IPC분류정보
국가/구분 |
United States(US) Patent
등록
|
국제특허분류(IPC7판) |
|
출원번호 |
US-0329254
(2011-12-17)
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등록번호 |
US-8679231
(2014-03-25)
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발명자
/ 주소 |
- Wilson, Shaun M.
- Sturm, Edward A.
|
출원인 / 주소 |
- Advanced Technology Materials, Inc.
|
대리인 / 주소 |
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인용정보 |
피인용 횟수 :
2 인용 특허 :
113 |
초록
▼
A polyvinylidene fluoride (PVDF) pyrolyzate adsorbent is described, having utility for storing gases in an adsorbed state, and from which adsorbed gas may be desorbed to supply same for use. The PVDF pyrolyzate adsorbent can be of monolithic unitary form, or in a bead, powder, film, particulate or o
A polyvinylidene fluoride (PVDF) pyrolyzate adsorbent is described, having utility for storing gases in an adsorbed state, and from which adsorbed gas may be desorbed to supply same for use. The PVDF pyrolyzate adsorbent can be of monolithic unitary form, or in a bead, powder, film, particulate or other finely divided form. The adsorbent is particularly suited for storage and supply of fluorine-containing gases, such as fluorine gas, nitrogen trifluoride, carbo-fluoride gases, and the like. The adsorbent may be utilized in a gas storage and dispensing system, in which the adsorbent is contained in a supply vessel, from which sorbate gas can be selectively dispensed.
대표청구항
▼
1. A polyvinylidene fluoride (PVDF) pyrolyzate carbon adsorbent, having a gas adsorbed thereon, wherein the gas comprises a fluorine-containing gas. 2. The carbon adsorbent of claim 1, having porosity including pores of a size in a range of from 0.2 to 5 nanometers. 3. The carbon adsorbent of claim
1. A polyvinylidene fluoride (PVDF) pyrolyzate carbon adsorbent, having a gas adsorbed thereon, wherein the gas comprises a fluorine-containing gas. 2. The carbon adsorbent of claim 1, having porosity including pores of a size in a range of from 0.2 to 5 nanometers. 3. The carbon adsorbent of claim 1, having porosity, wherein at least 30% of overall porosity of said adsorbent comprises pores having a size in a range of from about 0.3 to about 0.72 nanometer, and at least 50% of the overall porosity comprises pores of diameter <2 nanometers. 4. The carbon adsorbent of claim 1, having bulk density of at least 0.6 grams per cubic centimeter. 5. The carbon adsorbent of claim 1, having a bulk density of from about 0.6 to about 1.8 grams per cubic centimeter. 6. The carbon adsorbent of claim 1, having fluorine gas permeability of at least 100 cc/psi/cm2/min at 275 kPa pressure. 7. The carbon adsorbent of claim 1, having fluorine gas permeability within a range of from 100 to 600 cc/psi/cm2/min at 275 kPa pressure. 8. The carbon adsorbent of claim 1, of monolithic form. 9. The carbon adsorbent of claim 1, of particulate form. 10. The carbon adsorbent of claim 1, wherein the gas comprises one or more gas species selected from the group consisting of boron trifluoride, nitrogen trifluoride, fluorine, hydrogen fluoride, diboron tetrafluoride, and carbofluoride compounds. 11. The carbon adsorbent of claim 1, disposed in a fluid storage and dispensing vessel configured to store gas having sorptive affinity for the carbon adsorbent in an adsorbed state, and to discharge gas desorbed from the carbon adsorbent under dispensing conditions. 12. The carbon adsorbent of claim 11, having porosity including pores of a size in a range of from 0.2 to 5 nanometers. 13. The carbon adsorbent of claim 11, having porosity, wherein at least 30% of overall porosity of said adsorbent comprises pores having a size in a range of from about 0.3 to about 0.72 nanometer, and at least 50% of the overall porosity comprises pores of diameter <2 nanometers. 14. The carbon adsorbent of claim 11, having bulk density of at least 0.6 grams per cubic centimeter and fluorine gas permeability of at least 100 cc/psi/cm2/min at 275 kPa pressure. 15. A method of gas handling, comprising one of (i) adsorbing on, and (ii) desorbing a fluorine-containing gas from, a polyvinylidene fluoride (PVDF) pyrolyzate carbon adsorbent. 16. The method of claim 15, comprising desorbing gas from the carbon adsorbent, and utilizing the desorbed gas in the manufacture of a semiconductor, flat panel display, or solar product.
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