Anionic micelles with cationic polymeric counterions methods thereof
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
A01N-041/04
A01P-001/00
출원번호
US-0663962
(2012-10-30)
등록번호
US-8765114
(2014-07-01)
발명자
/ 주소
Scheuing, David R.
Anderson, Travers
Smith, William L.
Szekeres, Erika
Zhang, Rui
출원인 / 주소
The Clorox Company
대리인 / 주소
Goel, Alok
인용정보
피인용 횟수 :
11인용 특허 :
46
초록▼
The invention relates to a polymer-micelle complex. The polymer-micelle complexes include a negatively charged micelle that is electrostatically bound to a water-soluble polymer bearing a positive charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-li
The invention relates to a polymer-micelle complex. The polymer-micelle complexes include a negatively charged micelle that is electrostatically bound to a water-soluble polymer bearing a positive charge. The polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer. The compositions do not form a coacervate, and do not form a film when applied to a surface.
대표청구항▼
1. A method for cleaning a surface, the method comprising: contacting said surface with a composition comprising a polymer-micelle complex comprising:a negatively charged micelle electrostatically bound to a water-soluble polymer bearing a positive charge; andwherein said polymer does not comprise b
1. A method for cleaning a surface, the method comprising: contacting said surface with a composition comprising a polymer-micelle complex comprising:a negatively charged micelle electrostatically bound to a water-soluble polymer bearing a positive charge; andwherein said polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer;wherein said composition does not form a coacervate;wherein said composition is not applied to organic contaminants in a subsurface location; andwherein said composition does not comprise a polyelectrolyte complex. 2. The method of claim 1, wherein the composition comprising a polymer-micelle complex is a concentrate, the method further comprising diluting the concentrate with water to form a dilute composition comprising the polymer-micelle complex, prior to contacting the surface with the dilute composition and wherein the diluted composition also does not form a coacervate. 3. The method of claim 1, wherein the composition further comprises an oxidant. 4. The method of claim 3, wherein the oxidant is selected from the group consisting of: a. hypohalous acid, hypohalite or sources thereof;b. hydrogen peroxide or sources thereof;c. peracids, peroxyacids, peroxoacids, or sources thereof;d. organic peroxides or hydroperoxides;e. peroxygenated inorganic compounds;f. solubilized chlorine, solubilized chlorine dioxide, a source of free chlorine, acidic sodium chlorite, an active chlorine generating compound, or a chlorine-dioxide generating compound;g. an active oxygen generating compound;h. solubilized ozone;i. N-halo compounds; andj. combinations thereof. 5. The method of claim 1, wherein the negatively charged micelle comprises an anionic surfactant selected from the group consisting of alkyl sulfates, alkyl sulfonates, alkyl ethoxysulfates, fatty acids, fatty acid salts, alkyl amino acid derivatives, glycolipid derivatives with anionic groups, rhamnolipid derivatives with anionic groups, sulfate derivates of alkyl ethoxylate propoxylates, alkyl ethoxylate sulfates, and combinations thereof. 6. The method of claim 1, wherein the negatively charged micelle further comprises a nonionic surfactant. 7. The method of claim 6, wherein the nonionic surfactant comprises an amine oxide. 8. The method of claim 1, wherein the composition further comprises a cationic surfactant. 9. The method of claim 8, wherein the cationic surfactant comprises a quaternary ammonium compound. 10. The method of claim 1, wherein the water-soluble polymer bearing a positive charge is made from a monomer selected from the group consisting of diallyl dimethyl ammonium chloride, quaternary ammonium salts of substituted acrylamide, methylacrylamide, acrylate and methacrylate, quaternized alkyl amino acrylate esters and amides, MAPTAC (methacrylamido propyl trimethyl ammonium chlorides), trimethyl ammonium methyl methacrylate, trimethyl ammonium propyl methacrylamide, 2-vinyl N-alkyl quaternary pyridinium salts, 4-vinyl N-alkyl quaternary pyridinium salts, 4-vinylbenzyltrialkylammonium salts, 2-vinyl piperidinium salts, 4-vinyl piperidinium salts, 3-alkyl 1-vinyl imidazolium salts, or ethyleneimine and mixtures thereof or is a water-soluble polymer selected from the group chitosan, chitosan derivatives bearing cationic groups, guar derivatives bearing cationic groups, or a polysaccharide bearing cationic groups, and combinations thereof. 11. The method of claim 1, further comprising a pH buffer. 12. The method of claim 11, wherein the pH buffer is selected from the group consisting of carbonates, phosphates, silicates, borates, and combinations thereof. 13. A method for treating a surface comprising: mixing a first composition comprising a water-soluble polymer bearing a positive charge wherein said polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer with a second composition comprising a negatively charged micelle to form a polymer-micelle complex in the resulting composition, wherein said resulting composition does not form a coacervate and wherein said resulting composition does not comprise a polyelectrolyte complex; andcontacting said resulting composition with a surface and wherein said resulting composition treats the surface. 14. The method of claim 13, wherein at least one of the first or second compositions further comprises an oxidant. 15. The method of claim 14, wherein the oxidant is selected from the group consisting of: a. hypohalous acid, hypohalite or sources thereof;b. hydrogen peroxide or sources thereof;c. peracids, peroxyacids, peroxoacids, or sources thereof;d. organic peroxides or hydroperoxides;e. peroxygenated inorganic compounds;f. solubilized chlorine, solubilized chlorine dioxide, a source of free chlorine, acidic sodium chlorite, an active chlorine generating compound, or a chlorine-dioxide generating compound;g. an active oxygen generating compound;h. solubilized ozone;i. N-halo compounds; andj. combinations thereof. 16. The method of claim 13, wherein the negatively charged micelle comprises an anionic surfactant selected from the group consisting of alkyl sulfates, alkyl sulfonates, alkyl ethoxysulfates, fatty acids, fatty acid salts, alkyl amino acid derivatives, glycolipid derivatives with anionic groups, rhamnolipids, rhamnolipid derivatives with anionic groups, sulfate derivates of alkyl ethoxylate propoxylates, alkyl ethoxylate sulfates, and combinations thereof. 17. The method of claim 13, wherein the water-soluble polymer bearing a positive charge is made from a monomer selected from the group consisting of diallyl dimethyl ammonium chloride, quaternary ammonium salts of substituted acrylamide, methylacrylamide, acrylate and methacrylate, quaternized alkyl amino acrylate esters and amides, MAPTAC (methacrylamido propyl trimethyl ammonium chlorides), trimethyl ammonium methyl methacrylate, trimethyl ammonium propyl methacrylamide, 2-vinyl N-alkyl quaternary pyridinium salts, 4-vinyl N-alkyl quaternary pyridinium salts, 4-vinylbenzyltrialkylammonium salts, 2-vinyl piperidinium salts, 4-vinyl piperidinium salts, 3-alkyl 1-vinyl imidazolium salts, or ethyleneimine and mixtures thereof or is a water-soluble polymer selected from the group chitosan, chitosan derivatives bearing cationic groups, guar derivatives bearing cationic groups, or a polysaccharide bearing cationic groups, and combinations thereof. 18. A method for cleaning a surface, the method comprising: contacting said surface with a composition comprising a polymer-micelle complex comprising:a negatively charged micelle electrostatically bound to a water-soluble polymer bearing a positive charge; andwherein said polymer does not comprise block copolymer, latex particles, polymer nanoparticles, cross-linked polymers, silicone copolymer, fluorosurfactant, or amphoteric copolymer;wherein said composition does not form a coacervate;wherein said composition is not applied to organic contaminants in a subsurface location;wherein said composition does not comprise alcohols or glycol ethers; andwherein said composition does not comprise a polyelectrolyte complex. 19. The method of claim 18, wherein the negatively charged micelle comprises an anionic surfactant selected from the group consisting of alkyl sulfates, alkyl sulfonates, alkyl ethoxysulfates, fatty acids, fatty acid salts, alkyl amino acid derivatives, glycolipid derivatives with anionic groups, rhamnolipids, rhamnolipid derivatives with anionic groups, sulfate derivates of alkyl ethoxylate propoxylates, alkyl ethoxylate sulfates, and combinations thereof. 20. The method of claim 18, wherein the water-soluble polymer bearing a positive charge is made from a monomer selected from the group consisting of diallyl dimethyl ammonium chloride, quaternary ammonium salts of substituted acrylamide, methylacrylamide, acrylate and methacrylate, quaternized alkyl amino acrylate esters and amides, MAPTAC (methacrylamido propyl trimethyl ammonium chlorides), trimethyl ammonium methyl methacrylate, trimethyl ammonium propyl methacrylamide, 2-vinyl N-alkyl quaternary pyridinium salts, 4-vinyl N-alkyl quaternary pyridinium salts, 4-vinylbenzyltrialkylammonium salts, 2-vinyl piperidinium salts, 4-vinyl piperidinium salts, 3-alkyl 1-vinyl imidazolium salts, or ethyleneimine and mixtures thereof or is a water-soluble polymer selected from the group chitosan, chitosan derivatives bearing cationic groups, guar derivatives bearing cationic groups, or a polysaccharide bearing cationic groups, and combinations thereof.
연구과제 타임라인
LOADING...
LOADING...
LOADING...
LOADING...
LOADING...
이 특허에 인용된 특허 (46)
Boli Zhou ; Maria G. Ochomogo ; Elias A. Shaheen ; Jessica Y. Chung, Aerosol antimicrobial compositions.
Siddiqui Adnan ; Schultz Alfred K., Antimicrobial polymer latexes derived from unsaturated quaternary ammonium compounds and antimicrobial coatings, sealants, adhesives and elastomers produced from such latexes.
Trinh,Toan; Barnabas,Mary Vijayarani; Smith,John William; Tordil,Helen Bernado, Fabric color care method for rejuvenating and/or restoring color to a faded fabric.
Severns John Cort ; Sivik Mark Robert ; Costa Jill Bonham ; Hartman Frederick Anthony ; Morelli Joseph Paul, Fragrance delivery system for liquid detergent compositions.
Sherry, Alan Edward; Policicchio, Nicola John; Cella, Cynthia Elaine; Flora, Jeffrey Lawrence; Trinh, Toan; Morelli, Joseph Paul, HARD SURFACE CLEANING COMPOSITIONS, PREMOISTENED WIPES, METHODS OF USE, AND ARTICLES COMPRISING SAID COMPOSITIONS OR WIPES AND INSTRUCTIONS FOR USE RESULTING IN EASIER CLEANING AND MAINTENANCE, IMPRO.
Boothe Jerry E. (Coraopolis PA) Morse Lewis D. (Pittsburgh PA) Klein William L. (Nutley NJ), Hair products containing dimethyl diallyl ammonium chloride/acrylic acid-type polymers.
Choy Clement K. ; Reboa Paul F., Hexadecyl amine oxide/counterion composition and method for developing extensional viscosity in cleaning compositions.
Bavouzet, Bruno; Beyermann, Jochen; Herve, Pascal, Particles having an organized internal structure which are dispersed in an aqueous phase, the preparation thereof and use of same.
Boothe Jerry E. (Coraopolis PA) Morse Lewis D. (Pittsburgh PA) Klein William L. (Nutley NJ), Personal skin care products containing dimethyl diallyl ammonium chloride/acrylic acid-type polymers.
Canter Nathan H. (Edison NJ) Robbins Max L. (South Orange NJ) Baker Edward G. (Berkeley Heights NJ), Polymer-microemulsion complexes for the enhanced recovery of oil.
Scheuing, David R.; Smith, William L.; Kinsinger, Michael; Heymann, Jared, Treatment compositions containing water-soluble polyelectrolyte complex which are self-limiting.
※ AI-Helper는 부적절한 답변을 할 수 있습니다.