IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0679487
(2008-10-09)
|
등록번호 |
US-8605445
(2013-12-10)
|
우선권정보 |
FR-07 07212 (2007-10-15) |
국제출원번호 |
PCT/FR2008/001420
(2008-10-09)
|
§371/§102 date |
20100323
(20100323)
|
국제공개번호 |
WO2009/087284
(2009-07-16)
|
발명자
/ 주소 |
|
출원인 / 주소 |
- Commissariat a l'Energie Atomique
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
2 인용 특허 :
13 |
초록
▼
The structure comprises at least a device, for example a microelectronic chip, and at least a getter arranged in a cavity under a controlled atmosphere delineated by a substrate and a sealing cover. The getter comprises at least one preferably metallic getter layer, and an adjustment sub-layer made
The structure comprises at least a device, for example a microelectronic chip, and at least a getter arranged in a cavity under a controlled atmosphere delineated by a substrate and a sealing cover. The getter comprises at least one preferably metallic getter layer, and an adjustment sub-layer made from pure metal, situated between the getter layer and the substrate, on which it is formed. The adjustment sub-layer is designed to modulate the activation temperature of the getter layer. The getter layer comprises two elementary getter layers.
대표청구항
▼
1. A structure having a closed cavity delineated by a substrate and a sealing cover, said cavity containing a getter comprising, on the substrate and/or the sealing cover: an adjustment sub-layer made from a metallic material selected from the group consisting of Ru, Cr, Pt, Ni, Cu, Al, and Au; anda
1. A structure having a closed cavity delineated by a substrate and a sealing cover, said cavity containing a getter comprising, on the substrate and/or the sealing cover: an adjustment sub-layer made from a metallic material selected from the group consisting of Ru, Cr, Pt, Ni, Cu, Al, and Au; anda plurality of elementary getter layers of different compositions, each getter layer having a distinct activation temperature, wherein the elementary getter layers present an activation temperature decreasing with distance from the adjustment sub-layer,wherein a thickness of the adjustment sub-layer is substantially between 10 and 90 nm. 2. The structure according to claim 1, wherein an adhesion sub-layer chosen from titanium and zirconium is arranged between the adjustment sub-layer and the corresponding substrate and/or cover. 3. The structure according to claim 1, wherein a thickness of the adjustment sub-layer is substantially between 50 and 500 nm. 4. The structure according to claim 1, wherein each elementary getter layer is selected from the group consisting of titanium and zirconium. 5. The structure according to claim 1, wherein a thickness of the getter layer is substantially between 100 and 2000 nm. 6. The structure according to claim 1, comprising at least an additional getter distinct from the getter and having a different activation temperature of the getter. 7. The structure according to claim 6, wherein: materials of the adjustment sub-layers of the getter and of the additional getter are identical; andmaterials of the getter layers of the getter and of the additional getter are different. 8. The structure according to claim 6, wherein: materials of the getter layers of the getter and of the additional getter are identical; andmaterials of the adjustment sub-layers of the getter and of the additional getter are different. 9. Structure according to claim 6, wherein: materials of the getter layers of the getter and of the additional getter are identical; andthe adjustment sub-layers of the getter have a crystalline microstructure different from a crystalline microstructure of the adjustment sub-layers of the additional getter. 10. The structure according to claim 1, wherein: a first elementary getter layer is made of Ti2Cu and/or Ti2Ni;a second elementary getter layer is made of titanium covering the first elementary getter; andthe adjustment sub-layer is selected from the group consisting of Cu and Ni. 11. A structure having a closed cavity delineated by a substrate and a sealing cover, said cavity containing a first getter comprising a first adjustment sub-layer covered by a first getter layer; andan additional getter comprising an additional adjustment sub-layer covered by an additional getter layer,wherein:the additional adjustment sub-layer has a crystalline microstructure different from a crystalline microstructure of the first adjustment sub-layer;the first getter has an activation temperature different from an activation temperature of the additional getter; andthe additional getter is distinct from the first getter. 12. The structure according to claim 11, wherein: materials of the adjustment sub-layers of getter and of the additional getter are identical; andmaterials of the getter layers of the getter and of the additional getter are different. 13. The structure according to claim 11, wherein: materials of the getter layers of the getter and of the additional getter are identical; andmaterials of the adjustment sub-layers of the getter and of the additional getter are different. 14. A structure having a closed cavity delineated by a substrate and a sealing cover and containing a getter with an activation temperature, comprising successively, on the substrate and/or the sealing cover: an adjustment sub-layer made from a metallic material selected from the group consisting of Ru, Cr, Pt, Ni, Cu, Al, and Au,a getter layer, anda protective layer,wherein a thickness of the adjustment sub-layer is substantially between 10 and 90 nm. 15. The structure according to claim 14, wherein the protective layer is chromium.
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