Method for using generator for foam to clean substrate
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B08B-003/00
B05B-007/04
출원번호
US-0445868
(2012-04-12)
등록번호
US-8557051
(2013-10-15)
발명자
/ 주소
Kholodenko, Arnold
Husain, Anwar
Tomasch, Gregory A.
Lin, Cheng-Yu (Sean)
출원인 / 주소
Lam Research Corporation
대리인 / 주소
Martine Penilla Group, LLP
인용정보
피인용 횟수 :
0인용 특허 :
1
초록▼
A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injec
A system for cleaning a substrate with a foam performs a method for generating a cleaning foam. In the first operation of the method, the system pumps a fluid into a premix chamber. The premix chamber is a component of a male plug which fits into a female housing in the system. Then the system injects a gas into the premix chamber to initiate generation of the foam from the fluid. The foam flows from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel. In the last operation of the method, the foam outputs from an exit end of the helical channel through the male plug to a component of the system.
대표청구항▼
1. A method for generating a foam, comprising: pumping a fluid into a premix chamber, wherein the premix chamber is a component of a male plug which fits into a female housing in a system for cleaning a substrate with the foam;injecting a gas into the premix chamber to initiate generation of the foa
1. A method for generating a foam, comprising: pumping a fluid into a premix chamber, wherein the premix chamber is a component of a male plug which fits into a female housing in a system for cleaning a substrate with the foam;injecting a gas into the premix chamber to initiate generation of the foam from the fluid;flowing the foam from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state along a length of the sealed helical channel; andoutputting the foam from an exit end of the helical channel through the male plug to a component of the cleaning system. 2. The method of claim 1, wherein the desired state is with respect to bubble size and bubble spacing, for a given quality of the foam. 3. The method of claim 1, wherein the premix chamber further comprises a hollow cylinder through which the fluid flows and into which the gas is injected. 4. The method of claim 3, wherein the gas is injected into the hollow cylinder through injection channels which facilitate the creation of a vortex within the hollow cylinder. 5. The method of claim 4, wherein the injection channels are tangential to the axis of the hollow cylinder. 6. The method of claim 4, wherein the injection channels are defined in a pattern. 7. The method of claim 6, wherein the pattern is oriented at a set degree of separation between about 5 and 20 degrees. 8. The method of claim 1, wherein the fluid comprises water and a surfactant. 9. The method of claim 1, wherein the method is used to provide foam at the point of use of the foam. 10. The method of claim 9, wherein the foam is used to clean a substrate. 11. The method of claim 10, wherein the substrate is a semiconductor wafer. 12. A method for generating a foam, comprising: pumping a fluid into a premix chamber, wherein the premix chamber is a component of a male plug which fits into a female housing in a system for cleaning a semiconductor wafer with the foam;injecting a gas into the premix chamber to initiate generation of the foam from the fluid;flowing the foam from the premix chamber into a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to reach a desired state for a given quality of the foam; andoutputting the foam from an exit end of the helical channel through the plug to a component of the cleaning system. 13. The method of claim 12, wherein the quality of the foam is measured by dividing a volume of the gas by a sum of the volume of the gas and a volume of the fluid. 14. The method of claim 12, wherein the premix chamber further comprises a hollow cylinder through which the fluid flows and into which the gas is injected. 15. The method of claim 14, wherein the gas is injected into the hollow cylinder through injection channels which facilitate the creation of a vortex within the hollow cylinder. 16. The method of claim 15, wherein the injection channels are tangential to the axis of the hollow cylinder. 17. The method of claim 15, wherein the injection channels are defined in a pattern which is oriented at a set degree of separation between about 5 and 20 degrees. 18. The method of claim 12, wherein the fluid comprises water and a surfactant. 19. A method for generating a foam, comprising: pumping a fluid into a premix chamber, wherein the premix chamber is a component of a male plug which fits into a female housing in a system for cleaning a semiconductor wafer with the foam;injecting a gas into the premix chamber to initiate generation of the foam from the fluid;flowing the foam from the premix chamber through a sealed helical channel formed by a helical indentation on an outside surface of the male plug and an inner surface of the female housing to allow the foam to reach a desired state with respect to bubble size and bubble spacing, for a given quality of the foam. 20. The method of claim 19, wherein the quality of the foam is measured by dividing a volume of the gas by a sum of the volume of the gas and a volume of the fluid.
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이 특허에 인용된 특허 (1)
Simmons Bobby G. (Tulsa OK), Apparatus for making foamed cleaning solutions and method of operation.
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