초록 ▼

This invention relates generally to: (1) methods of forming enhanced-surface walls (20) for use in apparatae (e.g., heat transfer devices, fluid mixing devices, etc.) for performing a process, (2) to enhanced-surface walls per se, and (3) to various apparatae incorporating such enhanced-surface wall

This invention relates generally to: (1) methods of forming enhanced-surface walls (20) for use in apparatae (e.g., heat transfer devices, fluid mixing devices, etc.) for performing a process, (2) to enhanced-surface walls per se, and (3) to various apparatae incorporating such enhanced-surface walls. The method improved method broadly comprises the steps of: providing a length of material (21) having opposite initial surfaces (22a, 22b), said material having a longitudinal centerline (x-x) positioned substantially midway between said initial surfaces, said material having an initial transverse dimension measured from said centerline to a point on either of said initial surfaces located farthest away from said centerline, each of said initial surfaces having a initial surface density, said surface density being defined as the number of characters on an surface per unit of projected surface area; impressing secondary patterns (23a, 23b) having secondary pattern surface densities onto each of said initial surfaces to distort said material and to increase the surface densities on each of said surfaces and to increase the trans-verse dimension of said material from said centerline to the farthest point of such distorted material; and impressing primary patterns (25a, 25b) having primary pattern surface densities onto each of such distorted surfaces to further distort said material and to further increase the surface densities on each of said surfaces; thereby to provide an enhanced-surface wall for use in an apparatus for performing a process.

대표청구항 ▼

1. The method of forming an enhanced-surface wall for use in an apparatus for performing a process, comprising the steps of: providing a length of material having opposite initial surfaces, said material having a longitudinal centerline positioned substantially midway between said initial surfaces,

1. The method of forming an enhanced-surface wall for use in an apparatus for performing a process, comprising the steps of: providing a length of material having opposite initial surfaces, said material having a longitudinal centerline positioned substantially midway between said initial surfaces, said material having an initial transverse dimension measured from said centerline to a point on either of said initial surfaces located farthest away from said centerline, each of said initial surfaces having an initial surface density, said surface density being defined as the number of characters on an surface per unit of projected surface area;impressing secondary patterns having secondary pattern surface densities onto each of said initial surfaces to distort said material and to increase the surface densities on each of said surfaces and to increase the transverse dimension of said material from said centerline to the farthest point of such distorted material;wherein the step of impressing said secondary patterns onto said material increases the maximum transverse dimension of said material from said centerline to the farthest point of said distorted material of up to 150% of the maximum transverse dimension from said centerline to the farthest point on either of said initial surfaces; andimpressing primary patterns having primary pattern surface densities onto each of such distorted surfaces to further distort said material and to further increase the surface densities on each of said surfaces;wherein the step of impressing said primary patterns onto said material does not reduce the minimum dimension of such further-distorted material, when measured from said centerline to any point on either of such further-distorted surfaces, below 50% of the minimum dimension of said material, when measured from said centerline to the farthest point on either of said initial surfaces;thereby to provide an enhanced-surface wall for use in an apparatus for performing a process. 2. The method as set forth in claim 1 wherein each secondary pattern surface density is greater than each primary pattern surface density. 3. The method as set forth in claim 1 wherein the step of impressing said secondary patterns onto each of said initial surfaces includes the additional step of: cold-working said material. 4. The method as set forth in claim 1 wherein the step of impressing said primary patterns onto each of distorted surfaces includes the additional step of: cold-working said material. 5. The method as set forth in claim 1 wherein said secondary patterns are the same. 6. The method as set forth in claim 5 wherein said secondary patterns are shifted relative to one another such that a maximum dimension from said centerline to one distorted surface will correspond to a minimum dimension from said centerline to the other distorted surface. 7. The method as set forth in claim 1 wherein the step of impressing said secondary patterns onto said material does not reduce the minimum dimension of said material, when measured from any point on one of such distorted surfaces to the closest point on the opposite one of such distorted surfaces, below 95% of the minimum dimension from any point on one of said initial surfaces to the closest point on the opposite initial surface. 8. The method as set forth in claim 1 wherein the step of impressing said secondary patterns onto said material does not reduce the minimum dimension of said material, when measured from any point on one of such distorted surfaces to the closest point on the opposite one of such distorted surfaces, below 50% of the minimum dimension from any point on one of said initial surfaces to the closest point on the opposite initial surface. 9. The method as set forth in claim 1 wherein said primary patterns are the same. 10. The method as set forth in claim 9 wherein said primary patterns are shifted relative to one another such that a maximum dimension from said centerline to one further-distorted surface will correspond to a minimum dimension from said centerline to the other further-distorted surface. 11. The method as set forth in claim 1 wherein the step of impressing said primary patterns onto said material does not reduce the minimum dimension of such further-distorted material, when measured from said centerline to any point on either of such further-distorted surfaces, below 95% of the minimum dimension of said material, when measured from said centerline to the farthest point on either of said initial surfaces. 12. The method as set forth in claim 1 wherein the opposite initial surfaces of said material are planar. 13. The method as set forth in claim 1 wherein the steps of impressing said patterns includes the step of impressing said patterns by at least one of a stamping and rolling operation. 14. The method as set forth in claim 1, and further comprising the additional steps of: bending said enhanced-surface wall such that the proximate ends are positioned proximate to one another; andjoining the proximate ends of said material together;thereby to form an enhanced-surface tube. 15. The method as set forth in claim 14 wherein the step of joining the proximate ends of said material together, includes the further step of: welding the proximate ends of said material to join them together. 16. The method as set forth in claim 1, and further comprising the additional step of: providing holes through said material. 17. The method as set forth in claim 1, and further comprising the additional step of: installing said enhanced-surface wall in a heat transfer device. 18. The method as set forth in claim 1, and further comprising the additional step of: installing said enhanced-surface wall in a fluid-handling apparatus.