Prevention of face-plugging on aftertreatment devices in exhaust
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B01J-037/02
B01J-035/10
출원번호
US-0602898
(2012-09-04)
등록번호
US-8691724
(2014-04-08)
발명자
/ 주소
Simon, III, Conrad J.
Yonushonis, Thomas M.
Blackwell, Bryan E.
출원인 / 주소
Cummins Filtration IP, Inc.
대리인 / 주소
Krieg DeVault LLP
인용정보
피인용 횟수 :
1인용 특허 :
8
초록▼
An inlet face for an aftertreatment device that prevents and/or eliminates face-plugging for a passageway where the inlet face is disposed. The inlet face includes a particular end surface disposed on an outer surface at the end of a substrate. The end surface includes at least one of a three-dimens
An inlet face for an aftertreatment device that prevents and/or eliminates face-plugging for a passageway where the inlet face is disposed. The inlet face includes a particular end surface disposed on an outer surface at the end of a substrate. The end surface includes at least one of a three-dimensional topographical configuration disposed at the end of the substrate, a chemical coating applied on the end of the substrate, or both a three-dimensional topographical configuration disposed on the end of the substrate and a chemical coating applied on the three-dimensional topographical configuration. As one example, the inlet face can be helpful in preventing carbonaceous fouling, which can result from engine exhaust material, such as carbon soot and other engine exhaust by-products.
대표청구항▼
1. A method for preventing and/or eliminating face-plugging on an inlet of an aftertreatment device comprising: forming a substrate having an end and an interior with a cellular structure that is configured to enable fluid flow through the substrate;disposing an end surface on the end of the substra
1. A method for preventing and/or eliminating face-plugging on an inlet of an aftertreatment device comprising: forming a substrate having an end and an interior with a cellular structure that is configured to enable fluid flow through the substrate;disposing an end surface on the end of the substrate and on outer surfaces of the cellular structure located at the end of the substrate, the end surface including an amount of a chemical coating that is configured to prevent and/or eliminate face-plugging on the substrate and cellular structure; andwherein the disposing the surface on the substrate further comprises at least one of: applying the amount of the chemical coating on the outer surface at the end of the substrate and on outer surfaces of the cellular structure present at the end of the substrate without the amount of chemical coating extending into the interior of the substrate; and applying the chemical coating on a three-dimensional topographical configuration on the end of the substrate without the amount of the chemical coating extending into the interior of the substrate, such that the chemical coating faces outward from the end of the substrate. 2. An aftertreatment device comprising: a substrate including an end having a cellular structure defining an interior of the substrate that is configured to enable fluid flow through the substrate, the cellular structure being an inlet face disposed at the end of the substrate;an end surface disposed on the end of the substrate and on outer surfaces of the cellular structure located at the end of the substrate, the end surface including a chemical coating applied in an amount configured to prevent and/or eliminate face-plugging on the substrate, wherein the chemical coating isat least one of: applied on the outer surface at the end of the substrate without the amount of the chemical coating extending into the interior of the substrate and applied on a three-dimensional topographical configuration disposed on the end of the substrate without the amount of the chemical coating extending into the interior of the substrate. 3. The aftertreatment device of claim 2, wherein the three-dimensional topographical configuration comprises a plurality of adjacent v-shaped parallel rows. 4. The aftertreatment device of claim 2, wherein the three-dimensional topographical configuration comprises a first plurality of adjacent v-shaped parallel rows and a second plurality of adjacent v-shaped parallel rows that are orthogonal to the first plurality of adjacent v-shaped rows, such that the first and second plurality of adjacent v-shaped rows are configured as a multiple four-sided pyramid-like arrangement. 5. The aftertreatment device of claim 2, wherein the three-dimensional topographical configuration is applied onto the end of the substrate or is machined into the end of the substrate. 6. The aftertreatment device of claim 2, further comprising one of a diesel oxidation catalyst and a close-coupled catalyst, and wherein the one of the diesel oxidation catalyst and the close-coupled catalyst includes the substrate. 7. The aftertreatment device of claim 2, further comprising a filter including the substrate. 8. The aftertreatment device of claim 7, wherein the filter comprises at least one filter selected from the filters consisting of a soot filter, a catalyzed soot filter, and a diesel particulate filter. 9. The aftertreatment device of claim 2, further comprising one of a NOx adsorption catalyst and a selective reduction catalyst, and wherein the one of the NOx adsorption catalyst and the selective reduction catalyst includes the substrate. 10. An apparatus for preventing face plugging an inlet of an aftertreatment device, the apparatus comprising: a substrate including an end and an interior having a cellular structure configured to enable fluid flow through the substrate, the cellular structure being an inlet face disposed at the end of the substrate; andan end surface disposed on the end of the substrate and on outer surfaces of the cellular structure located at the end of the substrate, the end surface comprising a chemical coating in an amount that is configured to prevent face-plugging on the substrate, wherein the amount of the chemical coating does not extend into the interior of the substrate. 11. The apparatus of claim 10, wherein the end surface further comprises a three-dimensional topographical configuration disposed on the end of the substrate. 12. The apparatus of claim 10, wherein the aftertreatment device comprises at least one of a diesel oxidation catalyst and a catalyzed soot filter, and wherein the amount of the chemical coating comprises an elevated loading of a chemical coating employed within interior of the substrate. 13. The apparatus of claim 10, wherein the amount of the chemical coating comprises an elevated loading of one of precious metals and base metal oxides disposed within the interior of the substrate. 14. The apparatus of claim 13, wherein the elevated loading comprises a loading value between 80 and 120 g/ft3 inclusive. 15. The apparatus of claim 10, wherein the chemical coating is a glass based coating. 16. The apparatus of claim 15, wherein the amount of the chemical coating further comprises an elevated loading of at least one material selected from the materials consisting of: a precious metal, Pt, Pd, a base metal oxide, vanadium pentoxide, cerium oxide, vanadium, and BaCO3, wherein the at least one material is disposed within the interior of the substrate. 17. The apparatus of claim 15, wherein the glass based coating further comprises K.
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Dalla Betta Ralph A. (Mountain View CA) Tsurumi Kazunori (Fujisawa CA JPX) Shoji Toru (Sunnyvale CA), Graded palladium-containing partial combustion catalyst and a process for using it.
Gramiccioni, Gary A.; Brown, Kenneth R.; Munding, Andreas Richard, Apparatus and process for face painting substrates with PGM and base metal solutions.
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