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Photopatterning of skin 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • A61N-005/06
출원번호 US-0005709 (2007-12-28)
등록번호 US-8562657 (2013-10-22)
발명자 / 주소
  • Ferren, Bran
  • Ishikawa, Muriel Y.
  • Jung, Edward K. Y.
  • Myhrvold, Nathan P.
  • Wood, Jr., Lowell L.
출원인 / 주소
  • The Invention Science Fund I, LLC
인용정보 피인용 횟수 : 1  인용 특허 : 167

초록

Methods and systems for treating skin for aesthetic or health purposes are described. According to various embodiments, photoresponsive materials and light are delivered in a controlled fashion to produce a patterned distribution of a material in the skin.

대표청구항

1. A method of producing a patterned distribution of a material within a skin region, comprising: delivering a photoresponsive material to a skin region of a subject in a first pattern; anddelivering targeted light to the skin region in a second pattern, said second pattern overlapping partially wit

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  1. Dacosta, Ralph Sebastian; Wilson, Brian C.; Zhang, Kai, Device and method for wound imaging and monitoring.
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