IPC분류정보
국가/구분 |
United States(US) Patent
등록
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국제특허분류(IPC7판) |
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출원번호 |
US-0239198
(2011-09-21)
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등록번호 |
US-8777699
(2014-07-15)
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발명자
/ 주소 |
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출원인 / 주소 |
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대리인 / 주소 |
Thorpe North & Western LLP
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인용정보 |
피인용 횟수 :
7 인용 특허 :
213 |
초록
▼
Superabrasive tools and methods for making and using the same are provided. In one aspect, for example, a CMP pad dresser includes a first monolayer of superabrasive particles disposed on and coupled to one side of a metal support layer and a second monolayer of superabrasive particles disposed on a
Superabrasive tools and methods for making and using the same are provided. In one aspect, for example, a CMP pad dresser includes a first monolayer of superabrasive particles disposed on and coupled to one side of a metal support layer and a second monolayer of superabrasive particles disposed on and coupled to the metal support layer on an opposite side from the first monolayer. The superabrasive particles of the second monolayer are positioned to have substantially the same distribution as the superabrasive particles of the first monolayer.
대표청구항
▼
1. A CMP pad dresser, comprising: a first monolayer of superabrasive particles disposed on and coupled to one side of a metal support layer; anda second monolayer of superabrasive particles disposed on and coupled to the metal support layer on an opposite side from the first monolayer, wherein the s
1. A CMP pad dresser, comprising: a first monolayer of superabrasive particles disposed on and coupled to one side of a metal support layer; anda second monolayer of superabrasive particles disposed on and coupled to the metal support layer on an opposite side from the first monolayer, wherein the superabrasive particles of the second monolayer are positioned to have substantially the same distribution as the superabrasive particles of the first monolayer; and further comprising a rigid support coupled to the second monolayer of superabrasive particles opposite the first monolayer. 2. The dresser of claim 1, wherein the superabrasive particles in the first monolayer include a member selected from the group consisting of diamond materials, nitride materials, ceramics, or a combination thereof. 3. The dresser of claim 1, wherein the superabrasive particles in the first monolayer are a diamond material. 4. The dresser of claim 1, wherein the superabrasive particles in the first monolayer are a cubic boron nitride material. 5. The dresser of claim 1, wherein the superabrasive particles in the second monolayer include a member selected from the group consisting of diamond materials, nitride materials, ceramics, or a combination thereof. 6. The dresser of claim 1, wherein the superabrasive particles in the second monolayer are a diamond material. 7. The dresser of claim 1, wherein the superabrasive particles in the second monolayer are a cubic boron nitride material. 8. The dresser of claim 1, wherein at least one of the first monolayer of superabrasive particles or the second monolayer of superabrasive particles is coupled to the metal support layer with a braze alloy. 9. The dresser of claim 1, wherein both the first monolayer of superabrasive particles and the second monolayer of superabrasive particles are coupled to the metal support layer with a braze alloy. 10. The dresser of claim 1, wherein the superabrasive particles of the second monolayer are positioned to have the same distribution as the superabrasive particles of the first monolayer. 11. A method of making a CMP pad dresser, comprising: disposing a first monolayer of superabrasive particles on a metal support layer;disposing a second monolayer of superabrasive particles on the metal support layer on a side opposite the first monolayer, wherein the superabrasive particles of the second monolayer are positioned to have substantially the same distribution as the superabrasive particles of the first monolayer;bonding the first monolayer of superabrasive particles and the second monolayer of superabrasive particles to the metal support layer such that symmetrical forces due to the substantially similar distribution between the first monolayer and the second monolayer precludes substantial warping of the metal support layer; andcoupling the second monolayer of superabrasive particles to a rigid support. 12. The method of claim 11, wherein the bonding of at least one of the first monolayer or the second monolayer is by brazing with a braze alloy. 13. The method of claim 11, wherein the bonding of at least one of the first monolayer or the second monolayer is under heat and pressure. 14. The method of claim 13, wherein the bonding of at least one of the first monolayer and the second monolayer further includes: disposing a sintering compound on the metal support layer in contact with at least one of the first monolayer or the second monolayer; andsintering the sintering compound to bond the at least one of the first monolayer or the second monolayer to the metal support layer. 15. The method of claim 14, further comprising infiltrating the sintering compound with a braze material during bonding. 16. The method of claim 13, wherein the heat and pressure bonds at least one of the first monolayer or the second monolayer directly to the metal support layer. 17. The method of claim 11, wherein the superabrasive particles of the second monolayer are positioned to align with the superabrasive particles of the first monolayer. 18. The method of claim 11, wherein the coupling of the second monolayer of superabrasive particles to the rigid support is accomplished by a technique selected from the group consisting of hot pressing, brazing, sintering, soldering, electroplating, polymeric bonding, and combinations thereof. 19. The method of claim 11, wherein the coupling of the second monolayer of superabrasive particles to the rigid support is accomplished by polymeric bonding.
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