Beam regulating apparatus for an EUV illumination beam
원문보기
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
G01J-001/42
G03F-001/84
G03F-007/20
G02B-026/00
출원번호
US-0843753
(2013-03-15)
등록번호
US-8853642
(2014-10-07)
우선권정보
DE-10 2012 204 674 (2012-03-23)
발명자
/ 주소
Arnold, Ralf
Mueller, Ulrich
출원인 / 주소
Carl Zeiss SMT GmbH
대리인 / 주소
Fish & Richardson P.C.
인용정보
피인용 횟수 :
0인용 특허 :
4
초록▼
A beam regulating apparatus for an EUV illumination beam has a position sensor device and a control/regulating device, which is signal-connected to the position sensor device. Furthermore, at least one beam regulating component which influences the beam path of the illumination beam is signal-connec
A beam regulating apparatus for an EUV illumination beam has a position sensor device and a control/regulating device, which is signal-connected to the position sensor device. Furthermore, at least one beam regulating component which influences the beam path of the illumination beam is signal-connected to the control/regulating device. The position sensor device has at least one diffraction grating for generating at least two reference partial beams from the illumination beam. Furthermore, the position sensor device has a respective position sensor assigned to one of the reference partial beams, for detecting the assigned reference partial beam. This results in a beam regulating apparatus which enables well-controllable illumination in conjunction with a simple construction.
대표청구항▼
1. A beam regulating apparatus for an EUV illumination beam comprising: a position sensor device;a control/regulating device, which is signal-connected to the position sensor device; andat least one beam regulating component which influences a beam path of the illumination beam and which is signal-c
1. A beam regulating apparatus for an EUV illumination beam comprising: a position sensor device;a control/regulating device, which is signal-connected to the position sensor device; andat least one beam regulating component which influences a beam path of the illumination beam and which is signal-connected to the control/regulating device;wherein the position sensor device comprises at least one diffraction grating for generating at least two reference partial beams from the illumination beam, with a respective position sensor, assigned to one of the reference partial beams, for detecting the assigned reference partial beam;wherein the detected reference partial beams are partial beams generated by diffraction at the diffraction grating with the same absolute diffraction order. 2. The beam regulating apparatus of claim 1, wherein the − first and the + first diffraction order at the diffraction grating are used for generating the at least two reference partial beams. 3. The beam regulating apparatus of claim 2, comprising at least one coupling-out element for coupling out a reference beam from the illumination beam, wherein the at least one diffraction grating is designed for generating the at least two reference partial beams from the reference beam. 4. The beam regulating apparatus of claim 2, comprising a filter element having an EUV throughput that changes monotonically over its area, and is arranged in the beam path of the reference partial beams upstream of an EUV-sensitive receiver area of the position sensor. 5. The beam regulating apparatus of claim 1, comprising at least one coupling-out element for coupling out a reference beam from the illumination beam, wherein the at least one diffraction grating is designed for generating the at least two reference partial beams from the reference beam. 6. The beam regulating apparatus of claim 5, comprising position sensors arranged in pairs and serving for detecting a respective beam position dimension (x, y) transversely with respect to the beam direction (z) of the illumination beam. 7. The beam regulating apparatus of claim 6, comprising a filter element having an EUV throughput that changes monotonically over its area, and is arranged in the beam path of the reference partial beams upstream of an EUV-sensitive receiver area of the position sensor. 8. The beam regulating apparatus of claim 5, comprising a filter element having an EUV throughput that changes monotonically over its area, and is arranged in the beam path of the reference partial beams upstream of an EUV-sensitive receiver area of the position sensor. 9. The beam regulating apparatus of claim 1, wherein the position sensors comprise photodiodes. 10. The beam regulating apparatus of claim 9, comprising a filter element having an EUV throughput that changes monotonically over its area, and is arranged in the beam path of the reference partial beams upstream of an EUV-sensitive receiver area of the position sensor. 11. The beam regulating apparatus of claim 1, comprising a filter element having an EUV throughput that changes monotonically over its area, and is arranged in the beam path of the reference partial beams upstream of an EUV-sensitive receiver area of the position sensor. 12. The beam regulating apparatus of claim 1, wherein the diffraction grating comprises a two-dimensional grating. 13. The beam regulating apparatus of claim 1, comprising a plurality of diffraction gratings, in which each diffraction grating comprises a one-dimensional grating. 14. The beam regulating apparatus of claim 1, comprising at least one normalization detector which detects a normalization beam coupled out from the illumination beam. 15. A position sensor device for use in a beam regulating apparatus according to claim 1. 16. An optical system comprising: a beam regulating apparatus according to claim 15, andan imaging optical unit for imaging an object field, which is illuminated with the illumination beam, into an image field. 17. A metrology system for examining objects, the metrology system comprising: an optical system according to claim 16,a light source for generating the illumination radiation, anda measurement pick-up that detects the image field. 18. The beam regulating apparatus of claim 1, comprising at least one coupling-out element for coupling out a reference beam from the illumination beam, wherein the at least one diffraction grating is designed for generating the at least two reference partial beams from the reference beam. 19. The beam regulating apparatus of claim 1, comprising a filter element having an EUV throughput that changes monotonically over its area, and is arranged in the beam path of the reference partial beams upstream of an EUV-sensitive receiver area of the position sensor. 20. A beam regulating apparatus for an EUV illumination beam comprising: a position sensor device;a control/regulating device, which is signal-connected to the position sensor device;at least one beam regulating component which influences a beam path of the illumination beam and which is signal-connected to the control/regulating device,wherein the position sensor device comprises at least one diffraction grating for generating at least two reference partial beams from the illumination beam, with a respective position sensor, assigned to one of the reference partial beams, for detecting the assigned reference partial beam;at least one coupling-out element for coupling out a reference beam from the illumination beam, in which the at least one diffraction grating is designed for generating the at least two reference partial beams from the reference beam; anda filter element having an EUV-throughput that changes monotonically over its area, and is arranged in the beam path of the reference partial beams upstream of an EUV-sensitive receiver area of the position sensor.
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