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A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater. The substrate coating device (10) includes at least a slider driving motor (4), a pump

A substrate coating device is provided which is capable of reducing non-uniform film thickness areas that take place in a coating start portion and a coating end portion during coating using a slit nozzle coater. The substrate coating device (10) includes at least a slider driving motor (4), a pump (8), a delivery state quantity measuring section (82), and a control section (5). The slider driving motor (4) scans a slit nozzle (1) over a substrate (100) at an established velocity relative to the substrate (100). The pump (8) controls the supply of the coating liquid to the slit nozzle (1). The delivery state quantity measuring section (82) is configured to measure a state quantity indicative of a delivery state of the coating liquid from the tip of the slit nozzle (1). The control section (5) corrects control information to be fed to the slider driving motor (4) in such a manner as to cancel out a difference between control information fed to the pump (8) and measurement information fed from the delivery state quantity measuring section (82) based on difference information indicative of the difference.

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1. A substrate coating device for forming a coating film of a fixed length on a surface of a plate-shaped substrate by scanning a slit nozzle over the substrate in one direction relative to the substrate while delivering a coating liquid from the slit nozzle, the substrate coating device comprising:

1. A substrate coating device for forming a coating film of a fixed length on a surface of a plate-shaped substrate by scanning a slit nozzle over the substrate in one direction relative to the substrate while delivering a coating liquid from the slit nozzle, the substrate coating device comprising: a slider for supporting the substrate and configured to be driven by a slider shaft actuated according to a generated command trajectory for driving the slider including an accelerating interval (Ta′), a constant moving velocity interval (Tc), and a decelerating interval (Td′) of the slider and scan the slit nozzle relative to the substrate;a pump configured to be driven by a pump shaft actuated according to a command trajectory of coating operating conditions including an accelerating interval (Ta), a constant delivery interval (Tp), and a decelerating interval (Td) of said pump shaft and the pump supplies the coating liquid to the slit nozzle;a delivery state quantity measuring section configured to measure a state quantity indicative of a delivery state of the coating liquid from a tip of the slit nozzle; anda control section configured to control the slider and the pump by generating the command trajectories of the slider shaft and the pump shaft, wherein the generated command trajectory of the slider shaft based on measurement information received from the delivery state quantity measuring section when the pump is driven according to the command trajectory of the pump shaft. 2. The substrate coating device according to claim 1, wherein the delivery state quantity measuring section includes at least one of a pressure gauge which is configured to measure a delivery pressure of the coating liquid and a flowmeter which is configured to measure a delivery flow rate of the coating liquid. 3. The substrate coating device according to claim 2, further comprising a pressure reducing section configured to alter a coating bead shape by reducing a pressure between the slit nozzle and the substrate, wherein the control section controls an operation of the pressure reducing section based on generated command trajectory of the slider shaft. 4. The substrate coating device according to claim 3, wherein the control section actuates the pressure reducing section when wherein the control section actuates the pressure reducing section when a velocity Vs of the slider shaft based on the generated command trajectory becomes equal to or higher than a limit velocity Vm given by the following expression: Vm=σμ⁢(2⁢h1.34⁢(H-h))32wherein σ represents a surface tension, μ represents a coating liquid viscosity, h represents a target wet film thickness, and H represents a spacing between the slit nozzle and the substrate. 5. The substrate coating device according to claim 1, wherein the control section determines the constant delivery interval (Tp) in the command trajectory for the pump shaft so that the constant delivery interval (Tp) synchronizes with the generated command trajectory for the slider shaft.