초록 ▼

A curing apparatus for thermally processing thin films on low-temperature substrates at high speeds is disclosed. The curing apparatus includes a strobe head, a strobe control module and a conveyor control module. The strobe control module controls the power, duration and repetition rate of a set of

A curing apparatus for thermally processing thin films on low-temperature substrates at high speeds is disclosed. The curing apparatus includes a strobe head, a strobe control module and a conveyor control module. The strobe control module controls the power, duration and repetition rate of a set of pulses generated by a flash lamp on the strobe head. The conveyor control module along with the strobe control module provide real-time synchronization between the repetition rate of the set of pulses and the speed at which the substrate is being moved under the strobe head, according to the speed information.

대표청구항 ▼

1. A curing apparatus comprising: a conveyor system for transporting a layer of thin film mounted on a low-temperature substrate;a strobe head having a flash lamp for providing a plurality of electromagnetic pulses to said layer of thin film;a strobe control module for controlling power, duration an

1. A curing apparatus comprising: a conveyor system for transporting a layer of thin film mounted on a low-temperature substrate;a strobe head having a flash lamp for providing a plurality of electromagnetic pulses to said layer of thin film;a strobe control module for controlling power, duration and repetition rate of said plurality of electromagnetic pulses generated by said flash lamp; anda conveyor control module, in conjunction with said strobe control module, for synchronizing in real-time said repetition rate of said plurality of electromagnetic pulses with the speed at which said low-temperature substrate is being moved pass said strobe head; andmeans for blowing air to cool said thin film after said thin film has been exposed to one of said electromagnetic pulses. 2. The curing apparatus of claim 1, wherein said flash lamp is a xenon flash lamp. 3. The curing apparatus of claim 2, wherein said xenon flash lamp is capable of generating pulses from 10 μs to 10 ms at a pulse repetition rate of up to 1 kHz. 4. The curing apparatus of claim 2, wherein the spectral content of said xenon flash lamp ranges from 200 nm to 2,500 nm. 5. The curing apparatus of claim 1, wherein said flash lamp is a Directed Plasma Arc lamp. 6. The curing apparatus of claim 1, wherein said curing apparatus further includes a feeder for feeding said low-temperature substrate to said conveyor system. 7. The curing apparatus of claim 1, wherein said curing apparatus further includes a sensor for sensing the speed at which said low-temperature substrate is being moved pass said flash lamp. 8. The curing apparatus of claim 1, wherein said speed synchronization is given by: f=0.2*S*OW wherein f=pulse repetition rate [Hz]S=speed at which said low-temperature substrate is being moved [ft/min]O=overlap factorW=width of said strobe head [in]. 9. A curing apparatus comprising: a conveyor system for transporting a layer of thin film mounted on a low-temperature substrate;a strobe head having a flash lamp for providing a plurality of electromagnetic pulses to said layer of thin film;a strobe control module for controlling power, duration and repetition rate of said plurality of electromagnetic pulses generated by said flash lamp; anda conveyor control module, in conjunction with said strobe control module, for synchronizing in real-time said repetition rate of said plurality of electromagnetic pulses with the speed at which said low-temperature substrate is being moved pass said strobe head; andmeans for cooling said thin film by removing heat from said substrate via conduction after said thin film has been exposed to one of said electromagnetic pulses. 10. The curing apparatus of claim 9, wherein said means for cooling includes a roller. 11. The curing apparatus of claim 9, wherein said flash lamp is a xenon flash lamp. 12. The curing apparatus of claim 11, wherein said xenon flash lamp is capable of generating pulses from 10 μs to 10 ms at a pulse repetition rate of up to 1 kHz. 13. The curing apparatus of claim 12, wherein the spectral content of said xenon flash lamp ranges from 200 nm to 2,500 nm. 14. The curing apparatus of claim 9, wherein said flash lamp is a Directed Plasma Arc lamp. 15. The curing apparatus of claim 9, wherein said curing apparatus further includes a feeder for feeding said low-temperature substrate to said conveyor system. 16. The curing apparatus of claim 9, wherein said curing apparatus further includes a sensor for sensing the speed at which said low-temperature substrate is being moved pass said flash lamp. 17. The curing apparatus of claim 9, wherein said speed synchronization is given by: f=0.2*S*OW wherein f=pulse repetition rate [Hz]S=speed at which said low-temperature substrate is being moved [ft/min]O=overlap factorW=width of said strobe head [in].