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Method and apparatus for cleaning a substrate using non-newtonian fluids

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B08B-003/00
출원번호 US-0252859 (2011-10-04)
등록번호 US-8671959 (2014-03-18)
발명자 / 주소
  • de Larios, John M.
  • Ravkin, Mike
  • Farber, Jeffrey
  • Korolik, Mikhail
  • Redeker, Fred C.
출원인 / 주소
  • Lam Research Corporation
대리인 / 주소
    Martine Penilla Group, LLP
인용정보 피인용 횟수 : 1  인용 특허 : 100

초록

An apparatus for cleaning a substrate includes an application unit having a top inlet conduit and a bottom plate section. The top inlet conduit has an opening for receiving a non-Newtonian fluid and the bottom plate section has an opening through which the non-Newtonian fluid can flow. The bottom pl

대표청구항

1. An apparatus for cleaning a substrate, comprising: an application unit having a top inlet conduit and a bottom plate section integrally formed as a single member, the top inlet conduit having an opening for receiving a non-Newtonian fluid and being configured to guide the non-Newtonian fluid towa

이 특허에 인용된 특허 (100)

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이 특허를 인용한 특허 (1)

  1. Rosko, Michael Scot; Jonte, Patrick B.; DeVries, Adam M.; Thomas, Kurt J.; Sawaski, Joel D., Ozone distribution in a faucet.
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