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A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber

A system and method of operating a high repetition rate gas discharge laser system. The system includes a gas discharge chamber having a hot chamber output window heated by the operation of the gas discharge laser chamber, an output laser light pulse beam path enclosure downstream of the hot chamber window and comprising an ambient temperature window, a cooling mechanism cooling the beam path enclosure intermediate the output window and the ambient window. The gas discharge chamber can include a longitudinally and axially compliant ground rod, including a first end connected to a first chamber wall, a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall and a first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube.

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1. A high repetition rate gas discharge laser system comprising: a gas discharge chamber capable of outputting more than 4000 discharges per second, the gas discharge chamber having: at least one set of gas discharge electrodes including a first gas discharge electrode and a second gas discharge ele

1. A high repetition rate gas discharge laser system comprising: a gas discharge chamber capable of outputting more than 4000 discharges per second, the gas discharge chamber having: at least one set of gas discharge electrodes including a first gas discharge electrode and a second gas discharge electrode;a discharge region formed between the first gas discharge electrode and the second gas discharge electrode; andan output laser light pulse beam path passing between the first gas discharge electrode and the second gas discharge electrode;a hot chamber output window heated by the operation of the gas discharge laser chamber;an output laser light pulse beam path enclosure enclosing a path of the output laser light pulse, the beam path enclosure being disposed downstream of the hot chamber window and comprising an ambient temperature window, the hot chamber output window optically aligned with the discharge region and the output laser light pulse beam path through the output laser light pulse beam path enclosure;an intermediate window disposed intermediate to the hot window and the ambient window, the intermediate window and the ambient window forming a cooled section of the beam enclosure;a purge gas inlet disposed between the intermediate window and the hot chamber window, a helium source coupled to the purge gas inlet; anda cooling mechanism cooling the beam path enclosure intermediate to the intermediate window and the ambient window, the cooling mechanism configured to cool the output laser light pulse beam path within the cooled section of the output laser light pulse beam path enclosure, thereby reducing an amount of beam disturbance due to thermal boundary layers in the cooled section. 2. The apparatus of claim 1, wherein the cooling mechanism includes a cooling mechanism in thermal contact with a portion of an external surface of the beam path enclosure intermediate to the intermediate window and the ambient window. 3. The apparatus of claim 1, further comprising: the windows are at or near Brewster's angle. 4. The apparatus of claim 1, further comprising a vibration isolator disposed between the hot window and the intermediate window. 5. The apparatus of claim 1, further comprising: a purge gas inlet disposed between the hot chamber output window and the ambient window. 6. The apparatus of claim 1, further comprising: the cooled section of the beam path enclosure is under a vacuum. 7. The apparatus of claim 1, wherein the gas discharge chamber includes a longitudinally and axially compliant ground rod, including: a first end connected to a first chamber wall;a second end connected to a second chamber wall, the second chamber wall opposite the first chamber wall; anda first portion formed into a helical spring, the ground rod providing mechanical support for a preionizer tube. 8. The apparatus of claim 7, further comprising: a cathode shim extending along a length of a cathode, wherein the ground rod extends a length of the cathode shim. 9. The apparatus of claim 7, wherein at least one of the first end of the ground rod and the second end of the ground rod includes a narrowed portion, wherein the narrowed portion electrically insulates the ground rod from a external voltage in a region at least one of the first end of the ground rod and the second end of the ground rod. 10. The apparatus of claim 7, wherein the first portion formed into the helical spring includes radius wider than a second portion of the ground rod. 11. The apparatus of claim 1, wherein the gas discharge chamber includes a gas discharge chamber including a rotary fan, the rotary fan including: an outer portion, including a first inner diameter and a first outer diameter and a plurality of blades extending from the first outer diameter to the first inner diameter; andan inner portion including a second inner diameter and a second outer diameter and a plurality of blade extensions extending from the second outer diameter to the second inner diameter, the second outer diameter is between about 0.002 inches to about 0.006 inches smaller than the first inner diameter, the inner portion being concentric with the outer portion. 12. The apparatus of claim 11, wherein each one of the plurality of blade extensions correspond to each one of the plurality of blades. 13. The apparatus of claim 11, wherein each one of the plurality of blade extensions correspond to each one of the plurality of blades and wherein each one of the plurality of blade extensions is aligned with the corresponding blade to form an extension toward a radial centerline axis of the first portion and the second portion. 14. The apparatus of claim 1, wherein the gas discharge chamber includes a master oscillator gas discharge chamber and wherein the at least one set of gas discharge electrodes includes at least two sets of gas discharge electrodes disposed in a single gas discharge medium, each of the least two sets of gas discharge electrodes coupled to a corresponding at least one high voltage pulse power module and configured to allow for a tic-toc regime of alternating discharges in each of the at least two sets of gas discharge electrodes, the two sets of gas discharge electrodes output a laser light having a same wavelength. 15. The apparatus of claim 14, wherein the master oscillator gas discharge chamber is coupled to a power amplifier. 16. The apparatus of claim 14, wherein the master oscillator gas discharge chamber is selectively coupled to two power amplifiers by optics capable of selectively coupling a light pulse from the master oscillator gas discharge chamber to each of the two power amplifiers. 17. The apparatus of claim 14, wherein the master oscillator gas discharge chamber is coupled to two power amplifiers by optics capable of splitting a light pulse from the master oscillator gas discharge chamber to each of the two power amplifiers. 18. A high repetition rate gas discharge laser system comprising: a gas discharge chamber capable of outputting more than 4000 discharges per second, the gas discharge chamber having: at least one set of gas discharge electrodes including a first gas discharge electrode and a second gas discharge electrode; anda discharge region formed between the first gas discharge electrode and the second gas discharge electrode;a hot chamber output window heated by the operation of the gas discharge laser chamber;an output laser light pulse beam path enclosure enclosing a path of the output laser light pulse, the beam path enclosure being disposed downstream of the hot chamber window and comprising an ambient temperature window, the hot chamber output window optically aligned with the discharge region and an output laser light pulse beam path through the output laser light pulse beam path enclosure;an intermediate window disposed intermediate to the hot window and the ambient window, the intermediate window and the ambient window forming a cooled section of the beam enclosure;a purge gas inlet disposed between the intermediate window and the hot chamber window, a helium source coupled to the purge gas inlet; anda cooling mechanism cooling the beam path enclosure intermediate to the intermediate window and the ambient window. 19. A high repetition rate gas discharge laser system comprising: a gas discharge chamber including: a first set of gas discharge electrodes including a first gas discharge electrode and a second gas discharge electrode;a second set of gas discharge electrodes including a third gas discharge electrode and a fourth gas discharge electrode, each of the first set and the second set of gas discharge electrodes disposed in a single gas discharge medium and coupled to a corresponding one of two high voltage pulse power modules and configured to allow for a tic-toc regime of alternating discharges in each of the two sets of gas discharge electrodes, the first set of gas discharge electrodes and the second set of gas discharge electrodes outputting a laser light having a same wavelength;a first discharge region formed between the first gas discharge electrode and the second gas discharge electrode;a second discharge region formed between the third gas discharge electrode and the fourth gas discharge electrode, the first discharge region and the second discharge region being formed in a single gas discharge medium;a first laser light pulse beam path defined as passing between the first gas discharge electrode and the second gas discharge electrode;a second laser light pulse beam path defined as passing between the third gas discharge electrode and the fourth gas discharge electrode, the first laser light pulse beam path being offset from and parallel to the second laser light pulse beam path;a hot chamber output window heated by the operation of the gas discharge laser chamber;an output laser light pulse beam path enclosure enclosing a path of the output laser light pulse, the beam path enclosure being disposed downstream of the hot chamber window and comprising an ambient temperature window, the hot chamber output window optically aligned with the discharge region and an output laser light pulse beam path through the output laser light pulse beam path enclosure;an intermediate window disposed intermediate to the hot window and the ambient window, the intermediate window and the ambient window forming a cooled section of the beam enclosure;a purge gas inlet disposed between the intermediate window and the hot chamber window, a helium source coupled to the purge gas inlet; anda cooling mechanism cooling the beam path enclosure intermediate to the intermediate window and the ambient window, the cooling mechanism configured to cool the output laser light pulse beam path within the cooled section of the output laser light pulse beam path enclosure, thereby reducing an amount of beam disturbance due to thermal boundary layers in the cooled section.