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A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a m

A system for loading workpieces into a process chamber for processing in a matrix configuration includes a conveyor configured to transport multiple workpieces in a linear fashion. A workpiece hotel is configured to receive the multiple workpieces from the conveyor. The workpiece hotel comprises a matrix of cells arranged in N columns and M floors. A pick blade is configured to insert into the hotel and retract from the hotel in order to unload a plurality of substrates from a first floor into a single row of the pick blade, and to repeat the unloading operation to form a matrix comprising a plurality of rows of substrates disposed on the pick blade. In one example, the workpiece hotel has a staggered configuration that provides individual accessibility of each hotel cell.

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1. A method of selectively placing a substrate on a substrate holder, comprising; arranging a plurality of substrates having a substrate thickness in each of a plurality of columns of a lift system, wherein a first vertical position of a first substrate in a first cell of the lift system differs fro

1. A method of selectively placing a substrate on a substrate holder, comprising; arranging a plurality of substrates having a substrate thickness in each of a plurality of columns of a lift system, wherein a first vertical position of a first substrate in a first cell of the lift system differs from a second vertical position of a second substrate in an adjacent cell;positioning, at a third vertical position different from the first and second vertical positions, a pick blade that contains a set of substrates distributed in a two dimensional substrate matrix on the pick blade, wherein the two dimensional substrate matrix on the pick blade comprises the substrates in at least two columns and at least two rows;arranging an empty substrate position of the two dimensional substrate matrix at a first horizontal position defined by the first cell of the lift system;inserting the pick blade into the lift system at the third vertical position;lowering the lift system, wherein the first substrate in the first cell comes to rest upon the pick blade in the empty substrate position; andwithdrawing the pick blade containing the first substrate from the lift system. 2. The method of claim 1, wherein the pick blade is configured to transfer the substrates for loading into a two dimensional matrix on a substrate platen of an ion implantation system. 3. A system for transferring workpieces into a process chamber comprising: a workpiece hotel defined by a matrix of cells having a cell height and arranged in N columns and M floors, each of the cells configured to receive a workpiece, the workpiece hotel having a staggered structure in which a vertical level of each of the cells differs from a vertical level of a nearest cell in an adjacent column; anda pick blade comprising a plurality of arms that is configured to insert into the workpiece hotel and retract from the workpiece hotel, wherein the pick blade is operable to unload a plurality of the workpieces from a first of the M floors onto the plurality of arms of the pick blade, and to repeat the unloading operation to form a workpiece matrix comprising a plurality of rows of the workpieces disposed on the plurality of arms of the pick blade. 4. The system of claim 3, wherein a sum of staggers between each set of adjacent cells across the M floors is less than the cell height, such that a plurality of the workpieces can be individually loaded from a conveyor into each of the cells of one of the floors of the workpiece hotel by lowering the workpiece hotel with respect to the conveyor. 5. The system of claim 3, wherein the vertical level of the nearest cell in the adjacent column differs by an amount greater than a sum of a thickness of the workpiece and pick blade thickness, wherein the pick blade can load one of the workpieces from the workpiece hotel onto any position of the pick blade matrix. 6. The system of claim 3, wherein the workpiece matrix comprises at least two columns. 7. The system of claim 3, wherein the N columns comprise at least two columns. 8. A method of selectively placing a substrate on a substrate holder, comprising: arranging a plurality of substrates having a substrate thickness in each of a plurality of columns of a lift system, wherein a first vertical position of a first substrate in a first cell of the lift system differs from a second vertical position of a second substrate in an adjacent cell;positioning, at a third vertical position different from the first and second vertical positions, a pick blade configured to hold a set of substrates distributed in a two dimensional substrate matrix on the pick blade in a first row and a second row;inserting the pick blade into the lift system at the third vertical position;changing a vertical position of the lift system, wherein a first plurality of the substrates become disposed on the pick blade in the first row;moving the pick blade such that the pick blade is still disposed under the lift system; andchanging a vertical position of the lift system, wherein a second plurality of the substrates become disposed on the pick blade in the second row adjacent to the first row. 9. The method of claim 8, wherein the two dimensional substrate matrix on the pick blade comprises at least two columns. 10. The method of claim 8, wherein the two dimensional substrate matrix on the pick blade comprises a number of columns equal to a number of the plurality of columns of the lift system. 11. The method of claim 8, wherein each of the substrates in one of the first row or the second row becomes disposed on the pick blade sequentially.