[특허]Filters employing both acidic polymers and physical-adsorption media

Filters employing both acidic polymers and physical-adsorption media 원문보기

IPC분류정보
국가/구분	United States(US) Patent 등록
국제특허분류(IPC7판)	B01D-035/143
출원번호	US-0151161 (2011-06-01)
등록번호	US-RE44536 (2013-10-15)
발명자 / 주소	Kishkovich, Oleg P. Kinkead, Devon Grayfer, Anatoly Goodwin, William M. Ruede, David
출원인 / 주소	Entegris, Inc.
대리인 / 주소	Hamilton, Brook, Smith & Reynolds, P.C.
인용정보	피인용 횟수 : 0 인용 특허 : 88

초록 ▼

A filter includes at least two different adsorptive media. First, chemisorptive media, which is porous and includes an acidic functional group, is used to remove molecular bases, including ammonia, organic amines, imides and aminoalchols, from the atmosphere used in semiconductor fabrication and other processes that require uncontaminated gaseous environments of high quality. Second, physisorptive media is able to adsorb condensable contaminants, particularly those having a boiling point greater than 150 degrees C. The physisorptive media can include untreated, activated carbon.

대표청구항 ▼

1. A method for removing contaminants from a gas in a semiconductor processing device comprising: flowing a gas through an enclosure having an inlet for receiving the gas and an outlet for discharging the gas;filtering the gas in the enclosure with a filter unit coupled to the inlet and the outlet and having a plurality of parallel filter elements located within said filter unit for removing at least a portion of said contaminants from said gas passing through said enclosure, the filter unit further comprising at least one filter element positioned in series with at least one of the parallel filter elements; andsampling the gas with a sampling port coupled to the gas flow between filter elements positioned in series within the filter unit to collect sample data. 2. The method of claim 1 further comprising providing an air filtration system. 3. The method of claim 2 further comprising flowing said gas through each parallel filter element and through the at least one filter element positioned in series. 4. The method of claim 3 further comprising a providing plurality of sampling ports. 5. The method of claim 4 further comprising providing the plurality of sampling ports with an associated like plurality of filter elements. 6. The method of claim 4 further including an inlet sampling port. 7. The method of claim 4 further including an outlet sampling port. 8. The method of claim 5 further comprising removing amine contaminants. 9. The method of claim 1 further comprising coupling said sampling port to a detection system. 10. The method of claim 9 further comprising coupling an amine detection system. 11. The method of claim 1 further comprising coupling the sampling port to an analyzer that determines filter life. 12. The method of claim 11 further comprising using data from one or more ports selected from the group consisting of an inlet sampling port, a port between filters and an outlet sampling port. 13. The method of claim 1 further comprising providing filters positioned in series such that a first filter element filters a first contaminant and a second filter element filters a second contaminant. 14. The method of claim 13 further comprising providing a first filter element including a physisorptive filter media. 15. The method of claim 13 further comprising providing a second filter element including a chemisorptive filter media. 16. The method of claim 14 further comprising providing a physisorptive media including an activated carbon. 17. The method of claim 15 further comprising providing a chemisorptive media including an acidic material. 18. The method of claim 17 further comprising providing an acidic material including a sulfonated material. 19. The method of claim 17 further comprising providing an acidic material including a carboxylic functional group. 20. The method of claim 1 further comprising providing a concentrator coupled to the sampling port that accumulates a contaminant. 21. An apparatus for removing contaminants from a gas in a semiconductor processing device comprising: a filter enclosure having an inlet for receiving a gas and an outlet for discharging a gas;a filter system within the enclosure having a plurality of parallel filter elements and at least one filter element in series with at least one of the parallel filter elements; anda plurality of sampling ports for sampling gas flowing through the enclosure including a sampling port positioned between the at least one filter element that is positioned in series with at least one of the parallel filter elements to collect a gas sample from the gas flowing between the filter elements positioned in series. 22. The apparatus of claims 21 wherein said gas passing through each parallel filter element passes through the at least one filter element positioned in series. 23. The apparatus of claim 21 wherein said contaminants include amines. 24. The apparatus of claim 21 wherein said sampling port is communicatively coupled to a detection system. 25. The apparatus of claim 21 wherein the sampling port is connected to an analyzer that determines filter life. 26. The apparatus of claim 21 wherein filters positioned in series comprise a first filter element that filters a first contaminant and a second filter element that filters a second contaminant. 27. The apparatus of claim 26 wherein the first filter element comprises a physisorptive filter media. 28. The apparatus of claim 26 wherein the second filter element comprises a chemisorptive filter media. 29. The apparatus of claim 27 wherein the physisorptive media comprises an activated carbon. 30. The apparatus of claim 28 wherein the chemisorptive media comprises an acidic material. 31. The apparatus of claim 30 wherein the acidic material comprises a sulfonated material. 32. The apparatus of claim 30 wherein the acidic material comprises a carboxylic functional group. 33. The apparatus of claim 21 wherein the sampling port is coupled to a concentrator that accumulates a contaminant. 34. The apparatus of claim 21 further comprising a plurality of sampling ports between filter elements positioned in series. 35. A method for removing contaminants from a gas in a semiconductor processing device comprising: flowing a gas through an enclosure having an inlet for receiving the gas and an outlet for discharging the gas;filtering the gas in the enclosure with a filter unit coupled to the inlet and the outlet and having a plurality of parallel filter elements located within said filter unit for removing at least a portion of said contaminants from said gas passing through said enclosure, the filter unit further comprising at least one filter element positioned in series with at least one of the parallel filter elements, wherein filters positioned in series comprise a first filter element that filters a first contaminant and a second filter element that filters a second contaminant, and further wherein the first filter element comprises a physisorptive filter media and the second filter element comprises a chemisorptive filter media. 36. The method of claim 35 wherein the physisorptive filter media is upstream of chemisorptive filter media. 37. The method of claim 36 wherein the physisorptive media comprises an activated carbon. 38. The method of claim 36 wherein the chemisorptive media comprises an acidic material. 39. The method of claim 38 wherein the acidic material comprises a sulfonated material. 40. The method of claim 39 wherein the sulfonated material comprises a sulfonated divinyl benzene styrene copolymer. 41. The method of claim 38 wherein the acidic material comprises a carboxylic functional group. 42. The method of claim 36 further comprising removing amine contaminants. 43. An apparatus for removing contaminants from a gas in a semiconductor processing device comprising: a filter enclosure having an inlet for receiving a gas and an outlet for discharging a gas;a filter system within the enclosure having a plurality of parallel filter elements and at least one filter element in series with at least one of the parallel filter elements, wherein filters positioned in series comprise a first filter element that filters a first contaminant and a second filter element that filters a second contaminant, and further wherein the first filter element comprises a physisorptive filter media and the second filter element comprises a chemisorptive filter media. 44. The apparatus of claim 43 wherein the physisorptive filter media is upstream of chemisorptive filter media. 45. The apparatus of claim 44 wherein said contaminants include amines. 46. The apparatus of claim 44 wherein the physisorptive media comprises an activated carbon. 47. The apparatus of claim 44 wherein the chemisorptive media comprises an acidic material. 48. The apparatus of claim 47 wherein the acidic material comprises a sulfonated material. 49. The apparatus of claim 47 wherein the sulfonated material comprises a sulfonated divinyl benzene styrene copolymer. 50. The apparatus of claim 49 wherein the acidic material comprises a carboxylic functional group.

이 특허에 인용된 특허 (88)

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IPC	Description
A	생활필수품
A62	인명구조; 소방(사다리 E06C)
A62B	인명구조용의 기구, 장치 또는 방법(특히 의료용에 사용되는 밸브 A61M 39/00; 특히 물에서 쓰이는 인명구조 장치 또는 방법 B63C 9/00; 잠수장비 B63C 11/00; 특히 항공기에 쓰는 것, 예. 낙하산, 투출좌석 B64D; 특히 광산에서 쓰이는 구조장치 E21F 11/00)
A62B-1/08	.. 윈치 또는 풀리에 제동기구가 있는 것

내보내기 구분	파일저장 인쇄 메일전송
구성항목	기본정보 상세정보 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표IPC 관리번호, 국가코드, 자료구분, 상태, 출원번호, 출원일자, 공개번호, 공개일자, 공고번호, 공고일자, 등록번호, 등록일자, 발명명칭(한글), 발명명칭(영문), 출원인(한글), 출원인(영문), 출원인코드, 대표출원인, 출원인국적, 출원인주소, 발명자, 발명자E, 발명자코드, 발명자주소, 발명자 우편번호, 발명자국적, 대표IPC, IPC코드, 요약, 미국특허분류, 대리인주소, 대리인코드, 대리인(한글), 대리인(영문), 국제공개일자, 국제공개번호, 국제출원일자, 국제출원번호, 우선권, 우선권주장일, 우선권국가, 우선권출원번호, 원출원일자, 원출원번호, 지정국, Citing Patents, Cited Patents
저장형식	Text(ASCII format) Excel format PIAS분석(.xls)
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안내	총 건의 자료가 검색되었습니다. 다운받으실 자료의 인덱스를 입력하세요. (1-10,000) 검색결과의 순서대로 최대 10,000건 까지 다운로드가 가능합니다. 데이타가 많을 경우 속도가 느려질 수 있습니다.(최대 2~3분 소요) 다운로드 파일은 UTF-8 형태로 저장됩니다. 파일의 내용이 제대로 보이지 않을실 때는 웹브라우저 상단의 보기 -> 인코딩 -> 자동선택 여부를 확인하십시오. ~ Text(ASCII format) Excel format

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Filters employing both acidic polymers and physical-adsorption media 원문보기

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Filters employing both acidic polymers and physical-adsorption media 원문보기

초록 ▼

대표청구항 ▼

연구과제 타임라인

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이 특허에 인용된 특허 (88)

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