Over-voltage protection during arc recovery for plasma-chamber power supplies
IPC분류정보
국가/구분
United States(US) Patent
등록
국제특허분류(IPC7판)
B23K-009/06
B23K-010/00
H01J-037/32
H05H-001/46
출원번호
US-0785888
(2013-03-05)
등록번호
US-8884180
(2014-11-11)
발명자
/ 주소
Ilic, Milan
출원인 / 주소
Advanced Energy Industries, Inc.
대리인 / 주소
Neugeboren O'Dowd PC
인용정보
피인용 횟수 :
12인용 특허 :
125
초록▼
A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being dr
A system and method for managing power delivered to a processing chamber is described. In one embodiment current is drawn away from the plasma processing chamber while initiating an application of power to the plasma processing chamber during an initial period of time, the amount of current being drawn away decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time.
대표청구항▼
1. A system for supplying energy to a plasma processing chamber, the system comprising: a power supply;a plasma processing chamber coupled to the power supply via a first power line and a second power line;an arc management component configured to extinguish an arc in the plasma processing chamber;
1. A system for supplying energy to a plasma processing chamber, the system comprising: a power supply;a plasma processing chamber coupled to the power supply via a first power line and a second power line;an arc management component configured to extinguish an arc in the plasma processing chamber; andan arc recovery component coupled by a switch between the first power line and the second power line to apply power to the plasma processing chamber after the arc has been extinguished and draw current away from the plasma processing chamber through the switch while power is applied to the plasma processing chamber after the arc is extinguished, the switch remaining closed during an arc recovery period to redirect current away from the plasma chamber to gradually increase an amount of power applied to the plasma processing chamber after the arc is extinguished, wherein the switch is opened after the arc recovery period, the switch remaining open after the arc recovery period until another arc is detected. 2. The system of claim 1, wherein the arc recovery component includes an energy discharge component coupled to the switch, the energy discharge component configured to discharge at least a portion of the energy that is diverted so as to enable the energy diversion component to divert energy during a subsequent recovery cycle. 3. The system of claim 1, wherein the arc recovery component includes an energy storage component, the energy storage component drawing the current away from the plasma processing chamber and converting the current that is drawn away into stored energy. 4. The system of claim 3, wherein the arc recovery component includes an energy discharge component coupled to the energy storage component, the energy discharge component configured to discharge at least a portion of the stored energy so as to enable the energy storage component to store additional energy. 5. The system of claim 1, wherein the switch includes a switch selected from the group consisting of an insulated-gate bipolar transistor (IGBT), a metal oxide semiconductor field effect transistor (MOSFET), and a bipolar junction transistor (BJT), an integrated gate commutated thyristor (IGCT), a metal-oxide semiconductor-controlled thyristor (MCT), a bipolar switch, or silicon-controlled rectifier. 6. The system of claim 1, wherein the arc management component includes the switch. 7. An apparatus for supplying energy to a plasma processing chamber, comprising: means for detecting an arc in the plasma chamber;means for diverting, responsive to the detected arc, current away from the plasma processing chamber to extinguish the arc;means for placing a current diversion path across inputs to the plasma chamber in response to the arc being detected;means for drawing current away from the plasma processing chamber through the diversion path while providing an uninterrupted increasing level of current to the plasma processing chamber during an initial period of time after the arc is extinguished, the amount of current being drawn away uninterruptedly decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time; andmeans for removing the current diversion path after the initial period of time until another arc is detected. 8. The apparatus of claim 7, including: means for increasing, during the initial period of time, an amount of voltage that is applied to the plasma processing chamber. 9. The apparatus of claim 7, wherein means for drawing current away includes means for coupling the plasma processing chamber to an energy storage element, the energy storage element drawing the decreasing amount of current during the initial period of time. 10. The apparatus of claim 7, including means for discharging stored energy from the energy storage element. 11. A method for supplying energy to a plasma processing chamber, comprising: detecting an arc in the plasma chamber;diverting, responsive to the detected arc, current away from the plasma processing chamber to extinguish the arc;placing a current diversion path across inputs to the plasma chamber in response to the arc being detected;drawing current away from the plasma processing chamber through the diversion path while providing an uninterrupted increasing level of current to the plasma processing chamber during an initial period of time after the arc is extinguished, the amount of current being drawn away uninterruptedly decreasing during the initial period of time so as to increase the amount of power applied to the plasma processing chamber during the initial period of time; andremoving the current diversion path after the initial period of time until another arc is detected. 12. The method of claim 11, including: increasing, during the initial period of time, an amount of voltage that is applied to the plasma processing chamber. 13. The method of claim 11, wherein drawing current away includes coupling the plasma processing chamber to an energy storage element, the energy storage element drawing the decreasing amount of current during the initial period of time. 14. The method of claim 11, including discharging stored energy from the energy storage element.
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이 특허에 인용된 특허 (125)
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