초록 ▼

Certain example embodiments of this invention relate to coated articles that include anti-reflective (AR) coatings produced from colloidal silica with variable size particles in formulation, and/or methods of making the same. In certain example embodiments, the AR coatings advantageously exhibit hig

Certain example embodiments of this invention relate to coated articles that include anti-reflective (AR) coatings produced from colloidal silica with variable size particles in formulation, and/or methods of making the same. In certain example embodiments, the AR coatings advantageously exhibit high transmission, high transmission gain with respect to uncoated articles, and high b* values, before and/or after heat treatment. The AR coatings of certain example embodiments may be temperable or otherwise heat treatable (e.g., at temperatures of 500 degrees C. or greater) together with their supporting substrates. In certain example embodiments, the particle size for the colloidal silica is 10-110 nm, and the b* values are at least about 0.8. Certain example embodiments may be used in connection with photovoltaic devices and/or the like.

대표청구항 ▼

1. A method of making a coated article, the method comprising: providing a glass substrate;preparing a sol, the sol comprising colloidal silica having a particle size of 10-110 nm;spin coating the sol, directly or indirectly, onto the glass substrate;curing the sol to form a silica-inclusive anti-re

1. A method of making a coated article, the method comprising: providing a glass substrate;preparing a sol, the sol comprising colloidal silica having a particle size of 10-110 nm;spin coating the sol, directly or indirectly, onto the glass substrate;curing the sol to form a silica-inclusive anti-reflective (AR) coating, wherein the curing comprises exposing the substrate together with the sol spin coated thereon to first and second elevated temperatures, the second elevated temperature being higher than the first elevated temperature, wherein the substrate together with the sol spin coated thereon is exposed to a temperature of about 150 degrees C. for 2 minutes, followed by a temperature of about 220 degrees for 2.5 minutes; andheat treating the glass substrate together with the AR coating at a temperature of at least about 500 degrees C.,wherein, post heat treatment, the AR coating has a b* value of 0.8 or greater. 2. The method of claim 1, wherein the particle size is 20-100 nm. 3. The method of claim 2, wherein post heat treatment, the AR coating has a b* value of 0.9 or greater. 4. The method of claim 2, wherein post heat treatment, the AR coating has a b* value of 1 or greater. 5. The method of claim 1, wherein the preparing of the sol comprises: preparing a polymeric component, the polymeric component comprising n-propanol, Glycydoxylpropyltrimethoxysilane (Glymo), water, and hydrochloric acid;mixing the polymeric component;forming a coating solution by combining the polymeric solution with the colloidal silica in methyl ethyl ketone; andstirring the coating solution to form the sol. 6. The method of claim 1, further comprising building the glass substrate together with the AR coating into a photovoltaic device.