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Apparatus and method of fabricating a compensating element for wavefront correction using spatially localized curing of resin mixtures 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • B29D-011/00
출원번호 US-0437506 (2009-05-07)
등록번호 US-8790104 (2014-07-29)
발명자 / 주소
  • Lai, Shui T.
출원인 / 주소
  • Essilor International (Compagnie Generale d'Optique
대리인 / 주소
    O'Connor, Cozen
인용정보 피인용 횟수 : 0  인용 특허 : 66

초록

An optical wavefront correction plate incorporates a unique, three-dimensional spatial retardation distribution utilizing the index of refraction change of resin mixture in its cured state. The optical wave plate comprises a pair of transparent plates, containing a layer of a monomers and polymeriza

대표청구항

1. An apparatus for curing at least one monomer in a resin mixture at a plurality of cure locations to thereby establish an index of refraction profile in the resin mixture, the resin mixture being positioned as a layer between a first optical element and a second optical element, the apparatus comp

이 특허에 인용된 특허 (66)

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