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Template having a varying thickness to facilitate expelling a gas positioned between a substrate and the template

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29C-059/02
출원번호 US-0073533 (2011-03-28)
등록번호 US-8556616 (2013-10-15)
발명자 / 주소
  • Resnick, Douglas J.
  • Meissl, Mario Johannes
  • Choi, Byung-Jin
  • Sreenivasan, Sidlgata V.
출원인 / 주소
  • Molecular Imprints, Inc.
대리인 / 주소
    King, Cameron A.
인용정보 피인용 횟수 : 4  인용 특허 : 57

초록

A nanoimprint lithography template including, inter alia, a body having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the body having first and second regions with the second region surrounding the first region and t

대표청구항

1. A nanoimprint lithography system comprising: a template having first and second opposed sides with a first surface disposed on the first side, the second side having a recess disposed therein, the template having a first region and a second region having a perimeter, with the second region surrou

이 특허에 인용된 특허 (57)

  1. Sreenivasan, Sidlgata V; Watts, Michael P. C.; Choi, Byung J.; Voisin, Ronald D., Alignment methods for imprint lithography.
  2. Sreenivasan,Sidlgata V; Watts,Michael P. C.; Choi,Byung Jin; Voisin,Ronald D.; Schumaker,Norman E., Alignment systems for imprint lithography.
  3. Maracas George N. (Phoenix AZ) Dworsky Lawrence N. (Scottsdale AZ) Tobin Kathleen (Tempe AZ), Apparatus and method for stamping a surface.
  4. Cassani Giuseppe,ITX, Apparatus for pressing ceramic powders.
  5. Anzai, Yumiko; Terao, Motoyasu, Apparatus for the production of a recording medium.
  6. Choi,Byung J.; Voisin,Ronald D.; Sreenivasan,Sidlgata V.; Watts,Michael P. C.; Babbs,Daniel; Meissl,Mario J.; Bailey,Hillman; Schumaker,Norman E., Chucking system for modulating shapes of substrates.
  7. Choi,Byung J.; Voisin,Ronald D.; Sreenivasan,Sidlgata V.; Watts,Michael P. C.; Babbs,Daniel; Meissl,Mario J.; Bailey,Hillman; Schumaker,Norman E., Chucking system for modulating shapes of substrates.
  8. Babbs, Daniel A.; Choi, Byung-Jin; Cherala, Anshuman, Chucking system for nano-manufacturing.
  9. Sreenivasan,Sidlgata V; Choi,Byung J.; Voisin,Ronald D., Conforming template for patterning liquids disposed on substrates.
  10. Reed Steven P. (Felton CA), Device for making grooves in cigarette filters.
  11. Gray G. Robert (Fremont CA) Malhotra Arun (San Jose CA), Electroplated thin film conductor coil assembly.
  12. Stephen Y. Chou, Fluid pressure imprint lithography.
  13. Watts, Michael P. C., Functional patterning material for imprint lithography processes.
  14. Choi, Byung Jin; Sreenivasan, Sidlgata V.; Johnson, Stephen C., High precision orientation alignment and gap control stages for imprint lithography processes.
  15. Sreenivasan, S. V.; Choi, Byung J.; Colburn, Matthew; Bailey, Todd, High resolution overlay alignment systems for imprint lithography.
  16. Choi,Byung Jin; Voisin,Ronald D.; Sreenivasan,Sidlgata V.; Watts,Michael P. C.; Babbs,Daniel A.; Meissl,Mario J.; Bailey,Hillman L.; Schumaker,Norman E., Imprint lithography substrate processing tool for modulating shapes of substrates.
  17. Bailey,Todd C.; Choi,Byung Jin; Colburn,Matthew E.; Sreenivasan,Sidlgata V.; Willson,Carlton G.; Ekerdt,John G., Imprint lithography template having a feature size under 250 nm.
  18. Sreenivasan,Sidlgata V.; Schumaker,Philip D., Imprint lithography template having opaque alignment marks.
  19. Takashi Iwamura JP; Nobuhiro Kihara JP; Takeshi Yamasaki JP; Katsuya Shirai JP; Keiichi Nito JP; Masanobu Yamamoto JP; Akio Yasuda JP, Liquid crystal device having liquid crystal orientation layers including repetitive asymmetrical projects along a plurality of grooves.
  20. William J. Dauksher ; Douglas J. Resnick, Low stress hard mask formation method during refractory radiation mask fabrication.
  21. Washiya, Ryuta; Ando, Takashi; Ogino, Masahiko; Miyauchi, Akihiro, Method and apparatus for imprinting microstructure and stamper therefor.
  22. Hector Wayne M., Method and apparatus for making an optical information record.
  23. Broeksema Egbert (Eindhoven NLX) Smeets Arnoldus A. (Eindhoven NLX), Method and device for manufacturing a plastic record carrier.
  24. Mijnheer Andries (Eindhoven), Method and device for manufacturing information carriers.
  25. Choi, Byung-Jin; Sreenivasan, Sidlgata V.; McMackin, Ian M.; Lad, Pankaj B., Method for expelling gas positioned between a substrate and a mold.
  26. Lee Chang-Yong (Chunan-si KRX) Kim Joo-Hwan (Seoul KRX) Ryu Soo-Sun (Choongchungnam-do KRX), Method for manufacturing a replica stamper.
  27. Hartman Davis H. (Phoenix AZ) Lebby Michael S. (Apache Junction AZ), Method for patterning a mold.
  28. Feist,Thomas Paul; Gorczyca,Thomas Bert, Method for producing data storage media.
  29. Sreenivasan,Sidlgata V.; Choi,Byung J.; Colburn,Matthew; Bailey,Todd, Method of aligning a template with a substrate employing moire patterns.
  30. McMackin, Ian M.; Stacey, Nicholas A.; Babbs, Daniel A.; Voth, Duane J.; Watts, Mathew P. C.; Truskett, Van N.; Xu, Frank Y.; Voisin, Ronald D.; Lad, Pankaj B., Method of creating a turbulent flow of fluid between a mold and a substrate.
  31. Langer Herbert (Dammarie les Lys FRX) Saiveau Gerald (St. Germain les Corbeil FRX), Method of making an abradable stator joint for an axial turbomachine.
  32. Kraakman Hillebrand J. J. (Eindhoven NLX) Broeksema Egbert (Eindhoven NLX) Nijboer Sjoerd (Eindhoven NLX), Method of manufacturing a plastic record carrier having a stratified structure.
  33. Miller,Michael N.; Stacey,Nicholas A., Method of patterning surfaces while providing greater control of recess anisotropy.
  34. Choi, Byung Jin; Cherala, Anshuman; Babbs, Daniel A., Method of retaining a substrate to a wafer chuck.
  35. Choi, Byung Jin; Cherala, Anshuman; Choi, Yeong jun; Meissl, Mario J.; Sreenivasan, Sidlgata V.; Schumaker, Norman E.; Lu, Xiaoming; McMackin, Ian M.; Babbs, Daniel A., Method of separating a mold from a solidified layer disposed on a substrate.
  36. Pricone Robert M. (Vernon Hills IL) Roberts William N. (Niles IL), Methods and apparatus for embossing a precision optical pattern in a resinous sheet or laminate.
  37. Conley, Jr.,John F.; Ono,Yoshi; Gao,Wei; Evans,David R., Methods of forming a microlens array over a substrate employing a CMP stop.
  38. Voisin,Ronald D., Methods of manufacturing a lithography template.
  39. McMackin,Ian M.; Lad,Pankaj B., Moat system for an imprint lithography template.
  40. Nanci Antonio,CAX ; McKee Marc D.,CAX, Modified implant with bioactive conjugates on its surface for improved integration.
  41. Ohki Hiroshi,JPX ; Kashiwagi Toshiyuki,JPX ; Furuki Motohiro,JPX, Multi-layer recording medium and method for producing same.
  42. Puech Claude (Paris FR), Pressing device for manufacturing of storage substrates.
  43. Mogab C. Joseph (Austin TX) Dauksher William J. (Mesa AZ) Resnick Douglas J. (Phoenix AZ), Process for fabricating an X-ray absorbing mask.
  44. Chou Stephen Y., Release surfaces, particularly for use in nanoimprint lithography.
  45. Watts,Michael P. C.; McMackin,Ian, Scatterometry alignment for imprint lithography.
  46. Watts,Michael P. C.; McMackin,Ian M., Scatterometry alignment for imprint lithography.
  47. Okazaki, Shinji; Ito, Masaru, Stamper for replicating high-density data recording disks.
  48. Sreenivasan,Sidlgata V.; Choi,Byung J.; Schumaker,Norman E.; Voisin,Ronald D.; Watts,Michael P. C.; Meissl,Mario J., Step and repeat imprint lithography processes.
  49. Sreenivasan, Sidlgata V.; Watts, Michael P. C.; Choi, Byung Jin; Meissl, Mario J.; Schumaker, Norman E.; Voisin, Ronald D., Step and repeat imprint lithography systems.
  50. McMackin,Ian M.; Stacey,Nicholas A.; Babbs,Daniel A.; Voth,Duane J.; Watts,Mathew P. C.; Truskett,Van N.; Xu,Frank Y.; Voisin,Ronald D.; Lad,Pankaj B., System for creating a turbulent flow of fluid between a mold and a substrate.
  51. Greschner Johann (Pliezhausen DEX) Schmid Gerhard (Leinfelden-Echterdingen DEX) Steiner Werner (Bblingen DEX) Trippel Gerhard (Sindelfingen DEX) Wolter Olaf (Schnaich DEX), System for stamping an optical storage disk.
  52. Choi,Yeong Jun; Choi,Byung Jin, System to control an atmosphere between a body and a substrate.
  53. Choi,Byung Jin; Sreenivasan,Sidlgata V.; Meissl,Mario J., Systems for magnification and distortion correction for imprint lithography processes.
  54. Bailey, Todd; Choi, Byung J.; Colburn, Matthew; Sreenivasan, S. V.; Willson, C. Grant; Ekerdt, John, Template for room temperature, low pressure micro-and nano-imprint lithography.
  55. Gray G. Robert (Fremont CA) Malhotra Arun (San Jose CA), Thin film coil head assembly with protective planarizing cocoon structure.
  56. Wohlmut Peter G. (Palo Alto CA) Neu Frank D. (Castro Valley CA), Three dimensional electro-optical retrieval system.
  57. Resnick Douglas J. (Phoenix AZ) Johnson William A. (Paradise Valley AZ) Chen Hector T. H. (Madison WI), X-ray lithography method for irradiating an object to form a pattern thereon.

이 특허를 인용한 특허 (4)

  1. Nishimura, Takahito; Kawamura, Yoshihisa; Takahata, Kazuhiro; Yoneda, Ikuo; Ono, Yoshiharu, Device substrate, method of manufacturing device substrate, and method of manufacturing semiconductor device.
  2. Nishimura, Takahito; Kawamura, Yoshihisa; Takahata, Kazuhiro; Yoneda, Ikuo; Ono, Yoshiharu, Device substrate, method of manufacturing device substrate, and method of manufacturing semiconductor device.
  3. Sato, Hiroshi, Imprint apparatus and method of manufacturing article.
  4. Yang, Ki-yeon; Ko, Woong; Kim, Jae-kwan; Lee, Du-hyun; Lee, Byung-kyu, Template system and nano-imprint method using the same.
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