A method and apparatus for targeting a beam of radiation is provided. A beam steering mirror and a beam capture mirror are movably disposed along an optical pathway. A controller moves the beam steering mirror and the beam capture mirror in an x-y plane, and rotates the mirrors, to target the beam t
A method and apparatus for targeting a beam of radiation is provided. A beam steering mirror and a beam capture mirror are movably disposed along an optical pathway. A controller moves the beam steering mirror and the beam capture mirror in an x-y plane, and rotates the mirrors, to target the beam to a target location on a surface, while keeping the optical path length substantially constant for all target locations on the surface. The surface is rotated by a rotational actuator to bring all target locations to positions accessible by the beam targeting optics. Imprecision in targeting and optical path length may be compensated by providing an actuated aperture at the beam entry point and/or a variable focus lens with an optical range finding detector, all in communication with the controller.
대표청구항▼
1. An apparatus for thermally treating a semiconductor substrate, comprising: a rotatable substrate support;a radiation source capable of producing a beam of radiation having substantially uniform intensity proximate the rotatable substrate support, the beam of radiation emerging from the radiation
1. An apparatus for thermally treating a semiconductor substrate, comprising: a rotatable substrate support;a radiation source capable of producing a beam of radiation having substantially uniform intensity proximate the rotatable substrate support, the beam of radiation emerging from the radiation source at a beam entry point;a constant optical path length beam location assembly disposed in optical communication with the beam entry point, the constant optical path length beam location assembly having a plurality of movable optical components, wherein the movable optical components comprise a first mirror and a second mirror, the first mirror coupled to a first linear actuator and a first rotational actuator and the second mirror coupled to a second linear actuator and a second rotational actuator, wherein the first linear actuator moves the first mirror along a first direction and the second linear actuator moves the second mirror along the first direction; anda controller coupled to the substrate support and the constant optical path length beam location assembly, the controller adapted to position the optical components of the beam location assembly and a selected portion of a substrate on the substrate support such that the beam illuminates the selected portion and the optical path length for the beam is substantially the same for all portions of the substrate. 2. The apparatus of claim 1, wherein each rotational actuator rotates about an axis perpendicular to the first direction. 3. The apparatus of claim 2, wherein the second mirror also moves along a second direction perpendicular to the first direction, wherein each rotational actuator rotates about an axis perpendicular to the first direction and the second direction. 4. The apparatus of claim 3, wherein the radiation source comprises an actuated aperture coupled to the controller, and the controller is further adapted to position the aperture based on the position of the beam on the substrate. 5. The apparatus of claim 4, further comprising a beam position detector that sends a beam position signal to the controller. 6. The apparatus of claim 5, wherein the beam position detector comprises a camera. 7. The apparatus of claim 4, wherein the beam has a non-uniform cross-sectional shape, and the actuator of the final optical element of the light source rotates the aperture to orient the beam. 8. The apparatus of claim 6, wherein the camera detects an intensity profile of the beam, the final optical element comprises a variable focus lens, and the controller is further adapted to adjust the variable focus lens based on the intensity profile of the beam. 9. A method of targeting a beam of laser radiation at a target location on a surface, the method comprising: staging the target location by rotating the surface to an accessible orientation;locating a beam capture mirror over the target location;determining a reflection point of a beam steering mirror such that an optical path length of the beam reflecting from the beam steering mirror and the beam capture mirror to the target location is substantially equal to a target optical path length;moving the beam steering mirror in a first direction to the reflection point;rotating the beam steering mirror to direct the beam to the beam capture mirror;rotating the beam capture mirror to direct the beam to the target location; andmoving the beam capture mirror as necessary in a second direction that is perpendicular to the first direction and a third direction that is parallel to the first direction. 10. The method of claim 9, further comprising detecting the accuracy of the beam targeting and improving the beam targeting by adjusting a beam origin point. 11. The method of claim 9, wherein staging the target location, locating the beam capture mirror over the target location, moving the beam steering mirror, and rotating the beam steering and beam capture mirrors is performed concurrently. 12. The method of claim 9, further comprising detecting the focus of the beam and improving the beam focus by adjusting a variable focus lens. 13. The method of claim 9, further comprising adjusting a beam orientation by rotating an aperture at a beam origin point.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (25)
Tsukihara,Koichi; Tatsuki,Koichi, Beam irradiator and laser anneal device.
Stephenson Gerald H. (Swindon-Wiltshire IN GB2) Morgan Russell M. (Indianapolis IN), Device for producing a constant length laser beam and method for producing it.
Tanaka, Koichiro; Yamamoto, Yoshiaki, Laser irradiation method and method for manufacturing semiconductor device including an autofocusing mechanism using the same.
Beaman Joseph J. (Austin TX) McGrath Joseph C. (Calistoga CA) Prioleau Frost R. R. (Piedmont CA), Thermal control of selective laser sintering via control of the laser scan.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.