IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0768387
(2013-02-15)
|
등록번호 |
US-8609476
(2013-12-17)
|
우선권정보 |
JP-2002-276216 (2002-09-20) |
발명자
/ 주소 |
- Yamazaki, Shunpei
- Kuwabara, Hideaki
- Murakami, Masakazu
|
출원인 / 주소 |
- Semiconductor Energy Laboratory Co., Ltd.
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
0 인용 특허 :
83 |
초록
▼
The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film form
The present invention provides a vapor deposition method and a vapor deposition system of film formation systems by which EL materials can be used more efficiently and EL materials having superior uniformity with high throughput rate are formed. According to the present invention, inside a film formation chamber, an evaporation source holder in a rectangular shape in which a plurality of containers sealing evaporation material is moved at a certain pitch to a substrate and the evaporation material is vapor deposited on the substrate. Further, a longitudinal direction of an evaporation source holder in a rectangular shape may be oblique to one side of a substrate, while the evaporation source holder is being moved. Furthermore, it is preferable that a movement direction of an evaporation source holder during vapor deposition be different from a scanning direction of a laser beam while a TFT is formed.
대표청구항
▼
1. A manufacturing method for a light emitting device comprising step of: forming a film containing an organic compound over a substrate in a film formation chamber by relatively moving an evaporation source holder provided with the organic compound,wherein the evaporation source holder contains a p
1. A manufacturing method for a light emitting device comprising step of: forming a film containing an organic compound over a substrate in a film formation chamber by relatively moving an evaporation source holder provided with the organic compound,wherein the evaporation source holder contains a plurality of containers being arranged in a longitudinal direction of the evaporation source holder, andwherein in the evaporation source holder, evaporation centers of adjacent two containers are crossed each other and an evaporation material sublimated from the adjacent two containers is collided with each other. 2. The manufacturing method according to claim 1, wherein the evaporation source holder contains an even number of containers. 3. The manufacturing method according to claim 1, wherein the evaporation source holder is moved perpendicular to or in parallel to a side of the substrate. 4. The manufacturing method according to claim 1, wherein a movement direction of the evaporation source holder is a same as the longitudinal direction of the evaporation source holder. 5. The manufacturing method according to claim 1, further comprising a step of cleaning a mask in the film formation chamber by generating plasma in the film formation chamber. 6. The manufacturing method according to claim 1, further comprising a step of cleaning whole of the film formation chamber by generating plasma in the film formation chamber. 7. A manufacturing method for a light emitting device comprising steps of: forming a first electrode over a substrate;forming a film containing an organic compound over the first electrode in a film formation chamber by relatively moving an evaporation source holder provided with the organic compound;forming a second electrode over the film containing the organic compound,wherein the evaporation source holder contains a plurality of containers being arranged in a longitudinal direction of the evaporation source holder, andwherein in the evaporation source holder, evaporation centers of adjacent two containers are crossed each other and an evaporation material sublimated from the adjacent two containers is collided with each other. 8. The manufacturing method according to claim 7, wherein the evaporation source holder contains an even number of containers. 9. The manufacturing method according to claim 7, wherein the evaporation source holder is moved perpendicular to or in parallel to a side of the substrate. 10. The manufacturing method according to claim 7, wherein a movement direction of the evaporation source holder is a same as the longitudinal direction of the evaporation source holder. 11. The manufacturing method according to claim 7, further comprising a step of cleaning a mask in the film formation chamber by generating plasma in the film formation chamber. 12. The manufacturing method according to claim 7, further comprising a step of cleaning whole of the film formation chamber by generating plasma in the film formation chamber. 13. A manufacturing method for a light emitting device comprising steps of: forming a semiconductor film over a substrate having an insulating surface;irradiating the semiconductor film with a laser beam from a laser by relatively moving at least one of the substrate and the laser beam;forming a thin film transistor comprising an irradiated semiconductor film;forming a first electrode electrically connected to the thin film transistor;forming a film containing an organic compound over the first electrode in a film formation chamber by relatively moving an evaporation source holder provided with the organic compound; andforming a second electrode over the film containing the organic compound,wherein the evaporation source holder contains a plurality of containers being arranged in a longitudinal direction of the evaporation source holder, andwherein in the evaporation source holder, evaporation centers of adjacent two containers are crossed each other and an evaporation material sublimated from the adjacent two containers is collided with each other. 14. The manufacturing method according to claim 13, wherein the evaporation source holder contains an even number of containers. 15. The manufacturing method according to claim 13, wherein the evaporation source holder is moved perpendicular to or in parallel to a side of the substrate. 16. The manufacturing method according to claim 13, wherein a movement direction of the evaporation source holder is a same as the longitudinal direction of the evaporation source holder. 17. The manufacturing method according to claim 13, further comprising a step of cleaning a mask in the film formation chamber by generating plasma in the film formation chamber. 18. The manufacturing method according to claim 13, further comprising a step of cleaning whole of the film formation chamber by generating plasma in the film formation chamber. 19. The manufacturing method according to claim 13, wherein the laser is one of a continuously oscillating laser and a pulse oscillation laser, and the laser is one or more kinds of members selected from the group consisting of YAG laser, YVO4 laser, YLF laser, YAlO3 laser, Y2O3 laser, glass laser, ruby laser, alexandrite laser, and Ti: sapphire laser. 20. The manufacturing method according to claim 13, wherein the laser is one of a continuously oscillating laser and a pulse oscillation laser, and the laser is one or more kinds of members selected from the group consisting of excimer laser, Ar laser, and Kr laser.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.