IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0702412
(2003-11-05)
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등록번호 |
US-8591817
(2013-11-26)
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발명자
/ 주소 |
|
출원인 / 주소 |
|
대리인 / 주소 |
Gavrilovich, Dodd & Lindsey, LLP
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인용정보 |
피인용 횟수 :
3 인용 특허 :
8 |
초록
▼
The assay system includes at least one thermally responsive medium positioned so as to transfer thermal energy to a solution constrained in a solution constraining region. The assay system further includes a beam distribution system configured to distribute an energy beam to a thermally responsive m
The assay system includes at least one thermally responsive medium positioned so as to transfer thermal energy to a solution constrained in a solution constraining region. The assay system further includes a beam distribution system configured to distribute an energy beam to a thermally responsive medium. The thermally responsive medium interacts with the energy beam so as to elevate the temperature of the thermally responsive medium.
대표청구항
▼
1. An assay system, comprising: one or more electrochemical sensors that each includes an electrode, each of the one or more sensors being positioned on a common substrate, and each of the sensors being configured to detect an agent in a liquid;an energy beam source configured to produce an energy b
1. An assay system, comprising: one or more electrochemical sensors that each includes an electrode, each of the one or more sensors being positioned on a common substrate, and each of the sensors being configured to detect an agent in a liquid;an energy beam source configured to produce an energy beam; anda beam distribution system configured to distribute the energy beam to the one or more sensors such that the energy beam interacts with the electrode in each of the sensors so as to elevate the temperature of each of the one or more sensors. 2. The assay system of claim 1, wherein the energy beam is a light beam. 3. The assay system of claim 1, wherein the beam distribution system is configured to direct the energy beam at a working electrode in each of the one or more sensors so as to elevate the temperature of the working electrode. 4. The assay system of claim 1, wherein the one or more sensors is a plurality of sensors and the beam distribution system is configured to direct the energy beam from one of the sensors to another sensor. 5. The assay system of claim 4, wherein the beam distribution system includes an electronically steered mirror. 6. The assay system of claim 1, further comprising: one or more lenses positioned along a path of the energy beam and configured to adjust a spot size of the energy beam on the one or more sensors. 7. The assay system of claim 1, further comprising: an attenuator configured to at least partially attenuate the power of the energy beam. 8. The assay system of claim 7, wherein the attenuator is configured to be moved in and out of a path of the energy beam. 9. The assay system of claim 7, wherein the attenuator is configured to provide complete blocking of the energy beam. 10. The assay system of claim 1, wherein the beam distribution system is configured to split the energy beam into a plurality of energy beam portions that are each directed to a sensor. 11. The assay system of claim 10, further comprising: a plurality of attenuators each configured to at least partially attenuate the power of an energy beam portion. 12. The assay system of claim 10, wherein at least one attenuator is configured to provide complete blocking of an energy beam portion. 13. The assay system of claim 10, further comprising: electronics configured to monitor one or more electrical characteristics of a circuit that includes an electrode associated with at least one of the one or more sensors, the one or more monitored electrical characteristics indicating a temperature of the sensor. 14. The assay system of claim 13, wherein the electronics are configured to operate the beam distribution system such that at least a portion of the energy beam is distributed to the sensor in response to the one or more electrical characteristics indicating that the temperature of the associated sensor falls below a first target temperature. 15. The assay system of claim 14, wherein the electronics are configured to operate the beam distribution system such that distribution of the energy beam to the associated sensor is disrupted in response to the one or more electrical characteristics indicating that the temperature of the associated sensor is elevated above a second target temperature. 16. The assay system of claim 1, wherein the one or more sensors are included in a cartridge that is removable from the assay system. 17. The assay system of claim 1, wherein the one or more sensors are included in a cartridge. 18. The assay system of claim 17, wherein the one or more sensors are included on an assay chip. 19. The assay system of claim 17, wherein each of the one or more sensors includes a working electrode. 20. The assay system of claim 1, wherein the one or more electrochemical sensors is multiple electrochemical sensors, each of the electrochemical sensors includes a working electrode and the beam distribution system includes an electronically steered mirror configured to steer the energy beam from one of the working electrodes to another working electrode. 21. The assay system of claim 20, wherein the beam distribution system is configured to split the energy beam into a plurality of energy beam portions that are each directed to one of the working electrodes. 22. The assay system of claim 1, wherein the energy beam travels through the substrate before coming into contact with the electrode. 23. The assay system of claim 22, wherein the sensor is configured to receive the liquid such that the electrode is between the liquid and the substrate. 24. The assay system of claim 1, wherein the one or more sensors is a plurality of sensors and the energy beam travels through the substrate before coming into contact with the electrode included in each of the sensors. 25. The assay system of claim 24, wherein each of the sensors are configured to receive the liquid such that the electrode is between the liquid and the substrate. 26. The assay system of claim 1, wherein each of the sensors includes electrodes and the electrodes from different sensors are positioned on a common substrate and the beam distribution system is configured such that when the energy beam is directed to each of the sensors, the energy beam travels through the substrate before coming into contact with one of the electrodes included in the sensor. 27. The assay system of claim 1, further comprising: electronics configured to raise a potential difference between electrodes included in each of the one or more electrochemical sensors to a level where electron transfer occurs between one of the electrodes and a component in a sample positioned on each of the one or more electrochemical sensors. 28. The assay system of claim 1, wherein each of the one or more electrochemical sensors includes a working electrode, a counter electrode, and a reference electrode and further comprising: electronics configured to raise a potential applied between the working electrode and the reference electrode to a level that causes electron transfer to occur between the working electrode and a component in a sample positioned on each of the one or more electrochemical sensors, the electron transfer allowing current to flow through a circuit that includes the working electrode, the sample and the counter electrode.
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