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Methods and systems for controlling a semiconductor fabrication process 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G06G-007/62
  • G05B-099/00
출원번호 US-0877180 (2007-10-23)
등록번호 US-8775148 (2014-07-08)
발명자 / 주소
  • Pannese, Patrick D.
  • Kavathekar, Vinaya
  • van der Meulen, Peter
출원인 / 주소
  • Brooks Automation, Inc.
대리인 / 주소
    Perman & Green, LLP
인용정보 피인용 횟수 : 1  인용 특허 : 95

초록

Software for controlling processes in a heterogeneous semiconductor manufacturing environment may include a wafer-centric database, a real-time scheduler using a neural network, and a graphical user interface displaying simulated operation of the system. These features may be employed alone or in co

대표청구항

1. A system comprising: a plurality of sensors for sensing aspects of a semiconductor manufacturing system;a neural network enabled controller for controlling the operation of semiconductor manufacturing system components to schedule processing of one or more semiconductor workpieces, the neural net

이 특허에 인용된 특허 (95)

  1. Werbos, Paul J., 3-brain architecture for an intelligent decision and control system.
  2. Frye Robert C. (Piscataway NJ) Harry Thomas R. (Trenton NJ) Lory Earl R. (Pennington NJ) Rietman Edward A. (Madison NJ), Active neural network control of wafer attributes in a plasma etch process.
  3. Ibbotson Dale Edward (Bridgewater NJ) Lee Tseng-Chung (New York NY) Maynard Helen Louise (Summit NJ) Rietman Edward Alois (Madison NJ), Active neural network determination of endpoint in a plasma etch process.
  4. Boiquaye William J. N-O., Adaptive control process and system.
  5. Bigus Joseph P. (Rochester MN), Adaptive job scheduling using neural network priority functions.
  6. Klimasauskas Casimir C., Analyzer for modeling and optimizing maintenance operations.
  7. Klimasauskas Casimir C., Analyzer for modeling and optimizing maintenance operations.
  8. Yemini Yechiam (Briarcliff Manor NY) Yemini Shaula (Briarcliff Manor NY) Kliger Shmuel (Ossining NY), Apparatus and method for event correlation and problem reporting.
  9. Li,Xiaochun; Yang,Yong; Choi,Hongseok, Apparatus and method of dispensing small-scale powders.
  10. Thu Van Nguyen, Apparatus for automatically performing cleaning processes in a semiconductor wafer processing system.
  11. Rosenthal Peter A. ; Solomon Peter R. ; Bonanno Anthony S. ; Eikleberry William J., Cell control method and apparatus.
  12. Francone Frank D. ; Nordin Peter,SEX ; Banzhaf Wolfgang,DEX, Computer implemented machine learning and control system.
  13. Hsiung, Chang-Meng B.; Munoz, Bethsabeth; Roy, Ajoy Kumar; Steinthal, Michael Gregory; Sunshine, Steven A.; Vicic, Michael Allen; Zhang, Shou-Hua, Control for an industrial process using one or more multidimensional variables.
  14. Houge, Erik Cho; McIntosh, John Martin; Rietman, Edward Alios, Control of semiconductor processing.
  15. Southworth Peter R. (Mission Viejo CA) Baxter Gregory R. (Orange CA), Conveyor system.
  16. Giles C. Lee ; Omlin Christian Walter ; Thornber Karvel Kuhn, Deterministic encoding of fuzzy finite state automata in continuous recurrent neural networks.
  17. Planche Jean P. (Les Clayes sous Bois FRX), Device for simulating an instantaneous temperature-rise of a semiconductor component in order to protect same.
  18. Brown William ; Welch Michael, Dual independent robot blades with minimal offset.
  19. Chua, Tay Jin; Yin, Xiaofeng; Zhu, Juping; Cai, Tianxiang, Finite capacity scheduling using job prioritization and machine selection.
  20. Coelho Robert A. ; Bertone James, Graphic user interface for managing a server system.
  21. Abdel-Malek Karim (Collegeville PA), Graphical interface for robot.
  22. Logsdon, George; Elmore, Gary; Mangram-Dupree, Loretta, Graphical user interface for allocating multi-function resources in semiconductor wafer fabrication and method of operation.
  23. Robert A. Beatty, Graphical user interface shop floor control system.
  24. Bonne, Ulrich; Nickels, Robert, Health monitor.
  25. Scott Richard G. (Austin TX) Shackleton Craig R. (Austin TX) Ellis Raymond W. (Austin TX), Integrated building and conveying structure for manufacturing under ultraclean conditions.
  26. Wojsznis,Wilhelm; Blevins,Terry; Nixon,Mark, Integrated model predictive control and optimization within a process control system.
  27. Danna,Mark; Hine,Roger G.; Bonom,Anthony C., Integrated system for tool front-end workpiece handling.
  28. Reiss,Terry P.; Shanmugasundram,Arulkumar P.; Schwarm,Alexander T., Integration of fault detection with run-to-run control.
  29. Hosek, Martin; Krishnasamy, Jay; Prochazka, Jan, Intelligent condition-monitoring and fault diagnostic system for predictive maintenance.
  30. Goldman, Arnold J.; Fisher, Joseph; Hartman, Jehuda; Sarel, Shlomo, Knowledge-engineering protocol-suite.
  31. Hofmeister, Christopher; Caveney, Robert T., Linear substrate transport apparatus.
  32. Kevin Fairbairn ; Howard E. Grunes ; Christopher Lane ; Kelly A. Colborne, Load-lock with external staging area.
  33. Robert C. Pratt, Mapping binary objects in extended relational database management systems with relational registry.
  34. Keeler James David ; Hartman Eric Jon, Method and apparatus for analyzing a neural network within desired operating parameter constraints.
  35. Gary L. Viviani ; Nick A. Parisi ; William G. Callahan, Method and apparatus for controlling a system using hierarchical state machines.
  36. Buchsbaum Adam Louis ; Giancarlo Raffaele,ITX ; Westbrook Jeffery Rex, Method and apparatus for generating deterministic approximate weighted finite-state automata.
  37. Ushiku,Yukihiro; Nakamura,Mitsutoshi, Method and apparatus for manufacturing semiconductor device, method and apparatus for controlling the same, and method and apparatus for simulating manufacturing process of semiconductor device.
  38. Zenhausern, Frederic, Method and apparatus for monitoring materials used in electronics.
  39. Reitman Edward A. (Madison NJ) Ibbotson Dale E. (Bridgewater NJ) Lee Tseng-Chung (New York NY), Method and apparatus for real time monitoring of wafer attributes in a plasma etch process.
  40. Pasadyn, Alexander J., Method and apparatus for scheduling based on state estimation uncertainties.
  41. Nguyen Thu ; Lavi Michal, Method and apparatus for sequencing wafers in a multiple chamber, semiconductor wafer processing system.
  42. Jerome R. Lovelace, Method and apparatus for yield and failure analysis in the manufacturing of semiconductors.
  43. Patel, Nital S.; Jenkins, Steven T., Method and system for dispatching semiconductor lots to manufacturing equipment for fabrication.
  44. Tanzer,Troy Anthony; Weaver,Elizabeth, Method and system for scheduling maintenance procedures based upon workload distribution.
  45. Philippe Coronel FR; Jean Canteloup FR; Renzo Maccagnan FR; Jean-Phillippe Vassilakis FR, Method and system for semiconductor wafer fabrication process real-time in-situ interactive supervision.
  46. Cheng,Chang Yung; Fu,Hsueh Shih; Wang,Ying Lang; Cheng,Fan Tien, Method and system for virtual metrology in semiconductor manufacturing.
  47. Goerigk Peter,DEX, Method and system of managing wafers in a semiconductor device production facility.
  48. Perry,Jeffrey Robert; Garrison,Martin; Nguyen,Khang; Levin,Richard; Garrett,Wanda Carol; Gibson,Phillip; Lee,Benjamin H., Method for creating, modifying, and simulating electrical circuits over the internet.
  49. Izawa, Masaru; Mori, Masahito; Negishi, Nobuyuki; Tachi, Shinichi, Method of manufacturing a semiconductor device and manufacturing system.
  50. van der Meulen,Peter, Mid-entry load lock for semiconductor handling system.
  51. Stoddard Kevin ; Hugues Jean Benoit ; Tsakalis Konstantinos, Model based temperature controller for semiconductor thermal processors.
  52. White John M. ; Conner Robert B. ; Law Kam S. ; Turner Norman L. ; Lee William T. ; Kurita Shinichi, Modular substrate processing system.
  53. Hsiung,Chang Meng B.; Munoz,Bethsabeth; Roy,Ajoy Kumar; Steinthal,Michael Gregory; Sunshine,Steven A.; Vicic,Michael Allen; Zhang,Shou Hua, Monitoring system for an industrial process using one or more multidimensional variables.
  54. Kim, Ki-sang; Jeoung, Gyu-chan; Kwag, Gyu-hwan, Multi-chamber system having compact installation set-up for an etching facility for semiconductor device manufacturing.
  55. Khaw Fook C. (Singapore SGX), Neural network system and method for factory floor scheduling.
  56. Steimle Andre,FRX ; Tannhof Pascal,FRX ; Paillet Guy,FRX, Neural semiconductor chip and neural networks incorporated therein.
  57. Bozich Daniel J. (San Diego CA) MacKay H. Bruce (San Diego CA) Eggert Jay A. (San Diego CA) Muenchau Ernest E. (Vista CA), Neurocontrolled adaptive process control system.
  58. Bozich Daniel J. (San Diego CA) MacKay H. Bruce (San Diego CA) Eggert Jay A. (San Diego CA) Muenchau Ernest E. (Vista CA), Neurocontrolled adaptive process control system.
  59. Oh,Hin; Sato,Hideaki; Takayama,Naoki; Sakai,Hisanori; Mimura,Yuichi, Plasma processing method and plasma processing apparatus.
  60. Stephen H. Brown ; Tarun K. Chaudhuri ; Jose G. Santiesteban, Process for BTX purification.
  61. Blalock Guy (Boise ID) Becker David S. (Boise ID) Roe Fred (Boise ID), Process for selectively etching a layer of silicon dioxide on an underlying stop layer of silicon nitride.
  62. Iriuchijima Ken,JPX ; Fujihara Mutsumi,JPX ; Sakamoto Hideo,JPX, Production control apparatus and a production control method.
  63. Donald, James J.; Raaijmakers, Ivo, Pyrometer calibrated wafer temperature estimator.
  64. Manoj Betawar ; Vrunda Bhagwat ; Dinesh Goradia ; Manish Mehta ; Nitin Parekh, Recipe editor for editing and creating process recipes with parameter-level semiconductor-manufacturing equipment.
  65. Khan Emdadur R. (San Jose CA) Unal Faith A. (Sunnyvale CA), Recurrent neural network-based fuzzy logic system.
  66. Bacchi Paul ; Filipski Paul S., Robot arm with specimen edge gripping end effector.
  67. Watanabe,Atsushi; Nagatsuka,Yoshiharu; Mizuno,Jun, Robot teaching device.
  68. Comer Michael R., Scheduling method for robotic manufacturing processes.
  69. Nakamoto,Shigeru; Kondo,Hideaki; Arima,Juntaro, Semiconductor manufacturing apparatus and its diagnosis apparatus and operating system.
  70. Imai,Keiji, Semiconductor manufacturing apparatus control system.
  71. Jaim Nulman, Semiconductor processing techniques.
  72. Watanabe,Atsushi; Nagatsuka,Yoshiharu; Kuribayashi,Katsuyuki, Simulation device.
  73. Aggarwal, Ravinder; Kusbel, Jim; Davis, Jerry, Slit valve for a semiconductor processing system.
  74. van der Meulen,Peter, Stacked process modules for a semiconductor handling system.
  75. Goldman,Arnold J.; Fisher,Joseph; Hartman,Jehuda; Sarel,Shlomo, Strategic method for process control.
  76. Rice, Michael Robert; Elliott, Martin R.; Lowrance, Robert B.; Hudgens, Jeffrey C.; Englhardt, Eric Andrew, Substrate carrier handler that unloads substrate carriers directly from a moving conveyor.
  77. Hofmeister, Christopher; Caveney, Robert T., Substrate processing apparatus.
  78. Hall, Daniel A.; Hofmeister, Christopher; Fosnight, William; Caveney, Robert T.; Gilchrist, Ulysses; Araujo, Jeff G., Substrate processing apparatus with removable component module.
  79. Wesby,Philip Bernard, System and method for monitoring and control of wireless modules linked to assets.
  80. Sayyarrodsari,Bijan; Hartman,Eric; Axelrud,Celso; Liano,Kidir, System and method of adaptive control of processes with varying dynamics.
  81. Crain Jack A. (107 Fabiola Ave. Lafayette LA 70508), System for lifting tubulars and equipment below the main deck of platforms.
  82. Grant, Robert W.; Petrone, Benjamin J.; Mumbauer, Paul D., Systems and methods for achieving isothermal batch processing of substrates used for the production of micro-electro-mechanical-systems.
  83. Hsiung,Chang Meng B.; Munoz,Bethsabeth; Roy,Ajoy Kumar; Steinthal,Michael Gregory; Sunshine,Steven A.; Vicic,Michael Allen; Zhang,Shou Hua, Temporary expanding integrated monitoring network.
  84. Beinglass, Israel; Miller, Paul V., Test substrate reclamation method and apparatus.
  85. Shah Sunil C. (Mountain View CA) Pandey Pradeep (San Jose CA), Thermal reactor optimization.
  86. Tony R. Kroeker, Three chamber load lock apparatus.
  87. Nugent,Alex, Training of a physical neural network.
  88. Mirkovich Ninko T. (Novato CA) Zajac John (San Jose CA), Vacuum load lock apparatus.
  89. Filo Andrew S. ; Morgenthaler Mark P. ; Steiner Glenn C., Virtual command post.
  90. Thalhammer Reyero,Cristina, Virtual models of complex systems.
  91. Mirkovich Ninko T. (Novato CA) Zajac John (San Jose CA), Wafer cassette having multi-directional access.
  92. Kiley, Chris; van der Meulen, Peter; Buzan, Forest; Fogel, Paul E., Wafer center finding.
  93. Cordova, Sherry; Doyle, Terry L.; Kroupnova, Natalia; Lobovski, Evgueni; Louneva, Inna; Lyon, Richard C.; Nishimura, Yukari; Nolet, Clari; Reiss, Terry; Toh, Woon Young; Wilmer, Michael E., Wafer fabrication data acquisition and management systems.
  94. Abbe Robert C. (Newton MA) Poduje Noel S. (Needham Heights MA) Goodall Randal K. (North Chelmsford MA) Domenicali Peter (Montpelier VT), Wafer handling and processing system.
  95. Gordon Jeffrey M. ; Kindt Cyril M. ; Hardy Kenneth A. ; Bumgardner Steven A. ; Wegener William E. ; Meyhofer Eric, Wafer-mapping load post interface having an effector position sensing device.

이 특허를 인용한 특허 (1)

  1. Young, Richard J.; Tanner, Ryan; Warschauer, Reinier Louis, Sequencer for combining automated and manual-assistance jobs in a charged particle beam device.
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