초록

The present invention provides porous organosilicate layers, and vapor deposition systems and methods for preparing such layers on substrates. The porous organosilicate layers are useful, for example, as masks.

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1. An article comprising a substrate having a periodic mesoporous organosilicate layer having an as-deposited thickness of no greater than 20 nanometers that is formed by: contacting a vapor comprising at least one silsesquioxane precursor, a vapor comprising at least one wetting agent or surfactant

1. An article comprising a substrate having a periodic mesoporous organosilicate layer having an as-deposited thickness of no greater than 20 nanometers that is formed by: contacting a vapor comprising at least one silsesquioxane precursor, a vapor comprising at least one wetting agent or surfactant, and at least one reaction gas with at least one surface of a substrate to form a condensed phase on said surface of the substrate;contacting a vapor comprising a carboxylic acid or a nitrogen base with the condensed phase and heating the condensed phase to form a gel; andcalcining the gel to form a periodic mesoporous organosilicate layer on the substrate having a thickness of no greater than 20 nanometers. 2. The article of claim 1 wherein the periodic mesoporous organosilicate layer has a thickness of at least 1 Angstrom. 3. The article of claim 2 wherein the periodic mesoporous organosilicate layer has a thickness of at least 5 Angstroms. 4. The article of claim 3 wherein the periodic mesoporous organosilicate layer has a thickness of at least 10 Angstroms. 5. The article of claim 2 wherein the periodic mesoporous organosilicate layer has a thickness of 10 Angstroms or less. 6. The article of claim 5 wherein the periodic mesoporous organosilicate layer has a thickness of 5 Angstroms or less. 7. The article of claim 6 wherein the periodic mesoporous organosilicate layer has a thickness of less than 5 Angstroms. 8. The article of claim 1 wherein the silsesquioxane precursor is selected from the group consisting of compounds of the formula (Formula II) (R1O)3SiR2Si(OR1)3, wherein each R1 and R2 is independently an organic group; cyclic compounds of the formula (Formula III) [(R1O)2SiC(R3)2]x, wherein each R1 is independently an organic group, each R3 is independently hydrogen or an organic group, and x=3 or 4; and combinations thereof. 9. The article of claim 8 wherein each R1 and R2 is independently an organic group having 1 to 10 carbon atoms. 10. The article of claim 8 wherein each R3 is independently hydrogen or an organic group having 1 to 10 carbon atoms. 11. The article of claim 1 wherein the at least one wetting agent or surfactant comprises a compound of the formula (Formula I) RO(CH2CH2O)nR, wherein each R is independently hydrogen or an organic group, an n is from 1 to 10. 12. The article of claim 1 wherein the carboxylic acid is a volatile carboxylic acid of the formula R4(CO2H)x, wherein R4 is an organic group and x=1 or 2. 13. The article of claim 12 wherein R4 is an organic group having 1 to 10 carbon atoms. 14. The article of claim 13 wherein the carboxylic acid is selected from the group consisting of acetic acid, propionic acid, butyric acid, valeric acid, malonic acid, succinic acid, and combinations thereof. 15. The article of claim 1 wherein the nitrogen base is a volatile nitrogen base of the formula R5R6R7N, wherein each R group is independently hydrogen or an organic group, and wherein two or more of R5, R6, and R7 can optionally form one or more rings. 16. The article of claim 15 wherein each R group is independently hydrogen or an organic group having 1 to 10 carbon atoms. 17. The article of claim 15 wherein the nitrogen base is selected from the group consisting of ammonia, methylamine, ethylamine, ethanolamine, dimethylamine, diethylamine, diethanolamine, trimethylamine, triethylamine, triethanolamine, pyrrole, pyrrolidine, piperidine, pyridine, morpholine, and combinations thereof.