Apparatus for growing carbon nanotube forests, and generating nanotube structures therefrom, and method
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B29C-065/56
B29C-065/78
B82Y-030/00
B82Y-040/00
D01F-009/133
C01B-031/02
출원번호
US-0049180
(2013-10-08)
등록번호
US-8845941
(2014-09-30)
발명자
/ 주소
Lemaire, Alexander B.
Lemaire, Charles A.
Stordal, Leif T.
Thomforde, Dale J.
출원인 / 주소
GrandNano, LLC
대리인 / 주소
Lemaire, Charles A.
인용정보
피인용 횟수 :
0인용 특허 :
94
초록▼
The present invention provides apparatus and methods for growing fullerene nanotube forests, and forming nanotube films, threads and composite structures therefrom. In some embodiments, an interior-flow substrate includes a porous surface and one or more interior passages that provide reactant gas t
The present invention provides apparatus and methods for growing fullerene nanotube forests, and forming nanotube films, threads and composite structures therefrom. In some embodiments, an interior-flow substrate includes a porous surface and one or more interior passages that provide reactant gas to an interior portion of a densely packed nanotube forest as it is growing. In some embodiments, a continuous-growth furnace is provided that includes an access port for removing nanotube forests without cooling the furnace substantially. In other embodiments, a nanotube film can be pulled from the nanotube forest without removing the forest from the furnace. A nanotube film loom is described. An apparatus for building layers of nanotube films on a continuous web is described.
대표청구항▼
1. An apparatus for producing a continuous nanotube film, the apparatus comprising: a nanotube-grower unit that grows a first nanotube forest on a first substrate and a second nanotube forest on a second substrate;a puller mechanism configured to simultaneously pull a first length of a first nanotub
1. An apparatus for producing a continuous nanotube film, the apparatus comprising: a nanotube-grower unit that grows a first nanotube forest on a first substrate and a second nanotube forest on a second substrate;a puller mechanism configured to simultaneously pull a first length of a first nanotube film and a first length of a second nanotube film from the first substrate; anda splicer mechanism, wherein the apparatus pulls the first length of the first nanotube film and the first length of the second nanotube film from the first nanotube forest on the first substrate, the splicer mechanism splices the first nanotube film and the second nanotube film to nanotubes of the second substrate, and continues to pull the first nanotube film and the second nanotube film such that, spliced to and continuous with the first nanotube film, a continued first film of nanotubes is pulled from the second substrate and spliced to and continuous with the second nanotube film, a continued second film of nanotubes is pulled from the second substrate. 2. A method for producing a nanotube film, the method comprising: providing a first plurality of substrates, wherein the first plurality of substrates includes a first substrate and a second substrate;supplying a precursor gas to the first substrate in a reaction chamber in a furnace;growing a first nanotube forest on the first substrate using the carbon-bearing gas;positioning the second substrate within the reaction chamber in the furnace;supplying the carbon-bearing precursor gas to the second substrate in the reaction chamber;growing a second nanotube forest on the second substrate using the carbon-bearing gas;pulling a first nanotube film and a second nanotube film simultaneously from the first nanotube forest on the first substrate;splicing the first nanotube film and the second nanotube film to nanotubes of the second substrate; andcontinuing pulling the first nanotube film and the second nanotube film such that, spliced to the first nanotubes film, a continued film of nanotubes is pulled from the second substrate and spliced to the second nanotubes film, a continued film of nanotubes is pulled from the second substrate. 3. The method of claim 2, wherein the pulling further includes: spinning the pulled first nanotube film into a first twisted yarn; andspinning the pulled first nanotube film into a second twisted yarn. 4. The method of claim 2, wherein the pulling further includes: at a first distance from the first nanotube forest, spinning the pulled first nanotube film into a first twisted yarn; andat a second distance from the first nanotube forest that is different than the first distance, spinning the pulled first nanotube film into a second twisted yarn. 5. The method of claim 2, wherein the splicing further includes pressing a pulled nanotube film into a front face of a nanotube forest using a non-adhesive nose surface. 6. The method of claim 2, wherein the pulling further includes selectively applying a vacuum through a porous surface in order to hold and later release pulled nanotube film. 7. The method of claim 2, wherein the first substrate and the second substrate each have a porous first face, and a plurality of interior gas passageways that are each oriented parallel to the porous first face and that each supply a different one of a plurality of different nanotube-growth areas of the porous first face, wherein the nanotube-grower unit includes a furnace and a reaction chamber, and wherein the reaction chamber has an access port, wherein the reaction chamber is positioned within the furnace, the method further including: supplying nanotube-growth gas to the plurality of interior gas passageways within a first nanotube-growth substrate; androuting the gas through the plurality of interior gas passageways to the plurality of areas of the first porous surface of the first substrate. 8. The method of claim 2, wherein the first substrate and the second substrate each have a porous first face and an oppositely facing porous second face, and a plurality of interior gas passageways that are each oriented parallel to the porous first and second faces and that each supply a different one of a plurality of different nanotube-growth areas of the porous first and second face, wherein the nanotube-grower unit includes a furnace, a gas supply unit, and a reaction chamber, and wherein the reaction chamber has an access port, wherein the reaction chamber is positioned within the furnace, the method further including: supplying nanotube-growth gas to the plurality of interior gas passageways within a first nanotube-growth substrate; androuting the gas through the plurality of interior gas passageways to the plurality of areas of the first porous surface and the second surface of the first substrate. 9. The method of claim 2, wherein the precursor gas is a carbon-bearing precursor gas, and the nanotube forest is a carbon-nanotube forest. 10. The apparatus of claim 1, wherein the puller mechanism includes a plurality of film-holding bars, wherein each of the plurality of film-holding bars is configured to pull a nanotube film from a face of a nanotube forest, and wherein each of the plurality of film-holding bars is configured to spin to create a respective nanotube yarn from its respective nanotube film. 11. The apparatus of claim 1, wherein the puller mechanism includes a plurality of film-holding bars, wherein each of the plurality of film-holding bars is configured to pull a nanotube film from a face of a nanotube forest, and wherein each of the plurality of film-holding bars is configured move to one of a plurality of different distances from the nanotube forest, and then to spin to create a respective nanotube yarn from its respective nanotube film without interference from a neighboring one of the plurality of film-holding bars. 12. The apparatus of claim 1, wherein the splicer mechanism includes a splicer bar having a non-adhesive front nose configured to press a pulled nanotube film into a front face of a nanotube forest. 13. The apparatus of claim 1, wherein the puller mechanism includes a porous front surface through which a vacuum is selectively applied in order to hold and later release pulled nanotube film. 14. The apparatus of claim 1, wherein the first substrate and the second substrate each have a porous first face, and a plurality of interior gas passageways that are each oriented parallel to the porous first face and that each supply a different one of a plurality of different nanotube-growth areas of the porous first face;wherein the nanotube-grower unit includes a furnace, a gas supply unit, and a reaction chamber,wherein the reaction chamber has an access port, wherein the reaction chamber is positioned within the furnace,wherein the gas supply unit is configured to supply nanotube-growth gas to the plurality of interior gas passageways within a first nanotube-growth substrate, andwherein the interior gas passageways of the first nanotube-growth substrate are operatively coupled to supply gas to the plurality of areas of the first porous surface of the first substrate. 15. The apparatus of claim 1, wherein the first substrate and the second substrate each have a porous first face and an oppositely facing porous second face, and a plurality of interior gas passageways that are each oriented parallel to the porous first and second faces and that each supply a different one of a plurality of different nanotube-growth areas of the porous first and second face;wherein the nanotube-grower unit includes a furnace, a gas supply unit, and a reaction chamber,wherein the reaction chamber has an access port, wherein the reaction chamber is positioned within the furnace,wherein the gas supply unit is configured to supply nanotube-growth gas to the interior gas passageways within a first nanotube-growth substrate, andwherein the interior gas passageways of the first nanotube-growth substrate are operatively coupled to supply gas to the plurality of areas of the first porous surface and the second porous surface of the first substrate. 16. The apparatus of claim 1, wherein the precursor gas is a carbon-bearing precursor gas, and the nanotube forest is a carbon-nanotube forest. 17. An apparatus for producing a continuous nanotube film using a first plurality of substrates, wherein the first plurality of substrates includes a first substrate and a second substrate, the apparatus comprising: a reaction chamber in a furnace;means for supplying a precursor gas to the first substrate in the reaction chamber;means for growing a first nanotube forest on the first substrate using the carbon-bearing gas;means for supplying the carbon-bearing precursor gas to the second substrate in the reaction chamber;means for growing a second nanotube forest on the second substrate using the carbon-bearing gas;means for pulling a first nanotube film and a second nanotube film simultaneously from the first nanotube forest on the first substrate;means for splicing the first nanotube film and the second nanotube film to nanotubes of the second substrate; andmeans for continuing pulling the first nanotube film and the second nanotube film such that, spliced to the first nanotubes film, a continued film of nanotubes is pulled from the second substrate and spliced to the second nanotubes film, a continued film of nanotubes is pulled from the second substrate. 18. The apparatus of claim 17, wherein the means for pulling further includes: means for spinning the pulled first nanotube film into a first twisted yarn; andmeans for spinning the pulled first nanotube film into a second twisted yarn. 19. The apparatus of claim 17, wherein the means for splicing further includes means for pressing a pulled nanotube film into a front face of a nanotube forest. 20. The apparatus of claim 17, wherein the means for pulling further includes means for selectively applying a vacuum to hold and later release pulled nanotube film.
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