The present invention relates to new hybrid, organic-inorganic hybrid silicates and metal-silicates characterized by a crystalline structure containing structural units having formula (a), wherein R is an organic group possibly containing one or more element T selected from Group IIIB, IVB, VB and f
The present invention relates to new hybrid, organic-inorganic hybrid silicates and metal-silicates characterized by a crystalline structure containing structural units having formula (a), wherein R is an organic group possibly containing one or more element T selected from Group IIIB, IVB, VB and from transition metals. A process starting from cyclic trisilanes for the preparation of said materials, is also described. These materials can be used as molecular sieves, adsorbents, in the field of catalysis, in the field of electronics, in the field of sensors, in the area of nanotechnology.
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1. A hybrid organic-inorganic silicate or metal silicate, having a crystalline structure comprising at least one structural unit of formula (a), wherein R is an organic group: and optionally comprising at least one T element selected from the group consisting of an element of group III B, an element
1. A hybrid organic-inorganic silicate or metal silicate, having a crystalline structure comprising at least one structural unit of formula (a), wherein R is an organic group: and optionally comprising at least one T element selected from the group consisting of an element of group III B, an element of group IV B, an element of group V B, and a transition metal. 2. The silicate of claim 1, having a crystalline structure which comprises at least one structural unit of formula (a), wherein R is an organic group: and optionally comprising at least one T element selected from the group consisting of an element of group III B, an element of group IV B, an element group of V B, and a transition metal,wherein the units (a) are linked to each other and to the T element, when present, with at least one oxygen atom. 3. The silicate of claim 1, wherein the organic group R comprised in the structural unit (a) is an aliphatic, arylic, or mixed aliphatic-arylic group. 4. The silicate of claim 3, wherein the aliphatic group is present and is saturated or unsaturated, linear, or branched. 5. The silicate of claim 4, wherein R is an alkyl group comprising from 1 to 3 carbon atoms selected from the group consisting of —CH2—, —CH2CH2—, linear —C3H6—, and branched —C3H6—. 6. A hybrid organic-inorganic silicate or metal silicate, which is called ECS-10, having a crystalline structure comprising at least one structural unit of formula (a), wherein R is an organic group: whereinthe crystalline structure comprises as the structural units (a), at least one unit of formula (II): and optionally comprising at least one T element selected from the group consisting of an element group III B, an element of group IV B, an element of group V B, and a transition metal,wherein an X-ray powder diffraction pattern, with CuKα radiation at λ=1,54178 Å, showing intensities and positions of reflections is: d (Å)Intensityd (Å)Intensity13.0 +/− 0.1Vs3.56 +/− 0.03W9.39 +/− 0.08Vw3.43 +/− 0.03W7.62 +/− 0.06Vw3.38 +/− 0.03W6.49 +/− 0.05Vw3.24 +/− 0.03S5.43 +/− 0.05W3.12 +/− 0.02w5.33 +/− 0.05W3.07 +/− 0.02w5.02 +/− 0.05W2.82 +/− 0.01vw4.71 +/− 0.04W2.78 +/− 0.01vw4.43 +/− 0.04Vw2.75 +/− 0.01vw4.33 +/− 0.04W2.67 +/− 0.01w3.93 +/− 0.03Vw2.61 +/− 0.01w3.81 +/− 0.03Vwwherein d indicates an interplanar distance and the intensity of the reflections is expressed asvs = I/Io · 100 is in a range 100-80,s = I/Io · 100 is in a range 80-50,m = I/Io · 100 is in a range 50-30,w = I/Io · 100 is in a range 30-10, andvw = I/Io · 100 is in a range <10, andI/Io · 100 represents a relative intensity calculated by measuring a peak height and deriving a percentage with respect to a height of the most intense peak. 7. The silicate of claim 1, wherein the at least one T element is trivalent or tetravalent, in tetrahedral coordination, and forms TO4 units linked with at least one oxygen bridge to the structural unit (a). 8. The silicate of claim 7, wherein the TO4 units, besides being linked to the structural units (a), are also linked to each other. 9. The silicate of claim 1, wherein an Si/(Si+T) molar ratio is higher than 0.3 and lower than or equal to 1, wherein Si is the silicon comprised in the structural unit of formula (a). 10. The silicate of claim 1, wherein T is at least one element selected from the group consisting of Si, Al, Fe, Ti, B, P, Ge, and Ga. 11. A silicate of claim 10, wherein T is silicon, aluminum, iron, or mixture of silicon and aluminum. 12. The silicate of claim 1, further comprising: at least one Me cation. 13. The silicate of claim 1, conforming to formula (b) SiO.xTO2.y/nMe.zC (b),wherein Si is silicon comprised in the structural unit (a),T is at least one element selected from the group consisting of an element of group III B, an element of group IV B, an element of group V B, and a transition metal,Me is at least one n valence cation,C is carbon,x ranges from 0 to 2.3,y ranges from 0 to 2.3,n is the valence of the at least one Me cation, andz ranges from 0.5 to 10. 14. The silicate of claim 1, having 29Si-MAS-NMR signals whose chemical shift essentially falls in a range between −5 and −90 ppm. 15. A process for preparing the silicate of claim 1, comprising: (1) adding a trisilane of formula (c) whereinR is an organic group, andX is a substituent which can be hydrolyzed,into an aqueous mixture comprising at least one hydroxide of at least one Me metal selected from the group consisting of an alkali metal and an alkaline-earth metal, and optionally at least one source of at least one T element selected from the group consisting of an element of groups III B, an element of group IV B, an element of group V B, and a transition metals, to obtain a mixture;(2) keeping the mixture under hydrothermal conditions and autogenous pressure, for a time sufficient to form a solid material; and(3) recovering the solid material and drying the solid material. 16. The process of claim 15, wherein in the adding (1), in addition to Me metal hydroxide, at least one Me metal salt is present. 17. The process of claim 15, wherein the R group of the trisilane of formula (c) is an aliphatic, arylic, or mixed aliphatic-arylic group. 18. The process of claim 15, wherein at least one ECS-10 silicate or metal silicate is prepared, and wherein, in the trisilane of formula (c), the R group is —CH2—. 19. The process of claim 15, wherein at least one ECS-10 for silicate and metal silicate is prepared, and wherein the trisilane of formula (c) comprises 1,1,3,3,5,5 exaethoxy-1,3,5trisilylcyclohexane. 20. The process of claim 15, wherein the mixture of the adding (1) is prepared by mixing reagents in the following molar ratios: Si/(Si+T) is higher than 0.3 and lower than or equal to 1;Me+/Si=0.05-5;OH−/Si=0.05-2;H2O/Si<100,where Si is silicon comprised in the trisilane of formula (c). 21. The process according to claim 15, wherein, in the keeping (2), the mixture is kept in an autoclave, under hydrothermal conditions and autogenous pressure, and optionally under stirring. 22. The process of claim 21, wherein the temperature is between 70 and 180° C. 23. A molecular sieve, an adsorbent, or a catalyst component, comprising the silicate of claim 1.
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