IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0374227
(2011-12-16)
|
등록번호 |
US-8661961
(2014-03-04)
|
발명자
/ 주소 |
- Rosenberg, James Jordan
- DeLisio, Michael Peter
- Deckman, Blythe Chadwick
- Aronson, Michael Loren
|
출원인 / 주소 |
|
대리인 / 주소 |
|
인용정보 |
피인용 횟수 :
1 인용 특허 :
8 |
초록
▼
An active denial apparatus for use in non-lethal weaponry includes at least one focusing element configured to focus millimeter-wave energy along an axis of propagation. The at least one focusing element includes an astigmatic or dual axis focusing system configured to direct a focused beam that all
An active denial apparatus for use in non-lethal weaponry includes at least one focusing element configured to focus millimeter-wave energy along an axis of propagation. The at least one focusing element includes an astigmatic or dual axis focusing system configured to direct a focused beam that allows the active denial apparatus to accurately immobilize targets at both close and long range within acceptable limits of intensity.
대표청구항
▼
1. An active denial apparatus comprising: a high-power millimeter wave source; andat least one beam-processing element for directing millimeter wave energy along an axis of propagation, the at least one beam-processing element including a variable focusing system delivering a substantially constant
1. An active denial apparatus comprising: a high-power millimeter wave source; andat least one beam-processing element for directing millimeter wave energy along an axis of propagation, the at least one beam-processing element including a variable focusing system delivering a substantially constant power density over the axis of propagation by alternating between at least two focusing configurations comprised of a focusing profile in which a focused, near-field beam is directed in a plane defined by a x-axis and a z-axis that includes the axis of propagation, and a substantially different focusing profile in which a focused, near-field beam is directed a plane defined by a y-axis and the z-axis also including the axis of propagation that is perpendicular to the x-plane, to enable effective operation of an active denial apparatus regardless of knowledge of a target's position across different ranges of distance in the axis of propagation. 2. The active denial apparatus of claim 1, wherein one or more of the at least two focusing configurations delivers a beam with an effective cross sectional area that is substantially constant over a wide range in an axis of propagation. 3. The active denial apparatus of claim 1, wherein the focused, near-field beam delivered by the variable focusing system diverges in the plane defined by a x-axis and a z-axis and converges in the plane defined by a y-axis and the z-axis. 4. The active denial apparatus of claim 1, wherein the at least two focusing configurations alternate the millimeter wave energy between a plurality of fixed focus settings having either different effective apertures, different effective focal lengths in the plane defined by the y-axis and the z-axis, the plane defined by the y-axis and the z-axis, or both, or both different effective apertures and effective focal lengths. 5. The active denial apparatus of claim 1, wherein the at least two focusing configurations are each configured to deliver an effective power density within a desired range of power densities over different ranges of distance in an axis of propagation. 6. The active denial apparatus of claim 1, wherein the at least one beam processing element includes at least one of a shaped reflector, shaped transmissive lens, flat-panel array antenna, or a phased array system, or any combination thereof. 7. The active denial apparatus of claim 1, wherein the high-power millimeter-wave source includes at least one of a solid-state source or a vacuum tube-based source. 8. The active denial apparatus of claim 7, wherein if the high-power millimeter-wave source includes a solid-state source, then the high-power millimeter-wave source also includes at least one of a grid amplifier or a grid oscillator, or any combination thereof. 9. A method of focusing energy in an active denial device comprising: generating millimeter-wave energy from a high-power millimeter wave source; anddirecting millimeter wave energy along an axis of propagation, wherein at least one beam-processing element includes a variable focusing system delivering a substantially constant power density over the axis of propagation by alternating between at least two focusing configurations of a focusing profile in which a focused, near-field beam is directed in a plane defined by a x-axis and a z-axis that includes the axis of propagation, and a substantially different focusing profile in which a focused, near-field beam is directed a plane defined by a y-axis and the z-axis also including the axis of propagation that is perpendicular to the x-plane, to enable effective operation of an active denial apparatus regardless of knowledge of a target's position across different ranges of distance in the axis of propagation. 10. The method of claim 9, wherein one or more of the at least two focusing configurations delivers a beam with an effective cross sectional area that is substantially constant over a wide range in an axis of propagation. 11. The method of claim 9, wherein the focused, near-field beam delivered by the variable focusing system diverges in the plane defined by a x-axis and a z-axis and converges in the plane defined by a y-axis and the z-axis. 12. The method of claim 9, wherein the at least two focusing configurations alternate the millimeter wave energy between a plurality of fixed focus settings having either different effective apertures, different effective focal lengths in the plane defined by the y-axis and the z-axis, the plane defined by the y-axis and the z-axis, or both, or both different effective apertures and effective focal lengths. 13. The method of claim 9, wherein the at least two focusing configurations are each configured to deliver an effective power density within a desired range of power densities over different ranges of distance in an axis of propagation. 14. The method of claim 9, wherein the at least one beam processing element includes at least one of a shaped reflector, shaped transmissive lens, flat-panel array antenna, or a phased array system, or any combination thereof. 15. The method of claim 9, wherein the high-power millimeter-wave source includes at least one of a solid-state source or a vacuum tube-based source.
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