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Semiconductor device and display device 원문보기

IPC분류정보
국가/구분 United States(US) Patent 등록
국제특허분류(IPC7판)
  • G09G-003/36
  • H01L-027/12
  • G02F-001/1345
  • H01L-029/66
출원번호 US-0055055 (2008-03-25)
등록번호 US-8803781 (2014-08-12)
우선권정보 JP-2007-133517 (2007-05-18)
발명자 / 주소
  • Kimura, Hajime
  • Umezaki, Atsushi
출원인 / 주소
  • Semiconductor Energy Laboratory Co., Ltd.
대리인 / 주소
    Fish & Richardson P.C.
인용정보 피인용 횟수 : 7  인용 특허 : 40

초록

A single-crystal semiconductor layer is separated from a single-crystal semiconductor substrate and is fixed to an insulating substrate to form a TFT over the insulating substrate. Then, a driver circuit is formed using the TFT. The TFT has excellent current characteristics because an active layer i

대표청구항

1. A semiconductor device comprising: a first substrate comprising: a controller circuit electrically connected to a power supply circuit which is configured to output a first potential, the entirety of the controller circuit being on the first substrate; anda second substrate comprising: a pixel po

이 특허에 인용된 특허 (40)

  1. Spitzer Mark B. (Sharon MA) Salerno Jack P. (Waban MA) Dingle Brenda (Mansfield MA) Jacobsen Jeffrey (Hollister CA), Color filter system for display panels.
  2. Zavracky Matthew (Plympton MA) Chern Wen-Foo (Wayland MA), Color sequential display panels.
  3. Shunpei Yamazaki JP; Jun Koyama JP; Yoshiharu Hirakata JP; Takeshi Fukunaga JP, Electrooptical device.
  4. Yamazaki, Shunpei; Koyama, Jun; Hirakata, Yoshiharu; Fukunaga, Takeshi, Electrooptical device.
  5. Yamazaki,Shunpei; Koyama,Jun; Hirakata,Yoshiharu; Fukunaga,Takeshi, Electrooptical device.
  6. Abe, Katsumi; Hosono, Hideo; Kamiya, Toshio; Nomura, Kenji, Integrated circuits utilizing amorphous oxides.
  7. Abe, Katsumi; Hosono, Hideo; Kamiya, Toshio; Nomura, Kenji, Integrated circuits utilizing amorphous oxides.
  8. Zavracky Paul M. (Norwood MA) Fan John C. C. (Chestnut Hill MA) McClelland Robert (Norwell MA) Jacobsen Jeffrey (Hollister CA) Dingle Brenda (Mansfield MA), Liquid crystal display having essentially single crystal transistors pixels and driving circuits.
  9. Yonehara Takao (Atsugi JPX) Miyawaki Mamoru (Isehara JPX) Ishizaki Akira (Atsugi JPX) Hoshi Junichi (Hadano JPX) Sakamoto Masaru (Atsugi JPX) Sugawa Shigetoshi (Atsugi JPX) Inoue Shunsuke (Yokohama J, Liquid crystal image display unit and method for fabricating semiconductor optical member.
  10. Yonehara Takao,JPX ; Miyawaki Mamoru,JPX ; Ishizaki Akira,JPX ; Hoshi Junichi,JPX ; Sakamoto Masaru,JPX ; Sugawa Shigetoshi,JPX ; Inoue Shunsuke,JPX ; Koizumi Toru,JPX ; Kohchi Tetsunobu,JPX ; Sakagu, Liquid crystal image display unit and method for fabricating semiconductor optical member.
  11. Jacobsen Jeffrey ; Fan John C. C. ; Salerno Jack P., Matrix display systems.
  12. Spitzer Mark B. (Sharon MA) Salerno Jack P. (Waban MA) Jacobsen Jeffrey (Hollister CA) Dingle Brenda (Mansfield MA) Vu Duy-Phach (Taunton MA) Zavracky Paul M. (Norwood MA), Method for manufacturing a semiconductor device using a circuit transfer film.
  13. Shunpei Yamazaki JP; Hisashi Ohtani JP, Method of fabricating a high reliable SOI substrate.
  14. Yamazaki, Shunpei; Ohtani, Hisashi, Method of fabricating a semiconductor device.
  15. Shunpei Yamazaki JP, Method of manufacturing a semiconductor device.
  16. Yamazaki,Shunpei, Method of manufacturing a semiconductor device.
  17. Yanai,Ken ichi; Nagahiro,Yoshio; Hotta,Kazushige; Ohgata,Koji; Mishima,Yasuyoshi; Sasaki,Nobuo, Method of manufacturing a thin film transistor device.
  18. Yamazaki, Shunpei, Nonvolatile memory and electronic apparatus.
  19. Fukunaga Takeshi,JPX, Process for production of SOI substrate and process for production of semiconductor device.
  20. Fukunaga, Takeshi, Process for production of SOI substrate and process for production of semiconductor device.
  21. Fukunaga, Takeshi, Process for production of SOI substrate and process for production of semiconductor device.
  22. Fukunaga,Takeshi, Process for production of SOI substrate and process for production of semiconductor device.
  23. Bruel Michel (Veurey FRX), Process for the production of thin semiconductor material films.
  24. Zavracky Paul M. ; Vu Duy-Phach ; Dingle Brenda ; Zavracky Matthew ; Spitzer Mark B., Process of fabricating active matrix pixel electrodes.
  25. Takafuji, Yutaka; Itoga, Takashi, Semiconductor device and manufacturing method thereof, SOI substrate and display device using the same, and manufacturing method of the SOI substrate.
  26. Takafuji, Yutaka; Itoga, Takashi, Semiconductor device and manufacturing method thereof, SOI substrate and display device using the same, and manufacturing method of the SOI substrate.
  27. Takafuji,Yutaka; Itoga,Takashi, Semiconductor device and manufacturing method thereof, SOI substrate and display device using the same, and manufacturing method of the SOI substrate.
  28. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito, Semiconductor device and method of manufacturing therefor.
  29. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX ; Koyama Jun,JPX ; Fukunaga Takeshi,JPX, Semiconductor device having an SOI structure and manufacturing method therefor.
  30. Osame, Mitsuaki; Anzai, Aya, Semiconductor device including memory circuit, display device and electronic apparatus.
  31. Shunpei Yamazaki JP; Jun Koyama JP, Semiconductor display device and driving circuit therefor.
  32. Yamazaki, Shunpei; Koyama, Jun, Semiconductor display device and driving circuit therefor.
  33. Yamazaki, Shunpei; Koyama, Jun, Semiconductor display device and driving circuit therefor.
  34. Yamazaki, Shunpei; Murakami, Satoshi; Koyama, Jun; Tanaka, Yukio; Kitakado, Hidehito, Semiconductor display device and method of manufacturing therefor.
  35. Yamazaki Shunpei,JPX ; Ohtani Hisashi,JPX, Semiconductor thin film in semiconductor device having grain boundaries.
  36. Kubota, Yasushi; Washio, Hajime; Yoshida, Shigeto; Maeda, Kazuhiro; Yoneda, Hiroshi, Shift register circuit, image display apparatus having the circuit, and driving method for LCD devices.
  37. Zavracky Paul M. (Norwood MA) Fan John C. C. (Chestnut Hill MA) McClelland Robert (Norwell MA) Jacobsen Jeffrey (Hollister CA) Dingle Brenda (Norton MA) Spitzer Mark B. (Sharon MA), Single crystal silicon arrayed devices for display panels.
  38. Inoue, Kazuyoshi; Yano, Koki; Tanaka, Nobuo; Tanaka, legal representative, Tokie, TFT substrate and method for manufacturing TFT substrate.
  39. Inoue, Kazuyoshi; Yano, Koki; Tanaka, Nobuo; Tanaka, legal representative, Tokie, TFT substrate and method for manufacturing TFT substrate.
  40. Yanai,Kenichi; Nagahiro,Yoshio; Hotta,Kazushige; Ohgata,Koji; Mishima,Yasuyoshi; Sasaki,Nobuo, Thin film transistor device, method of manufacturing the same and liquid crystal panel.

이 특허를 인용한 특허 (7)

  1. Yamazaki, Shunpei; Koyama, Jun; Tsubuku, Masashi; Noda, Kosei, Driver circuit comprising semiconductor device.
  2. Yamazaki, Shunpei; Ohnuma, Hideto; Takahashi, Kei, Driver circuit, signal processing unit having the driver circuit, method for manufacturing the signal processing unit, and display device.
  3. Kurokawa, Yoshiyuki; Ikeda, Takayuki; Tamura, Hikaru; Yamazaki, Shunpei, Electronic device and electronic system.
  4. Yamazaki, Shunpei; Koyama, Jun; Tsubuku, Masashi; Noda, Kosei, Logic circuit and semiconductor device.
  5. Yamazaki, Shunpei; Isobe, Atsuo; Saito, Toshihiko; Hatano, Takehisa; Suzawa, Hideomi; Sasagawa, Shinya; Koezuka, Junichi; Sato, Yuichi; Ohno, Shinji, Semiconductor device and manufacturing method thereof.
  6. Umezaki, Atsushi; Akiba, Mai, Semiconductor display device.
  7. Umezaki, Atsushi; Akiba, Mai, Semiconductor display device.
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