IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0937458
(2009-05-26)
|
등록번호 |
US-8652582
(2014-02-18)
|
국제출원번호 |
PCT/US2009/045110
(2009-05-26)
|
§371/§102 date |
20101012
(20101012)
|
국제공개번호 |
WO2009/148869
(2009-12-10)
|
발명자
/ 주소 |
- Bothof, Catherine A.
- He, Yi
- Rasmussen, Jerald K.
- Seshadri, Kannan
- Waller, Jr., Clinton P.
- Weiss, Douglas E.
|
출원인 / 주소 |
- 3M Innovative Properties Company
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
4 인용 특허 :
132 |
초록
Ligand functionalized substrates, methods of making ligand functionalized substrates, and methods of using functionalized substrates are disclosed. The ligand functionalized substrate may be described as the grafted reaction product of a substrate and a ligand monomer of Formula I:
대표청구항
▼
1. A method of making a ligand functionalized substrate, the method comprises the steps of: 1) providing a base substrate;2) coating the substrate with a solution comprising (a) at least one grafting monomer having an acryloyl group and a photoinitiator group; (b) one or more ligand monomers of the
1. A method of making a ligand functionalized substrate, the method comprises the steps of: 1) providing a base substrate;2) coating the substrate with a solution comprising (a) at least one grafting monomer having an acryloyl group and a photoinitiator group; (b) one or more ligand monomers of the formula: wherein R1 is H or C1-C4 alkyl, R2 is a divalent alkylene optionally containing an ester, amide, urethane or urea linking group; each R3 is independently H or C1-C4 alkyl, R4 is H, C1-C4 alkyl or —N(R3)2; and X1 is —O— or —NR3—, (c) optionally one or more monomers having at least one acryloyl group and at least one additional ethylenically unsaturated, free-radically polymerizable group; and (d) optionally one or more hydrophilic monomers; 3) exposing the coated base substrate to ionizing radiation to form a first functionalized substrate comprising grafted photoinitiator groups attached to the surface of the base substrate and unreacted (b), (c) and (d) monomers having ethylenically unsaturated, free-radically polymerizable groups, and4) exposing the base substrate comprising grafted photoinitiator groups to UV radiation to polymerize the remaining ethylenically unsaturated, free-radically polymerizable groups of the (b), (c) and (d) monomers. 2. The method of claim 1 wherein said substrate is a porous substrate having interstitial and outer surfaces. 3. The method of claim 2 wherein the step of coating comprises imbibing the porous base substrate with the solution. 4. The method of claim 1 wherein said ionizing radiation is gamma or electron beam radiation. 5. The method of claim 1 wherein said monomers (c) having least one acryloyl group and at least one additional ethylenically unsaturated, free-radically polymerizable group comprises a first acryloyl group for grafting to said porous base substrate and a second methacryloyl group for subsequent UV polymerization. 6. The method of claim 1 wherein said monomer c) is of the formula: [CH2═CH—C(O)—X1]a—R10-Q-Zb,where Z is an acryloyl or non-acryloyl, ethylenically unsaturated polymerizable group,X1 is —O— or —NR3, where R3 is H or C1-C4 alkyl,Q is a divalent linking group selected from a covalent bond, —O—, —NR1—, —CO2— and —CONR1—, where R1 is H or C1-C4 alkyl; andR10 is an alkylene group, and optionally containing one or more ether oxygen atoms and/or one or more hydroxyl groups;and a and b are each at least one. 7. The method of claim 1, wherein the base substrate is microporous. 8. The method of claim 1, wherein the base substrate is selected from a porous membrane, porous non-woven web, or porous fiber. 9. The method of claim 1, wherein the monomer c) comprises a poly(alkylene oxide) compound having at least one acryloyl group and at least one additional ethylenically unsaturated, free-radically polymerizable group. 10. The method of claim 9, wherein the monomer c) is of the formula: Z-Q-(CH(R1)—CH2—O)n—C(O)—CH═CH2,wherein Z is an acryloyl or non-acryloyl, polymerizable ethylenically unsaturated group, R1 is a H or a C1 to C4 alkyl group, and n is from 2 to 100, and Q is a divalent linking group selected from a covalent bond, —O—, —NR1—, —CO2— and —CONR1—, where R1 is H or C1-C4 alkyl. 11. The method of claim 1, wherein said solution comprises one or more additional monomers having a free-radically polymerizable group and a hydrophilic group. 12. The method of claim 1 wherein said hydrophilic monomers are of the formula: CH2═CR1—C(O)—X1—(CH(R1)—CH2—O)n—R1,wherein each R1 is independently H or C1-C4 alkyl, X1 is —O— or —NR3—, where R3 is H or C1-C4 alkyl. 13. The method of claim 7, wherein the microporous base substrate is formed by a thermally-induced phase separation (TIPS) method. 14. The method of claim 7, wherein the microporous base substrate comprises poly(vinylidine fluoride) microporous base substrate. 15. The method of claim 1, wherein the ionizing radiation is electron beam radiation at a dosage of less than 80 kGy. 16. The method of claim 1 wherein said ligand monomer is the formula: whereR1 is H or C1-C4 alkyl,each R3 is independently H or C1-C4 alkyl,R4 is H, C1-C4 alkyl or —N(R3)2,X1 is —O— or —NR3—, where R3 is H or C1-C4 alkyl,R7 and R8 are each independently is C1 to C10 alkylene; andZ is an ester, amide, urea, or urethane group.
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