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A sensor includes a substrate, a floating diffusion node in the substrate, a photodiode in the substrate laterally spaced apart from the floating diffusion region and a transfer transistor coupling the photodiode and the floating diffusion region. The sensor further includes a photodiode control ele

A sensor includes a substrate, a floating diffusion node in the substrate, a photodiode in the substrate laterally spaced apart from the floating diffusion region and a transfer transistor coupling the photodiode and the floating diffusion region. The sensor further includes a photodiode control electrode disposed on the photodiode and configured to control a carrier distribution of the photodiode responsive to a control signal applied thereto. The floating diffusion region may have a first conductivity type, the photodiode may include a first semiconductor region of a second conductivity type disposed on a second semiconductor region of the first conductivity type, and the photodiode control electrode may be disposed on the first semiconductor region. The photodiode may be configured to receive incident light from a side of the substrate opposite the photodiode control electrode. The transfer transistor may include a gate electrode on a channel region in the substrate and the photodiode control electrode and the transfer transistor gate electrode may be separately controllable. In further embodiments, the photodiode control electrode comprises an extension of the transfer transistor gate electrode.

대표청구항 ▼

1. A sensor comprising: a substrate;a floating diffusion region in the substrate;a photodiode in the substrate;a transfer transistor having a channel extending between the floating diffusion region and a portion of the photodiode laterally spaced apart from the floating diffusion region; andan elect

1. A sensor comprising: a substrate;a floating diffusion region in the substrate;a photodiode in the substrate;a transfer transistor having a channel extending between the floating diffusion region and a portion of the photodiode laterally spaced apart from the floating diffusion region; andan electrode disposed on the portion of the photodiode, wherein the photodiode is configured to receive incident light from a side of the substrate opposite the electrode. 2. The sensor of claim 1, wherein the photodiode is configured to accumulate carriers responsive to the incident light. 3. The sensor of claim 1, wherein the photodiode comprises a first semiconductor region of a first conductivity type disposed on a second semiconductor region of a second conductivity type, wherein the electrode is disposed on the first semiconductor region. 4. The sensor of claim 3, wherein the floating diffusion region has the second conductivity type. 5. The sensor of claim 3, wherein the photodiode is configured to receive incident light at a surface of the second semiconductor region opposite the surface of the first semiconductor region. 6. The sensor of claim 1, wherein the electrode extends to overlap at least a portion of the channel of the transfer transistor. 7. The sensor of claim 1, wherein the electrode is a control electrode configured to apply a control signal, and the transfer transistor comprises a gate electrode on a channel region in the substrate. 8. A sensor comprising: a substrate;a floating diffusion region in the substrate;a photodiode in the substrate laterally spaced apart from the floating diffusion region;a transfer transistor coupling the photodiode and the floating diffusion region; andan electrode disposed on the photodiode, wherein the photodiode is configured to receive incident light from a side of the substrate opposite the electrode, wherein the electrode is a control electrode configured to apply a control signal and the transfer transistor comprises a gate electrode on a channel region in the substrate and wherein the control electrode comprises an extension of the gate electrode of the transfer transistor that extends laterally off the channel region. 9. The sensor of claim 7, further comprising a control circuit coupled to the control electrode and the gate electrode of the transfer transistor. 10. The sensor of claim 9, wherein the control circuit is configured to bias the control electrode to a first potential to create a majority-carrier concentration region in a first semiconductor region near the control electrode while causing the transfer transistor to impede charge transfer through a channel of the transfer transistor in a charge accumulation phase and to bias the control electrode to a second potential while allowing charge transfer through the transfer transistor in a charge transfer phase. 11. The sensor of claim 10, wherein the second potential increases a potential of the photodiode with respect to the floating diffusion region. 12. The sensor of claim 10, wherein the control circuit is configured to bias the photodiode control electrode and a gate electrode of the transfer transistor with voltages of opposite polarities to allow charge transfer through the transfer transistor in the charge transfer phase. 13. The sensor of claim 1, wherein the electrode substantially covers an upper surface of the photodiode and is configured to control a carrier distribution of the photodiode responsive to a control signal applied thereto. 14. A sensor comprising: a substrate;a floating diffusion region in the substrate;a photodiode in the substrate;an electrode disposed on a portion of the photodiode laterally spaced apart from the floating diffusion region,wherein the photodiode is configured to receive incident light from a side of the substrate opposite the electrode. 15. The sensor of claim 14, further comprising a transfer channel between the portion of the photodiode and the floating diffusion region. 16. The sensor of claim 14, further comprising a transfer transistor coupling the portion of the photodiode and the floating diffusion region.