance from the structure below a given threshold and/or on the entire region of the structure lying at a distance from the equipment below a given threshold. 14. The apparatus according to claim 12, in which the entire region of all the equipment lying at a distance from the closest point on the structure below a given threshold and/or on the entire region of the structure lying at a distance on the closest point on the equipment below a given threshold is insulated by means of a secondary insulation. 15. The apparatus according to claim 1, in which the equipment is located in a region inside the structure, one side of this region being closed off by at least one vacuum insulation panel and the region being insulated from the rest of the inside of the structure by a barrier. 16. The apparatus according to claim 1, wherein the secondary insulation is disposed on the equipment to be insulated but is not in contact with the structure, wherein the space between the structure and the secondary insulation is filled by the main insulation. 17. The apparatus according to claim 1, wherein the secondary insulation is disposed on the outer case of the structure, but is not in contact with any equipment, the space between the structure and any equipment being filled by the main insulation. 18. The apparatus according to claim 1, wherein the secondary insulation is disposed on the inner case of the structure, but is not in contact with any equipment, and the space between the secondary insulation and any equipment being filled by the main insulation. 19. The apparatus according to claim 1, wherein the secondary insulation is disposed between the equipment and the structure but is not in contact with either thereof, the space between the secondary insulation and the equipment and the space between the secondary insulation and structure being filled by the main insulation.
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이 특허에 인용된 특허 (12)
Roger Vancauwenberghe FR; Jean-Pierre Gourbier FR; Laurent Ballanger FR, Cold box for cryogenic distilling plant.
Greter Lucien (Le Plessis Trevise FRX) Venet Francois (Paris FRX), Process for adjusting the verticality of an article disposed in a closed envelope and assembly for carrying this process.
Bracque Gilles (Saint Leu Desserent FRX) Dehaine Francois (Villemomble FRX) Gourbier Jean-Pierre (Le Plessis Trevise FRX) Grelaud Alain (La Quene-En-Brie FRX) Guillard Alain (Paris FRX) Mouliney Mich, Process for the construction of a cryogenic unit for the separation of gas, cryogenic unit, subassembly and transportabl.
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