초록 ▼

The plasma generation device 30 is provided with a high frequency generation device 37 that generates a high frequency wave, and a high frequency radiator 15 that radiates the high frequency wave outputted from the high frequency generation device 37 to a target space 10, and generates plasma by sup

The plasma generation device 30 is provided with a high frequency generation device 37 that generates a high frequency wave, and a high frequency radiator 15 that radiates the high frequency wave outputted from the high frequency generation device 37 to a target space 10, and generates plasma by supplying energy of the high frequency wave to the target space 10. In the plasma generation device 30, the high frequency generation device 37 is provided with an oscillator 41 that oscillates a high frequency wave, and an amplifier 42 that amplifies and outputs the high frequency wave oscillated by the oscillator 41 to the high frequency radiator 15. In the high frequency generating device 37 the amplifier 42 alone is integrated with the high frequency radiator 15, from among the oscillator 41 and the amplifier 42.

대표청구항 ▼

1. A plasma generation device, comprising: a high frequency generation device that generates a high frequency wave; anda high frequency radiator that radiates the high frequency wave outputted from the high frequency generation device to a target space, plasma being generated by supplying energy of

1. A plasma generation device, comprising: a high frequency generation device that generates a high frequency wave; anda high frequency radiator that radiates the high frequency wave outputted from the high frequency generation device to a target space, plasma being generated by supplying energy of the high frequency wave to the target space from the high frequency radiator, whereinthe high frequency generation device includes an oscillator that oscillates the high frequency wave, and an amplifier that amplifies the high frequency wave oscillated by the oscillator and outputs the high frequency wave thus amplified to the high frequency radiator, andfrom among the oscillator and the amplifier, the amplifier alone is integrated with the high frequency radiator,wherein the amplifier includes a plurality of stages of amplifying elements, andfrom among the plurality of stages of amplifying elements, a downstream amplifying element is integrated with the high frequency radiator. 2. A plasma generation device, comprising: a high frequency generation device that generates a high frequency wave; anda high frequency radiator that radiates the high frequency wave outputted from the high frequency generation device to a target space, plasma being generated by supplying energy of the high frequency wave to the target space from the high frequency radiator, whereinthe high frequency generation device includes an oscillator that oscillates the high frequency wave, and an amplifier that amplifies the high frequency wave oscillated by the oscillator and outputs the high frequency wave thus amplified to the high frequency radiator, andfrom among the oscillator and the amplifier, the amplifier alone is integrated with the high frequency radiator,wherein the high frequency radiator is an ignition plug having tip end side formed with a discharge gap and exposed to the target space,wherein an ignition coil is provided that outputs a high voltage pulse for generating a discharge at the discharge gap to the ignition plug, andthe amplifier is integrated with an ignition unit in which the ignition coil and the ignition plug are integrated. 3. The plasma generation device according to claim 2, comprising a mixer that is integrated with the ignition coil, mixes the high voltage pulse generated by the ignition coil and the high frequency wave amplified by the amplifier, and outputs it to the ignition plug, wherein the amplifier is attached to the mixer, and integrated with the ignition unit via the mixer. 4. A plasma generation device, comprising: a high frequency generation device that generates a high frequency wave; anda high frequency radiator that radiates the high frequency wave outputted from the high frequency generation device to a target space, plasma being generated by supplying energy of the high frequency wave to the target space from the high frequency radiator, whereinthe high frequency generation device includes an oscillator that oscillates the high frequency wave, and an amplifier that amplifies the high frequency wave oscillated by the oscillator and outputs the high frequency wave thus amplified to the high frequency radiator, andfrom among the oscillator and the amplifier, the amplifier alone is integrated with the high frequency radiator,the plasma generation device further comprising:a plurality of the high frequency radiators, wherein a plurality of the amplifiers are provided corresponding to the high frequency radiators, and are integrated with the respective corresponding high frequency radiators; anda high frequency switch that switches a supply destination of the high frequency wave outputted from the oscillator from among the plurality of amplifiers. 5. The plasma generation device according to claim 1, comprising: a plurality of the high frequency radiators wherein a plurality of the downstream amplifying elements are provided corresponding to the high frequency radiators and the downstream amplifying elements are integrated with the respective high frequency radiators; anda high frequency switch that switches a supply destination of the high frequency wave outputted from an upstream amplifying element, from among the plurality of downstream amplifying elements. 6. A plasma generation device, comprising: a high frequency generation device that generates a high frequency wave; anda high frequency radiator that radiates the high frequency wave outputted from the high frequency generation device to a target space, plasma being generated by supplying energy of the high frequency wave to the target space from the high frequency radiator, whereinthe high frequency generation device includes an oscillator that oscillates the high frequency wave, and an amplifier that amplifies the high frequency wave oscillated by the oscillator and outputs the high frequency wave thus amplified to the high frequency radiator, andfrom among the oscillator and the amplifier, the amplifier alone is integrated with the high frequency radiator,the plasma generation device further comprising a power circuit that provides power for high frequency wave to the high frequency generation device, whereinthe oscillator is accommodated in the same casing as the power circuit. 7. A plasma generation device, comprising: a high frequency generation device that generates a high frequency wave; anda high frequency radiator that radiates the high frequency wave outputted from the high frequency generation device to a target space, plasma being generated by supplying energy of the high frequency wave to the target space from the high frequency radiator, whereinthe high frequency generation device includes an oscillator that oscillates the high frequency wave, and an amplifier that amplifies the high frequency wave oscillated by the oscillator and outputs the high frequency wave thus amplified to the high frequency radiator, andfrom among the oscillator and the amplifier, the amplifier alone is integrated with the high frequency radiator,wherein the amplifier is integrated with the high frequency radiator in a state being accommodated in a metal casing for preventing the high frequency wave from leaking outside, and heat generated in the amplifier is released to the outside via the metal casing. 8. The plasma generation device according to claim 2, wherein the ignition plug includes, separately from electrodes forming the discharge gap, an antenna for radiating high frequency waves to the target space.