초록 ▼

The present disclosure provides a system and method for processing a semiconductor substrate wherein a substrate is received at a load lock interface. The substrate is transferred from the load lock interface to a process module using a first module configured for unprocessed substrates. A manufactu

The present disclosure provides a system and method for processing a semiconductor substrate wherein a substrate is received at a load lock interface. The substrate is transferred from the load lock interface to a process module using a first module configured for unprocessed substrates. A manufacturing process is performed on the substrate within the process module. Thereafter, the substrate is transferred from the process module to the load lock interface using a second module configured for processed substrates.

대표청구항 ▼

1. A system comprising: a central transfer chamber;a plurality of process modules disposed proximate to the central transfer chamber wherein each of the plurality of process modules is operable to perform a semiconductor device fabrication process;a load lock chamber connected to the central transfe

1. A system comprising: a central transfer chamber;a plurality of process modules disposed proximate to the central transfer chamber wherein each of the plurality of process modules is operable to perform a semiconductor device fabrication process;a load lock chamber connected to the central transfer chamber, wherein a first end of the load lock chamber is connected to the central transfer chamber; anda load lock interface connected to the load lock chamber, wherein the load lock interface is connected to the load lock chamber at a second end, the second end opposing the first end, and wherein the load lock interface includes: an equipment front end module (EFEM) chamber, wherein the EFEM chamber includes a load lock transfer mechanism operable to transfer the substrate from a load port to the load lock chamber;the load port connected to the EFEM chamber;a transport carrier docked in the load port; a measurement instrument operable to measure a level of contaminants in the transport carrier;a gas delivery apparatus disposed in the load lock interface, wherein the gas delivery apparatus has a gas inlet nozzle on disposed on a first edge of a substrate upon which the semiconductor device fabrication process is performed and a gas outlet nozzle disposed on a second, opposing edge of the substrate, the first and second edge being separated by a diameter of the substrate; and a load lock module connected to the EFEM chamber and having a physical barrier separating the load lock module and the EFEM chamber, wherein the load lock module includes the gas delivery apparatus. 2. The system of claim 1, wherein the measurement instrument is disposed in the EFEM chamber. 3. The system of claim 1, wherein the measurement instrument is disposed in the load port. 4. The system of claim 1, where the gas inlet nozzle and the gas outlet nozzle are disposed in the EFEM chamber. 5. The system of claim 1, wherein the gas delivery apparatus further includes an air-door nozzle at an interface between the load port and the EFEM chamber.