초록 ▼

Embodiments of the invention relate to component structures which are useful as apparatus in plasma processing chambers. Portions of the component structures are bonded together using oxyfluoride-comprising glazes, glass ceramics, and combinations thereof. The bonding material is resistant to haloge

Embodiments of the invention relate to component structures which are useful as apparatus in plasma processing chambers. Portions of the component structures are bonded together using oxyfluoride-comprising glazes, glass ceramics, and combinations thereof. The bonding material is resistant to halogen-containing plasmas and exhibits desirable mechanical properties.

대표청구항 ▼

1. A method of bonding together portions of a ceramic component where the component composition is resistant to fluorine-comprising corrosive etchant plasmas used in a semiconductor industry or MEMS industry to produce patterned structures, said method comprising: contacting an area of said portions

1. A method of bonding together portions of a ceramic component where the component composition is resistant to fluorine-comprising corrosive etchant plasmas used in a semiconductor industry or MEMS industry to produce patterned structures, said method comprising: contacting an area of said portions of a ceramic component to be bonded together with a bonding agent which comprises a metal fluoride selected from the group consisting of YF3, NdF3, AlF3, ZrF4, SmF3, CeF3, DyF3, GdF3, InF3, LaF3, ThF4, TmF3,YbF3, BaF2, CaF2, and combinations thereof, where said bonding agent , when co-fired with said portions of said ceramic component, reacts to form an oxyfluoride glass-ceramic comprising transition area between said portions of said ceramic component and said bonding agent, which transition area includes from at least 0.1 volume % amorphous phase up to about 50 volume % amorphous phase and ,wherein said oxyfluoride glass-ceramic comprising transition area exhibits, upon exposure to a CF4 —CHF3 etchant plasma, an erosion rate which is lower than an erosion rate of said portions of ceramic component. 2. A method in accordance with claim 1, wherein said bonding agent comprises said oxyfluoride glass-ceramic comprising transition area in combination with a metal oxide. 3. A method in accordance with claim 2, wherein said metal oxide contains an element selected from the group consisting of Y, Al, Nd, Ce, Sm, Er, Sc, La, Hf, Nb, Zr, Mg, Si, Gd, Tm, Yb, Ba, Na, and combinations thereof, and said glass-ceramic comprising transition area which is formed by said method contains an oxide of at least one of said elements. 4. A method in accordance with claim 1, where said bonding agent diffuses into and reacts with portions of said ceramic component to form a glass-ceramic comprising transition area, where a composition of said glass-ceramic comprising transition area depends on compositions of said bonding agent and said ceramic component. 5. A method in accordance with claim 1, where said bonding agent reacts with two portions of the ceramic component having different chemical compositions to form a glass-ceramic comprising transition area where an overall composition of said glass-ceramic comprising transition area depends on both a composition of said bonding agent and a composition of said two portions of the ceramic component which are being bonded. 6. A method in accordance with claim 4 or claim 5, wherein said bonding agent includes an additive selected from the group consisting of Nd2O3, CeO2; Sm2O3, Er2O3, ErF3, Sc2O3, ScF3, La2O3, LaF3, HfO2, HfF4, Nb2O5, NbF5, ZrO2, MgO, SiO2, Na2CO3, and combinations thereof.