초록 ▼

Treatment fluids may be used to retard the deposition of silica scale in subterranean formations. Methods for treating a subterranean formation can comprise providing a treatment fluid having a pH of 6 or less that comprises an acidic base fluid and a non-polymeric silica scale control additive, and

Treatment fluids may be used to retard the deposition of silica scale in subterranean formations. Methods for treating a subterranean formation can comprise providing a treatment fluid having a pH of 6 or less that comprises an acidic base fluid and a non-polymeric silica scale control additive, and introducing the treatment fluid into at least a portion of a subterranean formation. The non-polymeric silica scale control additive retards deposition of silica scale in the subterranean formation.

대표청구항 ▼

1. A method comprising: providing a treatment fluid having a pH between about 0 and 3 that comprises an acidic base fluid and a non-polymeric silica scale control additive, the non-polymeric silica scale control additive comprising an ortho-dihydroxybenzene compound or a derivative thereof;introduci

1. A method comprising: providing a treatment fluid having a pH between about 0 and 3 that comprises an acidic base fluid and a non-polymeric silica scale control additive, the non-polymeric silica scale control additive comprising an ortho-dihydroxybenzene compound or a derivative thereof;introducing the treatment fluid into at least a portion of a subterranean formation; andassociating silicon in a non-complexed form in the subterranean formation with the non-polymeric silica scale control additive; wherein the non-polymeric silica scale control additive retards deposition of silica scale in the subterranean formation as the pH rises. 2. The method of claim 1, further comprising: after introducing the treatment fluid, allowing the treatment fluid to reside in the subterranean formation for a period of time; andremoving the treatment fluid from the subterranean formation. 3. The method of claim 2, wherein an amount of dissolved silicon in the treatment fluid is greater than about 500 ppm while in the subterranean formation. 4. The method of claim 1, wherein the ortho-dihydroxybenzene compound is water soluble. 5. The method of claim 4, wherein the ortho-dihydroxybenzene compound has a molecular weight of less than about 3000. 6. The method of claim 1, wherein the ortho-dihydroxybenzene compound comprises at least one compound selected from the group consisting of a flavanoid, a flavanol, a flavonol, a flavonodid, a catechin, a tannin, an anthocyanidin, an isoflavanoid, derivatives thereof, and combinations thereof. 7. The method of claim 6, wherein the tannin comprises tannic acid. 8. The method of claim 1, wherein the subterranean formation is a sandstone formation. 9. The method of claim 1, wherein the treatment fluid further comprises a chelating agent. 10. The method of claim 9, further comprising: complexing at least a portion of any metal ions present in the subterranean formation with the chelating agent. 11. A method comprising: providing a treatment fluid having a pH between about 0 and 3 that comprises an acidic base fluid and a non-polymeric silica scale control additive; wherein the non-polymeric silica scale control additive comprises a tannin;introducing the treatment fluid into at least a portion of a subterranean formation; andassociating silicon in a non-complexed form in the subterranean formation with the non-polymeric silica scale control additive; wherein the non-polymeric silica scale control additive retards deposition of silica scale in the subterranean formation as the pH rises. 12. The method of claim 11, wherein the tannin has a molecular weight of less than about 3000. 13. The method of claim 12, wherein the tannin comprises tannic acid. 14. The method of claim 11, further comprising: after introducing the treatment fluid, allowing the treatment fluid to reside in the subterranean formation for a period of time; andremoving the treatment fluid from the subterranean formation. 15. The method of claim 14, wherein an amount of dissolved silicon in the treatment fluid is greater than about 500 ppm while in the subterranean formation. 16. The method of claim 11, wherein the treatment fluid further comprises a chelating agent. 17. The method of claim 16, further comprising: complexing at least a portion of any metal ions present in the subterranean formation with the chelating agent. 18. The method of claim 11, wherein the subterranean formation is a sandstone formation. 19. A method for retarding deposition of silica scale in a subterranean formation, the method comprising: placing a treatment fluid that comprises an acidic base fluid and a non-polymeric silica scale control additive in the subterranean formation; wherein the treatment fluid has a pH between about 0 and 3; andwherein the non-polymeric silica scale control additive comprises tannic acid;associating silicon in a non-complexed form in the subterranean formation with the non-polymeric silica scale control additive; andraising the pH of the treatment fluid to between about 3 and about 5 while maintaining the silicon in a dissolved form. 20. A method comprising: providing a treatment fluid having a pH between about 0 and 3 that comprises an acidic base fluid and a non-polymeric silica scale control additive; wherein the non-polymeric silica scale control additive comprises an ortho-dihydroxybenzene compound;introducing the treatment fluid into at least a portion of a sandstone formation; andassociating silicon in a non-complexed form in the sandstone formation with the non-polymeric silica scale control additive; wherein the non-polymeric silica scale control additive retards deposition of silica scale in the sandstone formation as the pH rises.