Lithographic apparatus, composite material and manufacturing method
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G03B-027/58
G03B-027/62
G03F-007/20
출원번호
US-0466931
(2009-05-15)
등록번호
US-8848169
(2014-09-30)
발명자
/ 주소
Scholten, Mark
Kleijn, Jacob
Libourel, Stephan Christiaan Quintus
Ubbink, Mark Petrus
출원인 / 주소
ASML Netherlands B.V.
대리인 / 주소
Pillsbury Winthrop Shaw Pittman LLP
인용정보
피인용 횟수 :
0인용 특허 :
5
초록▼
A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device may be capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The
A lithographic apparatus includes an illumination system configured to condition a radiation beam and a support constructed to support a patterning device. The patterning device may be capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam. The lithographic apparatus further includes a substrate table constructed to hold a substrate and a projection system configured to project the patterned radiation beam onto a target portion of the substrate. The lithographic apparatus may be provided with a composite material wherein a layer of carbon fiber and a layer of titanium is provided within the composite.
대표청구항▼
1. A lithographic apparatus comprising: a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;a substrate table constructed to hold a substrate; anda projection sy
1. A lithographic apparatus comprising: a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;a substrate table constructed to hold a substrate; anda projection system configured to project the patterned radiation beam onto a target portion of the substrate,wherein a component of the lithographic apparatus comprises a composite material, the composite material including a layer of carbon fiber and a layer of titanium, andwherein the component is the substrate table or the support. 2. The lithographic apparatus according to claim 1, wherein layers of titanium and carbon fibers are alternatively arranged within the composite material. 3. The lithographic apparatus according to claim 1, wherein the titanium layer has a thickness between about 0.05 and 0.6 mm. 4. The lithographic apparatus according to claim 3, wherein the titanium layer has a thickness between about 0.2 and 0.4 mm. 5. The lithographic apparatus according to claim 1, wherein the component includes an inside corner and the composite material is provided on the inside corner. 6. The lithographic apparatus according to claim 5, wherein the layer of titanium is a plate of titanium with a corner shape arranged in the inside corner. 7. The lithographic apparatus according to claim 1, wherein the component is moveable and includes an inside corner and the composite material is provided on the inside corner. 8. The lithographic apparatus according to claim 7, wherein the component includes a frame and an arm extending from said frame, said inside corner defined at the junction of said arm and said frame. 9. The lithographic apparatus according to claim 1, wherein the substrate table or the support has a surface for receiving, respectively, the substrate or the patterning device. 10. The lithographic apparatus according to claim 1, wherein the layer of titanium is smaller than the layer of carbon fiber. 11. A lithographic apparatus comprising: a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;a substrate table constructed to hold a substrate; anda projection system configured to project the patterned radiation beam onto a target portion of the substrate,wherein a component of the lithographic apparatus comprises a composite material, the composite material including a layer of carbon fiber and a layer of titanium, andwherein the composite material is provided on an inside corner of the component and the layer of titanium is a plate of titanium with a corner shape arranged in the inside corner. 12. A lithographic apparatus, comprising: a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;a substrate table constructed to hold a substrate;a projection system configured to project the patterned radiation beam onto a target portion of the substrate, anda crash protector that is configured to protect the apparatus from a moveable part, wherein the crash protector comprises a composite material, the composite material including a layer of carbon fiber and a layer of titanium. 13. The lithographic apparatus according to claim 12, wherein the crash protector is arranged around the substrate table or the support. 14. The lithographic apparatus according to claim 13, wherein the crash protector has a frame arranged around the substrate table or the support and an arm extending away from said frame. 15. The lithographic apparatus according to claim 14, wherein the composite material is provided at an inside corner defined at the junction of the arm and the frame. 16. A lithographic apparatus, comprising: a support constructed to support a patterning device, the patterning device being capable of imparting a radiation beam with a pattern in its cross-section to form a patterned radiation beam;a substrate table constructed to hold a substrate;a projection system configured to project the patterned radiation beam onto a target portion of the substrate, anda positioning device configured to position the support or the substrate table, wherein the positioning device comprises a composite material, the composite material including a layer of carbon fiber and a layer of titanium. 17. An object support of a lithographic apparatus, the object support configured to support an object in the lithographic apparatus and comprising a composite material comprising a layer of a carbon fiber, wherein a layer of titanium is provided within the composite material, and wherein the object support is a substrate table configured to support a substrate or a support configured to support a patterning device of the lithographic apparatus. 18. The object support according to claim 17, wherein layers of titanium and carbon fibers are alternatively arranged within the composite material. 19. The object support according to claim 17, wherein the composite material is provided on an inside corner of the object support. 20. A component of a lithographic apparatus comprising a composite material comprising a layer of a carbon fiber, wherein a layer of titanium is provided within the composite material, wherein the component is a movable part of the lithographic apparatus, wherein the composite material is provided on an inside corner of the component, and wherein the layer of titanium is a plate of titanium with a corner shape provided on the inside of the corner.
Ottens,Joost Jeroen; Mertens,Jeroen Johannes Sophia Maria; De Jong,Frederik Eduard; Goorman,Koen; Menchtchikov,Boris; Van Gompel,Edwin, Lithographic apparatus and device manufacturing method.
Westre Willard N. ; Allen-Lilly Heather C. ; Ayers Donald J. ; Cregger Samuel E. ; Evans David W. ; Grande Donald L. ; Hoffman Daniel J. ; Rogalski Mark E. ; Rothschilds Robert J., Titanium-polymer hybrid laminates.
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