Wafer backside structures having copper pillars
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
H01L-029/40
H01L-023/48
H01L-023/52
H01L-021/44
출원번호
US-0708287
(2010-02-18)
등록번호
US-8759949
(2014-06-24)
발명자
/ 주소
Yu, Chen-Hua
Huang, Hon-Lin
Hsu, Kuo-Ching
Chen, Chen-Shien
출원인 / 주소
Taiwan Semiconductor Manufacturing Company, Ltd.
대리인 / 주소
Slater and Matsil, L.L.P.
인용정보
피인용 횟수 :
2인용 특허 :
70
초록▼
An integrated circuit structure includes a semiconductor substrate having a front side and a backside, and a conductive via penetrating the semiconductor substrate. The conductive via includes a back end extending to the backside of the semiconductor substrate. A redistribution line (RDL) is on the
An integrated circuit structure includes a semiconductor substrate having a front side and a backside, and a conductive via penetrating the semiconductor substrate. The conductive via includes a back end extending to the backside of the semiconductor substrate. A redistribution line (RDL) is on the backside of the semiconductor substrate and electrically connected to the back end of the conductive via. A passivation layer is over the RDL, with an opening in the passivation layer, wherein a portion of the RDL is exposed through the opening. A copper pillar has a portion in the opening and electrically connected to the RDL.
대표청구항▼
1. An integrated circuit structure comprising: a semiconductor substrate comprising a front side and a backside;a transistor at the front side of the semiconductor substrate;a conductive via penetrating the semiconductor substrate, the conductive via comprising a back end extending to the backside o
1. An integrated circuit structure comprising: a semiconductor substrate comprising a front side and a backside;a transistor at the front side of the semiconductor substrate;a conductive via penetrating the semiconductor substrate, the conductive via comprising a back end extending to the backside of the semiconductor substrate;a redistribution line (RDL) on the backside of the semiconductor substrate and electrically connected to the back end of the conductive via, wherein the RDL is closer to the backside of the semiconductor substrate than to the front side of the semiconductor substrate;a passivation layer over the RDL, with an opening in the passivation layer, wherein a portion of the RDL is exposed through the opening;a copper pillar having a portion in the opening and electrically connected to the RDL; anda metal finish comprising a metal selected from the group consisting essentially of nickel, gold, palladium, and combinations thereof, wherein the metal finish comprises a top portion over the copper pillar and sidewall portions on sidewalls of the copper pillar. 2. The integrated circuit structure of claim 1, wherein the RDL comprises: an RDL strip comprising a portion directly over, and contacting, the conductive via; andan RDL pad having a greater width than the RDL strip, wherein the copper pillar comprises a bottom surface contacting a top surface of the RDL pad. 3. The integrated circuit structure of claim 1, wherein the copper pillar has a height greater than about 15 μm. 4. The integrated circuit structure of claim 1, wherein the copper pillar comprises a top surface higher than a top surface of the passivation layer. 5. The integrated circuit structure of claim 1, wherein the conductive via extends from the backside of the semiconductor substrate to the front side of the semiconductor substrate. 6. An integrated circuit structure comprising: a semiconductor substrate comprising a front side and a backside;a transistor at the front side of the semiconductor substrate;a conductive via extending from the backside of the semiconductor substrate into the semiconductor substrate, wherein a back end of the conductive via is exposed through the backside of the semiconductor substrate;a redistribution line (RDL) over the backside of the semiconductor substrate and connected to the back end of the conductive via, wherein the RDL is closer to the backside of the semiconductor substrate than to the front side of the semiconductor substrate, the RDL comprising: an RDL strip contacting the conductive via; andan RDL pad having a greater width than the RDL strip, wherein the RDL pad joins the RDL strip;a passivation layer over the RDL;an opening in the passivation layer, wherein a middle portion of the RDL pad is exposed through the opening, and wherein edge portions of the RDL pad are covered by the passivation layer;a copper pillar in the opening and contacting the middle portion of the RDL pad;a barrier layer over and contacting the copper pillar; anda solder layer directly over the barrier layer, wherein the solder layer and the barrier layer are limited to a region directly over the copper pillar. 7. The integrated circuit structure of claim 6, wherein the copper pillar has a thickness greater than about 15 μm. 8. A method of forming an integrated circuit structure, the method comprising: providing a semiconductor substrate comprising a front side and a backside;providing a conductive via penetrating the semiconductor substrate, the conductive via comprising a back end extending to the backside of the semiconductor substrate;forming a redistribution line (RDL) on the backside of the semiconductor substrate and connected to the back end of the conductive via;forming a passivation layer over the RDL;forming an opening in the passivation layer, with a portion of the RDL being exposed through the opening;forming a photo resist over the passivation layer, wherein the photo resist is filled into the opening;patterning the photo resist so that the opening in the passivation layer is exposed through the photo resist;after the step of patterning the photo resist, forming a copper pillar having a portion in the opening, wherein the copper pillar is electrically connected to, and over, the RDL, and wherein the step of forming the copper pillar comprises electro plating;after the step of forming the copper pillar, electro plating a barrier layer on the copper pillar;plating a solder layer on the barrier layer; andremoving the photo resist after the step of plating the solder layer. 9. The method of claim 8 further comprising: before the step of forming the copper pillar, forming a photo resist over the passivation layer, wherein the photo resist is filled into the opening;before the step of forming the copper pillar, patterning the photo resist so that the opening in the passivation layer is exposed through the photo resist:after the step of forming the copper pillar, removing the photo resist; andafter the step of removing the photo resist, forming a metal finish on a top surface and sidewalls of the copper pillar. 10. The method of claim 8, wherein the copper pillar has a height greater than about 15 μm. 11. The method of claim 8, wherein the RDL comprises copper.
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