IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0171434
(2011-06-28)
|
등록번호 |
US-8555705
(2013-10-15)
|
발명자
/ 주소 |
- Dietz, James
- Bishop, Steven E.
- McManus, James V.
- Lurcott, Steven M.
- Wodjenski, Michael J.
- Kaim, Robert
- Dimeo, Jr., Frank
|
출원인 / 주소 |
- Advanced Technology Materials, Inc.
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
5 인용 특허 :
62 |
초록
▼
A monitoring system for monitoring fluid in a fluid supply vessel during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a da
A monitoring system for monitoring fluid in a fluid supply vessel during operation including dispensing of fluid from the fluid supply vessel. The monitoring system includes (i) one or more sensors for monitoring a characteristic of the fluid supply vessel or the fluid dispensed therefrom, (ii) a data acquisition module operatively coupled to the one or more sensors to receive monitoring data therefrom and responsively generate an output correlative to the characteristic monitored by the one or more sensors, and (iii) a processor and display operatively coupled with the data acquisition module and arranged to process the output from the data acquisition module and responsively output a graphical representation of fluid in the fluid supply vessel, billing documents, usage reports, and/or resupply requests.
대표청구항
▼
1. A system for monitoring fluid inventory during dispensing and to an end-point dispensing condition of at least one fluid supply vessel in a gas box, wherein the at least one fluid supply vessel is arranged to supply fluid to an ion implanter tool, said system comprising: a monitoring assembly ada
1. A system for monitoring fluid inventory during dispensing and to an end-point dispensing condition of at least one fluid supply vessel in a gas box, wherein the at least one fluid supply vessel is arranged to supply fluid to an ion implanter tool, said system comprising: a monitoring assembly adapted to monitor at least one characteristic of the fluid supply vessel in the gas box when in dispensing operation or at least one characteristic of fluid supplied by said fluid supply vessel in the gas box when in dispensing operation, and to transmit a monitoring output corresponding to the at least one characteristic being monitored, wherein said at least one characteristic is correlative to fluid inventory in the fluid supply vessel in dispensing operation; andan output assembly coupled in transmission relationship to the monitoring assembly, to receive the monitoring output corresponding to the at least one characteristic being monitored and to provide an inventory output indicative of volume of fluid remaining in the fluid supply vessel during said dispensing operation and to the endpoint dispensing condition, wherein the output assembly in approach to the endpoint dispensing condition provides an algorithmically determined inventory output indicative of volume of fluid remaining in the fluid supply vessel in a regime in which volume of fluid remaining in the fluid supply vessel is non-linearly related to pressure. 2. The system of claim 1, wherein the output assembly is adapted to generate a warning output indicative of impending exhaustion of the fluid supply vessel. 3. The system of claim 1, wherein the output assembly is located remotely from the monitoring assembly. 4. The system of claim 1, wherein the output assembly is coupled wirelessly in transmission relationship to the monitoring assembly. 5. The system of claim 1, wherein the output assembly is coupled by fiber optic cable to the monitoring assembly. 6. The system of claim 1, wherein the at least one fluid supply vessel comprises an adsorbent-based fluid supply vessel. 7. The system of claim 1, wherein the at least one fluid supply vessel comprises a vessel including a pressure regulator interiorly disposed therein. 8. The system of claim 1, wherein the at least one fluid supply vessel contains a semiconductor manufacturing fluid. 9. The system of claim 1, wherein the at least one fluid supply vessel contains a fluid selected from the group consisting of arsine, phosphine, boron trifluoride, germanium tetrafluoride, and silicon tetrafluoride. 10. The system of claim 1, wherein the inventory output comprises a graphical representation of fluid in each of the at least one fluid supply vessel including a two-dimensional area with an upper boundary line, disposed in a rectangular field wherein the position of the upper boundary line of the two-dimensional area in the field indicates fluid inventory in the vessel. 11. The system of claim 1, wherein monitoring assembly is adapted to monitor at least one characteristic of the fluid supply vessel in the gas box when in dispensing operation. 12. The system of claim 1, wherein monitoring assembly is adapted to monitor at least one characteristic of fluid supplied by said fluid supply vessel in the gas box when in dispensing operation. 13. The system of claim 12, wherein the at least one characteristic of fluid supplied by said fluid supply vessel comprises at least one of fluid characteristics selected from the group consisting of fluid pressure, fluid temperature, concentration of one or more components of the fluid, flow rate of the fluid, pressure drop in flow circuitry coupled with the fluid supply vessel, and cumulative flow rate of the fluid dispensed from the fluid supply vessel. 14. The system of claim 12, wherein the at least one characteristic of fluid supplied by said fluid supply vessel comprises fluid pressure. 15. The system of claim 1, wherein the at least one fluid supply vessel comprises an adsorbent-based fluid supply vessel, and the algorithmically determined inventory output indicative of volume of fluid remaining in the fluid supply vessel in the regime in which volume of fluid remaining in the fluid supply vessel is non-linearly related to pressure, is generated by the output assembly by correlating at least one fluid inventory-sensitive variable with information in a database of adsorption isotherm data for said adsorbent. 16. The system of claim 1, wherein the fluid supply vessel includes a pressure regulator interiorly disposed in the vessel and said pressure regulator is set to a set point for dispensing of fluid from the vessel. 17. The system of claim 16, wherein the set point of the pressure regulator is a subatmospheric pressure set point. 18. A system for monitoring fluid inventory during dispensing and to an end-point dispensing condition of at least one dopant source fluid supply vessel in a gas box, wherein the at least one dopant source fluid supply vessel is arranged to supply dopant source fluid to an ion implanter tool, said system comprising: a monitoring assembly adapted to monitor at least one characteristic of the dopant source fluid supply vessel in the gas box when in dispensing operation or at least one characteristic of dopant source fluid supplied by said dopant source fluid supply vessel the gas box when in dispensing operation, and to transmit a monitoring output corresponding to the at least one characteristic being monitored, wherein said at least one characteristic is correlative to fluid inventory in the dopant source fluid supply vessel in dispensing operation; andan output assembly coupled in transmission relationship to the monitoring assembly, to receive the monitoring output corresponding to the at least one characteristic being monitored and to provide an inventory output indicative of volume of fluid remaining in the dopant source fluid supply vessel during said dispensing operation and to the endpoint dispensing condition, wherein the output assembly in approach to the endpoint dispensing condition provides an algorithmically determined inventory output indicative of volume of fluid remaining in the dopant source fluid supply vessel in a regime in which volume of dopant source fluid remaining in the dopant source fluid supply vessel is non-linearly related to pressure. 19. A method of monitoring fluid utilization by an ion implanter, comprising use of a system according to claim 1. 20. The method of claim 19, wherein said ion implanter is located in a semiconductor manufacturing facility.
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