IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0531567
(2012-06-24)
|
등록번호 |
US-8633550
(2014-01-21)
|
우선권정보 |
JP-2011-145701 (2011-06-30) |
발명자
/ 주소 |
- Uno, Tomoaki
- Onaya, Yoshitaka
- Kato, Hirokazu
- Kudo, Ryotaro
- Saikusa, Koji
- Funatsu, Katsuhiko
|
출원인 / 주소 |
- Renesas Electronics Corporation
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
2 인용 특허 :
12 |
초록
▼
To improve reliability of a semiconductor device A power MOSFET for switching and a sense MOSFET having an area smaller than that of the power MOSFET and configured to detect an electric current flowing through the power MOSFET are formed within one semiconductor chip CPH and the semiconductor chip
To improve reliability of a semiconductor device A power MOSFET for switching and a sense MOSFET having an area smaller than that of the power MOSFET and configured to detect an electric current flowing through the power MOSFET are formed within one semiconductor chip CPH and the semiconductor chip CPH is mounted over a chip mounting part via an electrically conductive joining material and sealed with a resin. In a main surface of the semiconductor chip CPH, a sense MOSFET region in which the sense MOSFET is formed is located more internally than a source pad PDHS4 of the sense MOSFET region RG2. Furthermore, in the main surface of the semiconductor chip, the sense MOSFET region RG2 is surrounded by a region in which the power MOSFET is formed.
대표청구항
▼
1. A semiconductor device comprising: a first chip mounting part having electric conductivity;a first semiconductor chip having a first main surface and a first back surface on the side opposite to the first main surface, the first back surface being joined to the first chip mounting part via an ele
1. A semiconductor device comprising: a first chip mounting part having electric conductivity;a first semiconductor chip having a first main surface and a first back surface on the side opposite to the first main surface, the first back surface being joined to the first chip mounting part via an electrically conductive joining material; anda sealing part configured to seal at least a part of the first semiconductor chip and the first chip mounting part,wherein in the first semiconductor chip, a first MOSFET and a second MOSFET, the drains of which are electrically connected to each other and the gates of which are electrically connected to each other are formed,the first MOSFET is formed in a first region of the first main surface of the first semiconductor chip,the second MOSFET is an element configured to detect an electric current flowing through the first MOSFET and formed in a second region of the first main surface of the first semiconductor chip,a first gate pad electrically connected to the gates of the first and second MOSFETs, a first source pad electrically connected to the source of the first MOSFET, and a second source pad electrically connected to the source of the second MOSFET are formed on the first main surface of the first semiconductor chip,a drain electrode electrically connected to the drains of the first and second MOSFETs is formed on the first back surface of the first semiconductor chip, andin the first main surface of the first semiconductor chip, the area of the second region is smaller than that of the first region, and the second region is located more internally than the second source pad. 2. The semiconductor device according to claim 1, wherein the source region of the second MOSFET formed in the second region and the second source pad are electrically connected via a wiring for source formed in the first semiconductor chip. 3. The semiconductor device according to claim 2, wherein on the first main surface of the first semiconductor chip, the second region is arranged closer to inside than the first gate pad. 4. The semiconductor device according to claim 3, wherein on the first main surface of the first semiconductor chip, the second region is surrounded by the first region in a planar view. 5. The semiconductor device according to claim 4, wherein on the first main surface of the first semiconductor chip, the second region is surrounded by the first source pad in a planar view. 6. The semiconductor device according to claim 5, wherein the first MOSFET is controlled depending on electric current flowing through the second MOSFET. 7. The semiconductor device according to claim 6, further comprising a first conductor part, at least a part of which is sealed by the sealing part, wherein the first source pad and the first conductor part are electrically connected via a first conductor plate, andin the main surface of the first semiconductor chip, the second region overlaps with the conductor plate in a planar view. 8. The semiconductor device according to claim 7, further comprising: a second semiconductor chip mounted over the first conductor part; anda second conductor part at least a part of which is sealed by the sealing part,wherein the second semiconductor chip has a second main surface and a second back surface on the side opposite to the second main surface, the second back surface being joined to the first conductor part via an electrically conductive joining material,in the second semiconductor chip, a third MOSFET is formed,a second gate pad electrically connected to the gate of the third MOSFET and a third source pad electrically connected to the source of the third MOSFET are formed on the second main surface of the second semiconductor chip,a drain electrode electrically connected to the drain of the third MOSFET is formed on the second back surface of the second semiconductor chip, andthe third source pad and the second conductor part are electrically connected via a second conductor plate. 9. The semiconductor device according to claim 8, further comprising: a second chip mounting part; anda third semiconductor chip having a third main surface and a third back surface on the side opposite to the third main surface, the third back surface being joined to the second chip mounting part,wherein in the third semiconductor chip, a control circuit configured to control the first and second MOSFETs is formed, andthe first gate pad, the second gate pad, and the second source pad are electrically connected to the pad of the second semiconductor chip, respectively, via wires. 10. The semiconductor device according to claim 9, wherein when determining that an electric current flowing through the second MOSFET is excessive, the control circuit of the third semiconductor chip turns off the first MOSFET. 11. The semiconductor device according to claim 4, wherein in the first main surface of the first semiconductor chip, a third source pad electrically connected to the source of the first MOSFET is further formed,a wiring for gate electrically connecting the gates of the first and second MOSFETs and the first gate pad extends between the first source pad and the third source pad in the same layer as that of the wiring for source in a planar view, andthe wiring for source extends along the wiring for gate between the first source pad and the third source pad in a planar view. 12. The semiconductor device according to claim 11, further comprising a first conductor part at least a part of which is sealed by the sealing part, wherein the first and third source pads and the first conductor part are electrically connected via a first conductor plate, andin the main surface of the first semiconductor chip, the second region overlaps with the conductor plate in a planar view. 13. A semiconductor device comprising: a first chip mounting part having electric conductivity;a first semiconductor chip having a first main surface and a first back surface on the side opposite to the first main surface, the first back surface being joined to the first chip mounting part via an electrically conductive joining material; anda sealing part configured to seal at least a part of the first semiconductor chip and the first chip mounting part,wherein in the first semiconductor chip, a first MOSFET and a second MOSFET the drains of which are electrically connected to each other and the gates of which are electrically connected to each other are formed,the first MOSFET is formed in a first region of the first main surface of the first semiconductor chip,the second MOSFET is an element configured to detect an electric current flowing through the first MOSFET and is formed in a second region of the first main surface of the first semiconductor chip,a first gate pad electrically connected to the gates of the first and second MOSFETs, a first source pad electrically connected to the source of the first MOSFET, and a second source pad electrically connected to the source of the second MOSFET are formed on the first main surface of the first semiconductor chip,a drain electrode electrically connected to the drains of the first and second MOSFETs is formed on the first back surface of the first semiconductor chip, andin the first main surface of the first semiconductor chip, the area of the second region is smaller than that of the first region and the second region is surrounded by the first region in a planar view. 14. The semiconductor device according to claim 13, wherein in the first main surface of the first semiconductor chip, the second source pad overlaps with the second region in a planar view. 15. The semiconductor device according to claim 14, wherein in the first main surface of the first semiconductor chip, the second source pad is arranged more internally than the first gate pad. 16. The semiconductor device according to claim 15, wherein in the first main surface of the first semiconductor chip, the second source pad is surrounded by the first source pad in a planar view. 17. The semiconductor device according to claim 16, further comprising a first conductor part at least a part of which is sealed by the sealing part, wherein the first source pad and the second conductor part are electrically connected via a first conductor plate. 18. The semiconductor device according to claim 17, wherein the first conductor plate has an opening,in the first main surface of the first semiconductor chip, the second source pad is exposed from the opening in a planar view, andto the second source pad, a wire is connected. 19. The semiconductor device according to claim 18, further comprising: a second semiconductor chip mounted over the first conductor part; anda second conductor part at least a part of which is sealed by the sealing part,wherein the second semiconductor chip has a second main surface and a second back surface on the side opposite to the second main surface, the second back surface being joined to the first conductor part via an electrically conductive joining material,in the second semiconductor chip, a third MOSFET is formed,a second gate pad electrically connected to the gate of the third MOSFET and a third source pad electrically connected to the source of the third MOSFET are formed on the second main surface of the second semiconductor chip,a drain electrode electrically connected to the drain of the third MOSFET is formed on the second back surface of the second semiconductor chip, andthe third source pad and the second conductor part are electrically connected via a second conductor plate. 20. The semiconductor device according to claim 19, further comprising: a second chip mounting part; anda third semiconductor chip having a third main surface and a third back surface on the side opposite to the third main surface, the third back surface being joined to the second chip mounting part,wherein in the second semiconductor chip, a control circuit configured to control the first and second MOSFETs is formed, andthe first gate pad, the second gate pad, and the second source pad are electrically connected to the pad of the third semiconductor chip, respectively, via wires. 21. A semiconductor device having: a first chip mounting part having electric conductivity;a first semiconductor chip having a first main surface and a first back surface on the side opposite to the first main surface, the first back surface being joined to the first chip mounting part via an electrically conductive joining material; anda sealing part configured to seal at least a part of the first semiconductor chip and the first chip mounting part,wherein in the first semiconductor chip, a first MOSFET and a second MOSFET the sources of which are electrically connected to each other and the gates of which are electrically connected to each other are formed,the first MOSFET is formed in a first region of the first main surface of the first semiconductor chip,the second MOSFET is an element configured to detect an electric current flowing through the first MOSFET and formed in a second region of the first main surface of the first semiconductor chip,a first gate pad electrically connected to the gates of the first and second MOSFETs, a first drain pad electrically connected to the drain of the first MOSFET, and a second drain pad electrically connected to the drain of the second MOSFET are formed on the first main surface of the first semiconductor chip,a source electrode electrically connected to the sources of the first and second MOSFETs is formed on the first back surface of the first semiconductor chip, andin the first main surface of the first semiconductor chip, the area of the second region is smaller than that of the first region and the second region is located more internally than the second drain pad. 22. A semiconductor device comprising: a first chip mounting part having electric conductivity;a first semiconductor chip having a first main surface and a first back surface on the side opposite to the first main surface, the first back surface being joined to the first chip mounting part via an electrically conductive joining material; anda sealing part configured to seal at least a part of the first semiconductor chip and the first chip mounting part,wherein in the first semiconductor chip, a first MOSFET and a second MOSFET the sources of which are electrically connected to each other and the gates of which are electrically connected to each other are formed,the first MOSFET is formed in a first region of the first main surface of the first semiconductor chip,the second MOSFET is an element configured to detect an electric current flowing through the first MOSFET and formed in a second region of the first main surface of the first semiconductor chip,a first gate pad electrically connected to the gates of the first and second MOSFETs, a first drain pad electrically connected to the drain of the first MOSFET, and a second drain pad electrically connected to the drain of the second MOSFET are formed on the first main surface of the first semiconductor chip,a source electrode electrically connected to the sources of the first and second MOSFETs is formed on the first back surface of the first semiconductor chip, andin the first main surface of the first semiconductor chip, the area of the second region is smaller than that of the first region and the second region is surrounded by the first region in a planar view.
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