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Method and apparatus for modifying the sensitivity of an electrical generator to a nonlinear load 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • H02P-009/00
출원번호 US-0214165 (2011-08-20)
등록번호 US-8716984 (2014-05-06)
발명자 / 주소
  • Mueller, Michael
  • Westra, Michael Lynn
  • Richardson, Jeremy
  • Van Zyl, Gideon
출원인 / 주소
  • Advanced Energy Industries, Inc.
대리인 / 주소
    Neugeboren O'Dowd PC
인용정보 피인용 횟수 : 17  인용 특허 : 42

초록

A method and generator for modifying interactions between a load and the generator are described. The method includes applying output power to the load using a power amplifier, controlling a level of the output power responsive to a power control setting, and adjusting a conduction angle of the powe

대표청구항

1. A generator comprising: a power amplifier configured to apply output power to a load responsive to a power control signal and a reference signal;a power control system coupled to the power amplifier, the power control system adjusts the power control signal based upon a power set point and the ou

이 특허에 인용된 특허 (42)

  1. Hamill Robert L. (Greenwood IN) Kastner Ralph E. (Indianapolis IN), A47934 Antibiotic and process for production thereof.
  2. Peter, David Allan, Alternating current generator field regulation control.
  3. Nakagawa Hideo,JPX ; Hayashi Shigenori,JPX ; Nakayama Ichiro,JPX ; Okumura Tomohiro,JPX, Apparatus and method for applying RF power apparatus and method for generating plasma and apparatus and method for processing with plasma.
  4. Ken Tokashiki JP, Apparatus for fabricating a semiconductor device and method of doing the same.
  5. Konishi Hiroo,JPX ; Amano Masahiko,JPX ; Watanabe Masahiro,JPX ; Nishimura Masashi,JPX, Apparatus for monitoring and stabilizing power swing in a power system by utilizing a power electronics technique.
  6. Brenner Kenneth I. (Rockford IL) Wollschlager Joseph F. (Rockford IL), Arrangement for slipper cavitation erosion control and impact reduction.
  7. Dumenil Claude G. (6 ; rue Lenepveu 76000 - Rouen FRX) Dumenil Louis P. (3550 Route de Neufchatel 76230 - Bois-Guillaume FRX), Automatically actuated seal for sealing buildings, particularly doors and windows.
  8. Donohoe Kevin G. ; Hagedorn Marvin F., Beat frequency modulation for plasma generation.
  9. Ash Stephen R. (LaFayette IN), Calorie counting method and apparatus.
  10. Tony P. Chiang ; Karl F. Leeser, Continuous method for depositing a film by modulated ion-induced atomic layer deposition (MII-ALD).
  11. Lippitt David L. (Scotia NY) Walker Loren H. (Salem VA), Control for a force commutated current source var generator.
  12. Ilic Marija D. (Sudbury MA) Chapman Jeffrey W. (Cambridge MA), Decentralized excitation control for an electrical power utility system.
  13. Labriola ; II Donald P., Digital motor driver circuit and method.
  14. Ward Paul (Waltham MA), Electronics for Coriolis force and other sensors.
  15. Ise Hirotoshi,JPX ; Ikushima Takayuki,JPX ; Hanazaki Minoru,JPX ; Nishizaki Nobuhiro,JPX, Etching apparatus, etching method, manufacturing method of a semiconductor device, and semiconductor device.
  16. Williamson ; IV Warren P. ; Yates David C., Impedance feedback monitor with query electrode for electrosurgical instrument.
  17. Ogawa Kazufumi (Hirakata JPX), Light exposure apparatus.
  18. Reyzelman, Leonid E.; Sortor, John E., Method and apparatus for VHF plasma processing with load mismatch reliability and stability.
  19. Hopkins Janet,GBX ; Johnston Ian Ronald,GBX ; Bhardwaj Jyoti Kiron,GBX ; Ashraf Huma,GBX ; Hynes Alan Michael,GBX ; Lea Leslie Michael,GBX, Method and apparatus for etching a substrate.
  20. van Zyl, Gideon, Method and apparatus for modifying interactions between an electrical generator and a nonlinear load.
  21. van Zyl, Gideon, Method and apparatus for modifying interactions between an electrical generator and a nonlinear load.
  22. Porter Robert M. ; Mueller Michael L., Method and apparatus for stabilizing switch-mode powered RF plasma processing.
  23. Jung-hyung Kim KR, Method for enhancing etch selectivity of metal silicide film to polysilicon film, and method for etching stacked film of metal silicide film and polysilicon film.
  24. Tomita Takashi,JPX ; Nomoto Katsuhiko,JPX ; Yamamoto Yoshihiro,JPX ; Sannomiya Hitoshi,JPX ; Takagi Sae,JPX, Method for forming a thin semiconductor film and a plasma CVD apparatus to be used in the method.
  25. Ohtake Hiroto,JPX ; Samukawa Seiji,JPX, Method for plasma treatment and apparatus for plasma treatment.
  26. Donohoe Kevin G. ; Sandhu Gurtej S., Method for pulsed-plasma enhanced vapor deposition.
  27. Lamont Peter (Midland MI), Method of reducing activity of silicone polymers.
  28. O-Sung Kwon KR; Chang-Ju Choi KR, Methods for fabricating ferroelectric memory devices using pulsed-power plasma.
  29. Wilson John W. (Springs ZAX) Roffe Arthur E. (Springs ZAX) O\Beirne Derek (Edenvale ZAX) Koovarjee Ratikant (Benoni ZAX) Pleaner Ivan M. (Springs ZAX) Bhme Rolf C. (Midrand ZAX), Mining method with no delay between shot initiator and firing.
  30. Turner Terry R. (Austin TX) Spain James D. (Georgetown TX) Swyers John R. (Austin TX), Plasma monitoring and control method and system.
  31. Koshimizu Chishio,JPX, Plasma processing apparatus.
  32. Samukawa Seiji,JPX, Plasma processing method and equipment used therefor.
  33. Hideo Kitagawa JP, Process for producing semiconductor device.
  34. Daniel J. Vona, Jr. ; Aaron T. Radomski ; Kevin P. Nasman ; William R. Pulhamus, Jr., Pulsing intelligent RF modulation controller.
  35. Gleason Karen K. ; Kwan Michael C., Pyrolytic chemical vapor deposition of silicone films.
  36. Chi Kyeong-koo,KRX, Radio frequency generating systems and methods for forming pulse plasma using gradually pulsed time-modulated radio freq.
  37. Bertini Milo (679 Garden St. Trumbull CT 06611), Saw blade construction and method of making same.
  38. Rudel Myron G. (284 Hoover Ave. Benton Harbor MI 49022), Seat for a motorcycle.
  39. Porter Robert M. ; Mueller Michael L., Stabilizer for switch-mode powered RF plasma.
  40. Larry M. Tichauer, System and method for closed loop VSWR correction and tuning in RF power amplifiers.
  41. de Mello F. Paul (Burnt Hills NY) Hannett Louis N. (Hudson NY) Parkinson David W. (Burnt Hills NY) Czuba John S. (New York NY), System for stabilizing synchronous machines.
  42. Marwan H. Khater ; Lawrence J. Overzet, Transmission line based inductively coupled plasma source with stable impedance.

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  5. Bhutta, Imran Ahmed, RF impedance matching network.
  6. Bhutta, Imran Ahmed, RF impedance matching network.
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  10. Mavretic, Anton, RF impedance matching network.
  11. Repasky, Michael; Saari, Russell; Schneider, Glen; Castaldo, Gary; Caldwell, Jennifer, Single point engine control interface.
  12. Mavretic, Anton, Switching circuit.
  13. Mavretic, Anton, Switching circuit.
  14. Mavretic, Anton, Switching circuit for RF currents.
  15. Van Zyl, Gideon, System and method for control of high efficiency generator source impedance.
  16. Van Zyl, Gideon, System and method for control of high efficiency generator source impedance.
  17. Mueller, Michael; Westra, Michael Lynn; Richardson, Jeremy; Van Zyl, Gideon, Variable-class amplifier, system, and method.
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