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A ceramic coated article useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas. The ceramic coated article includes an aluminum substrate coated with a solid solution coating formed from a combination of yttrium oxide and zirconium oxide. The ceramic coating

A ceramic coated article useful in semiconductor processing, which is resistant to erosion by halogen-containing plasmas. The ceramic coated article includes an aluminum substrate coated with a solid solution coating formed from a combination of yttrium oxide and zirconium oxide. The ceramic coating is formed from yttrium oxide at a molar concentration ranging from about 90 mole % to about 70 mole %, and zirconium oxide at a molar concentration ranging from about 10 mole % to about 30 mole %. In a second embodiment, the ceramic article includes ceramic which is formed from zirconium oxide at a molar concentration ranging from about 96 mole % to about 94 mole %, and yttrium oxide at a molar concentration ranging from about 4 mole % to about 6 mole %.

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1. An article produced using a method wherein a solid solution ceramic coating is formed directly upon an exterior surface of a body of said article using a technique selected from the group consisting of thermal spraying, plasma spraying, sputtering, and chemical vapor deposition, wherein said body

1. An article produced using a method wherein a solid solution ceramic coating is formed directly upon an exterior surface of a body of said article using a technique selected from the group consisting of thermal spraying, plasma spraying, sputtering, and chemical vapor deposition, wherein said body is formed from a material selected from the group consisting of aluminum, aluminum alloy, stainless steel, aluminum nitride, and quartz, and wherein said solid solution ceramic coating is formed from a combination of yttrium oxide and zirconium oxide, wherein a molar concentration of yttrium oxide ranges from about 90 mole % to about 70 mole %, and a molar concentration of zirconium oxide ranges from about 10 mole % to about 30 mole % , in a manner which produces a mean grain size of said solid solution ceramic coating which ranges from about 2 μm to about 8 μm, so that said coating on said article surface is resistant to erosion by halogen-containing plasmas used in semiconductor processing, and wherein a test specimen of a bulk solid solution ceramic material having a molar composition of said solid solution ceramic coating exhibits a flexural strength between about 120 MPa and about 140 MPa. 2. An article in accordance with claim 1, wherein said solid solution ceramic coating is formed from yttrium oxide at a concentration ranging from about 90 mole % to about 80 mole %, and zirconium oxide at a concentration ranging from about 10 mole % to about 20 mole %. 3. An article in accordance with claim 1 or claim 2, wherein a fracture toughness of a test specimen of a bulk solid solution ceramic material having a composition specified in claim 1 or claim 2 ranges between about 1.1 MPa·M1/2 and about 1.3 MPa·ml/2. 4. An article in accordance with claim 1 or claim 2,wherein said article is selected from the group consisting of a lid, a lid liner, a nozzle, a gas distribution plate, a shower head, an electrostatic chuck component, a shadow frame, a substrate holding frame, a processing kit, and a chamber liner. 5. An article in accordance with claim 1 or claim 2, wherein said solid solution ceramic coating has a plasma erosion rate of less than about 0.2 μm/hr. 6. An article in accordance with claim 3, wherein said article is selected from the group consisting of a lid, a lid liner, a nozzle, a gas distribution plate, a shower head, an electrostatic chuck component, a shadow frame, a substrate holding frame, a processing kit, and a chamber liner. 7. An article in accordance with claim 5, wherein said article is selected from the group consisting of a lid, a lid liner, a nozzle, a gas distribution plate, a shower head, an electrostatic chuck component, a shadow frame, a substrate holding frame, a processing kit, and a chamber liner.